晶體場效應 的英文怎麼說

中文拼音 [jīngchǎngxiàoyīng]
晶體場效應 英文
crystal field effects
  • : Ⅰ形容詞(光亮) brilliant; glittering Ⅱ名詞1. (水晶) quartz; (rock) crystal 2. (晶體) any crystalline substance
  • : 體構詞成分。
  • : 場Ⅰ名詞1 (平坦的空地 多用來翻曬糧食 碾軋穀物) a level open space; threshing ground 2 [方言] (...
  • : Ⅰ名詞(效果; 功用) effect; efficiency; result Ⅱ動詞1 (仿效) imitate; follow the example of 2 ...
  • : 應動詞1 (回答) answer; respond to; echo 2 (滿足要求) comply with; grant 3 (順應; 適應) suit...
  • 晶體 : [晶體學] crystal; vitrella; crystal body; crystalloid; x-tal
  • 效應 : [物理學] effect; action; influence
  1. To achieve the high impedance required specially designed "electrometer" vacuum tubes, field effect transistor must be used in the input stage.

    為適高阻抗需要,儀器輸入電路中須用特殊設計的靜電計專用電子管、管。
  2. Jfet junction type field effect transistor

    結型
  3. Fet field effect transistor

  4. Field effect transistor

  5. Semiconductor, diodes, bipolar junction transistors, field - effect transistors, transistor amplifiers, frequency response, operational amplifiers, differential and multistage amplifiers, integrated circuits

    半導、二極、雙極電、電放大器、頻率響、算放大器、差動及多極放大器、積電路。
  6. However, in our nation, the research on gan - based microelectronic devices is in the early stage, and a great deal of vestigation is still needed to perform on separative processes of gan devices. due to the lack of algan / gan heterojunction materials in the country, a few researches on algan / gan were made, and the investigation on schottky rectifiers is much less

    在國內, gan基微電子器件的研究剛開始起步,制備gan分立器件的工藝尚處于探索研究階段,特別是受algan gan二維電子氣材料來源的限制,國內algan gan基的管的研究開展得較少,關于肖特基整流二極的研究更少。
  7. Standard test method for separating an ionizing radiation - induced mosfet threshold voltage shift into components due to oxide trapped holes and interface states using the subthreshold current - voltage characteristics

    利用亞閾值安伏特性測定由於氧化空穴和界面態產生的電離輻射感金屬氧化物半導管閾電壓偏移分量的標準試驗方法
  8. Unipolar field effect type transistor

    單極
  9. Modern voltage references are constructed using the energy - band - gap voltage of integrated transistors, buried zener diodes, and junction field - effect transistors

    現代電壓基準建立於使用集成管和帶狀能隙基準、掩埋齊納二極和結管。
  10. ( 1 ) effects of externally applied electric fields on photorefractive two - beam coupling are analyzed. theoretic dependence of the intensity gain factor on applied field e0 in sbn : 60 is presented. and the experimental results obtained in two sbn : 61 : cr crystal samples with different dopant concentration show clearly that for properly applied fields, a larger f can be achieved effectively than that obtained with no field applied

    由兩塊不同摻cr濃度的sbn 61 cr得到的實驗結果同時表明,適當的外電作用能夠有提高的二波耦合增益,並且,外電的作用使的響速度大大提高,而的最佳耦合角與外電之間沒有明顯的依賴關系。
  11. Discrete semiconductor devices - metal - oxide semiconductor field - effect transistors mosfets for power switching applications

    半導分立器件.電力開關設備的金屬氧化物半導
  12. Mosfets discrete semiconductor devices - part 8 - 4 : metal - oxide - semiconductor field - effect transistors mosfets for power switching applications

    半導分立器件.第8 - 4部分:電力開關裝置用金屬氧化物半導
  13. It is found that the height of the metal electrode, the distance between the source and drain electrodes, the thickness of the sio

    研究了納電子管構造過程中金屬電極的結構設計,源-漏電極高度sio
  14. High frequency switching technique is becoming more popular in the power electronics area, the high frequency power transistors are applied in the buck - boost type chopper system. the characteristics of power mosfet and insulated gate bipolar transistors ( igbt ), some new kinds of power swithing devices, are deeply studied

    高頻開關技術是當今電力電子技術發展的方向,本文研究的buck - boost斬波系統中採用了高頻功率器件,所以本文對新型開關器件? ?功率mos管[ mosfet ]和絕緣門極管[ igbt ]的特性進行了初步研究。
  15. Rapid screening test methods for thermal sensitive parameter of mos field effect transistor

    Mos管熱敏參數快速篩選試驗方法
  16. Semiconductor discrete device. detail specification for silicon n - channel deplition mode field - effect transistor of type cs146

    半導分立器件. cs146型硅n溝道耗盡型管.詳細規范
  17. Semiconductor discrete device. detail specification for type cs141 silicon n - channel mos deplition mode field - effect transistor

    半導分立器件. cs141型硅n溝道mos耗盡型管詳細規范
  18. Semiconductor discrete device. detail specification for type cs140 silicon n - channel mos deplition mode field - effect transistor

    半導分立器件. cs140型硅n溝道mos耗盡型管.詳細規范
  19. Especially, mesfet devices fabricated on lec si - gaas substrate have been adopted into very large - scale integration ( vlsi ) and monolithic microwave integrated circuit ( mmic ) extensively. therefore, it is necessary to study the influence of defects in substrate material of lec si - gaas on performance of mesfet to meet the need of design and fabrication of gaas ic

    以液封直拉半絕緣gaas為襯底的金屬半導管( mesfet )器件是超大規模集成電路和單片微波集成電路廣泛採用的器件結構,因此研究lec法生長si - gaas ( lecsi - gaas )襯底材料特性對mesfet器件性能的影響,對gaas集成電路和相關器件的設計及製造是非常必要的。
  20. Well, cmos complementary metal - oxide semiconductor chips use metal - oxide semiconductor field effect transistors mosfets. these are fundamentally different from bipolar transistors

    哦, cmos (互補金屬氧化物半導元使用金屬氧化物半導管( mosfet ) ,顯然它是一種fei (管) 。
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