掃頻電壓 的英文怎麼說
中文拼音 [sǎobīndiànyā]
掃頻電壓
英文
sweevoltage-
Employing the interlaced scanning, current tv system can compress the frequency band of tv signal effectively and facilitate transmission. but this method reduces the scanning lines of pictures and the frequency of the field. it leads the pictures displayed on tv to have such disadvantages as large area flicker, edge flicker, interlace flicker, raster visibility and creeping line etc. to satisfy people " s vision feeling better, the big - screen, multi - function and high quality tv - set have been made great progress
現行的廣播電視系統由於採用隔行掃描方式，從而有效地壓縮了電視信號的頻帶，有利於傳輸；但由於這種方式使得圖像的掃描行數少，場頻低，導致了重顯的電視圖像有大面積閃爍、邊緣閃爍、行間閃爍、行結構可見及行爬行等。That test part of the software is primarily used to complete the test of some parameters, such as time base, time - expand, time interval, voltage interval, vertical, stable state, transient state and scanning linearity. the result of the test needs to be analyzed and judged. clear user interface and timely warnings for mistakes of testing process inside because of the user ' s fault operating make whole test process more easier than it did on a time
該軟體的測試部分主要用於完成對示波器掃描時間系數、擴展掃描時間系數、 t時間測量、 v電壓測量、垂直偏轉系數、頻帶寬度、校準信號、脈沖瞬態響應、掃描線性誤差時等參數的測試檢定任務，並對測試結果進行及時的分析和判斷，由於界面清晰，而且對測試過程中由於用戶的誤操作都有及時的錯誤提示，使得整個測試過程簡單易行，對于用戶來講掌握起來也更為方便些。Sic film was coated on the surface of 316l stainless steel by substrate bias - assisted radio frequency ( rf ) sputtering as tritium permeation barrier ( tpb ) of first wall and blanket in fusion reactor
採用分步偏壓輔助射頻（ rf ）濺射法在316l不銹鋼表面制備了sic薄膜。掃描電鏡（ sem ）觀察表明膜緻密、均勻、與基體結合牢固。The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity
本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。分享友人