曝光計 的英文怎麼說
中文拼音 [pùguāngjì]
曝光計
英文
exposure meter-
Interrelationship of quarz - fiber electrometer type exposure meters and companion exposure meter chargers
石英纖維靜電計型曝光計和配套使用的曝光計的相互關系Bases for gm counter tubes - interrelationship of quartz - fiber electrometer type exposure meters and companion exposure meter chargers
蓋革-米勒計數管的管座.石英纖維靜電計式曝光表和相似曝光表的相互關系Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。High efficiency light reflecting system and diffusion foil assure 95 % or more light evenness
精心設計的光源反射系統再結合本機配的曝光散光片裝置，從而使曬版光均勻度高達95 %以上。Photo - electric exposure meters ; scales, calibration
光電曝光計.刻度盤.校準Photo - electric exposure meters - part 3 : exposure meters for flash light
光電曝光計.第3部分:閃光燈曝光計Methods of calibration for exposure meters, air kerma meters, air absorbed dose meters and dose - equivalent meters
曝光計空氣比釋動能測量儀空氣吸收劑量測量儀和劑量當量測量儀的校正方法Verification scheme of measuring instruments for light exposure
曝光量計量器具檢定系統What seemed a clever wheeze to avoid the scrutiny of the regulators and auditors now looks foolish, since no bank knows the exposure of any other
逃離監管機構和審計機關的火眼金睛，過去似乎是明智之舉，現在看來相當愚蠢，因為銀行不知道其他機構是否曝光。Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. the laser direct writing system is the kind of tool that exposes the precision patterns by the micro - spot on the photosensitive material
所謂激光直寫，就是利用聚焦的激光光束，由計算機控制聲光調制器的通斷以及平臺的移動，在光刻膠上進行曝光，經過顯影后得到所需要的圖形。In this article we briefly introduce the e - beam lithography techniques, and we describe our experiences in the modification of an sem into an e - beam writer
以電子顯微鏡改裝成的簡易電子束曝光機在性能上雖比不上設計精良的專業化電子束曝光機，但在很多情況下可以符合研發工作的要求，可說是經濟實用的方案。A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given, including system function, hardware and software design
本論文介紹了掃描電子束曝光機圖形發生器的總體方案、系統設計、硬體實現和軟體編程等，提出了一套完整的圖形發生器硬體方案，並完成了圖形發生器介面的設計。The company has cad design centre, precision etching and developing production line, chemical cleaning production line, scrubbing production line, high - power exposing machine, cnc drilling machine, suctioning silk screen machine, speedy press, vacuum multilayer press, chemistry sink copper and metal surface treating production line, punches, etc. import or domestic advanced equipment
公司擁有cad設計中心，精密蝕刻、顯影生產線，化學清洗生產線，磨板生產線，大功率曝光機，數控鉆床，吸氣絲印機，快壓機，真空層壓機，化學沉銅及金屬表面處理生產線，沖床等進口或國產先進設備。After data processing, exposure time acquired by the method given in this paper is analysed and measured
採集數據經計算軟體處理，得到各點處的快門有效曝光時間。This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step
提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。On this condition, based on the experimental results gotten by the microwave absorption dielectric - spectrum measure technique, the photographic process at room temperature in agcl cubic microcrystals doped with k4fe ( cn ) 6 is simulated. through the optimization of simulating parameters, not only the cross - section and trap depth of the shallow electron trap induced by the dopant, but also the optimal doping amount is obtained
在此基礎上，以微波吸收介電譜檢測技術的實驗結果為依據，對摻有k _ 4fe （ cn ） _ 6的agcl立方體微晶在室溫下的曝光過程進行了模擬，通過調節模擬參數，不但計算出由摻雜劑引入的淺電子陷阱的俘獲截面和陷阱深度，而且得到了這種摻雜乳劑的最佳摻雜濃度。A top scientific journal plans to adopt some stricter safeguards against fraud, in wake of a headline - grabbing south korean cloning sham exposed a year ago
有感於一年前曝光的黃禹錫幹細胞研究作假案，頂尖科學雜志計劃採取更為更格的措施，預防研究中的欺詐行為。The exposure counter on the lcd panel will display the time ( in seconds ) that the shutter has been open
液晶屏上的曝光計數器將顯示快門已打開的時間（秒） 。When the film reaches the end, the film rewinds to completion automatically and the exposure counter displays “ e ”
當膠卷拍完時，膠片會自動倒片，這時曝光計數器顯示「 e 」 。If the film has been properly loaded, the film speed appears on the lcd panel for about 2 seconds. then, the exposure counter displays “ 1 ”
如膠卷裝得合適，膠片的速度將在2秒鐘內顯示在液晶屏上，這時，曝光計數器顯示「 1 」 。分享友人