曝光過度 的英文怎麼說

中文拼音 [pùguāngguòdù]
曝光過度 英文
blocked up
  • 曝 : 動詞[書面語] （曬） expose to the sun
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 過 : 過Ⅰ動詞[口語] （超越） go beyond the limit; undue; excessiveⅡ名詞（姓氏） a surname
  • 度 : 度動詞[書面語] （推測; 估計） surmise; estimate
  • 曝光 : exposure
  • 過度 : excessive; over; undue; ana-; hyper-
  1. Along with the recent continuous exposal of big financial faking problems of some listed companies and share price manipulating cases, and with the graveness of excess stock market speculation and bubble phenomenon from day to day, the discussion on the problems of validity of china security markets for the last few years only exits in some small range research literature of related science publications which has become " great arguments on share markets " laid in the highest authority of chinese economists at the beginning of this century

    隨著近年來上市公司重大財務虛假與股價操縱案的不斷曝光及市場過度投機和泡沫現象的日趨嚴重，關于中國證券市場有效性問題的討論，終于從過去幾年中散見于有關學術刊物的一些小范圍研究文獻，演變成世紀之初在中國經濟學界最權威層面上的一場「股市大辯論」 。
  2. They also try to detect if noise ? the overexposed pixels within the image that create a grainy effect ? was present at the time the photograph was taken or has been added later

    他們還試圖檢測噪聲? ?圖像中呈現粒狀效果的過度曝光像素? ?是產生於照片被攝制的時刻還是后來才被加上的。
  3. I do not set the aperture right so they are overexposed. yes

    我沒有對好光圈，結果曝光過度了，對嗎？
  4. The shutter speed flashes in the viewfinder display when the subject is underexposed or overexposed

    當被攝體呈欠曝光或過曝光時，快門速度將在取景器中起閃爍。
  5. The burn tool in most cases should only used to subtly darken areas that have been overexposed

    加深、減淡、海綿工具在大多數情況下只能用於局部輕微調暗曝光過度的地方。
  6. Likewise, a subject may be overexposed even when the fastest shutter speed ( i. e., 1 2000th second ) is set “ 2000 ” flashes in the viewfinder display

    同樣，一個拍攝對象也可能在快門速度最快時（ 1 2000秒）曝光過量，取景器顯示會出現閃動的「 2000 」字元。
  7. Based on the analysis, we find refractive index of resists changes during bleaching process, and the exposure parameters vary with resist thickness, so as the development parameters. therefore, the dill exposure model and mack development model are improved, so that they are suitable for the simulation of thick resist lithography. in addition, the calculation errors from refractive index changes are discussed

    針對厚層抗蝕劑在曝光過程中折射率發生了變化以及曝光參數隨抗蝕劑厚度變化的特點，改進了原有的曝光模型；針對厚層抗蝕劑顯影參數隨抗蝕劑厚度變化的特點以及在顯影過程中出現的表面抑制效應現象，改進了原有的顯影模型。
  8. Since the dichromated gelatin has a higher diffraction efficiency in all holographic recording materials, the aim of this research is to use dichromated gelatin as the recording material and to make use of the principle of holography to design holographic optical components, especially in fabrication procedure of dichromated gelatin film and in experimental technique to form a high diffraction efficiency using different angular exposure method

    為了產生優質的聚焦能力與效率，本研究採用目前具有最高繞射效率（ 80 ~ 90 % ）的重鉻酸明膠材料作為感光劑，除了自行調制藥劑比例成分，並依嚴格的製作步製成重鉻酸明膠全像片外，並採用不同角度重覆曝光方式改良干涉式波帶板無法自動追蹤的缺點，經過多次試驗與改進，藉以形成具備高繞射效率和自動追蹤功能的全像光學波帶板。
  9. Because of over or insurficent exposure some inferior black and white image must be processed to satisfy the examination identification in forensic photography

    在刑事照相中，有必要對一些由於曝光過度或曝光不足以及其他原因造成低質量的黑白圖像進行圖像處理。
  10. It is promising to use this technology in the fabrication of oeics to solve the incompatibility problem. in laser assisted microprocessing, time is an important parameter, which has effect on component ’ s performance, so temperature distributing for small laser - processed region must be well measured

    在激光誘導擴散等半導體激光微細加工過程中，溫度是一個很重要的參數，它對器件的性能有很大影響，因此微小曝光區域的溫度分佈是關鍵的工藝參數，必須得到精確的測量。
  11. Any shutter speed aperture selectable in 12 ev or 13 ev increments ; correct, over - under - exposure indicated in viewfinder ; bulb also selectable

    可選擇任何光圈值及快門速度，每次以12ev或13ev增減；觀景器內及導向顯示屏上會顯示影像是否曝光正確、曝光過度曝光不足；可選擇bulb
  12. Exposure compensation can be set within the range of 4 ev in 0. 5 ev increments

    如當前曝光設定超過曝光測定范圍，取景器顯示中的快門速度將會閃爍。
  13. The shutter speed in the viewfinder display flashes when the current exposure setting is beyond the exposure metering range

    如當前曝光設定超過曝光測定范圍，取景器顯示中的快門速度將會閃爍。
  14. In this pleasant romantic comedy from korea, jin - soo lee jung - jae from il mare is a tv anchorman who is suffering from partial amnesia after a traff.

    八年前的一次通意外，令李俊尚局部失憶，僅存的一張曝光過度的照片，驅使他決意在大學舊友的協助之下，尋找一段遺忘了的感情。
  15. In this pleasant romantic comedy from korea, jin - soo lee jung - jae from il mare is a tv anchorman who is suffering from partial amnesia after a traffic accident. now he only has a vague memory of someone he loves deeply and vows to find that woman

    八年前的一次通意外，令李俊尚局部失憶，僅存的一張曝光過度的照片，驅使他決意在大學舊友的協助之下，尋找一段遺忘了的感情。
  16. The poison - penned arbiter of style described newly single spears and celebrity socialite hilton as " two peas in an over - exposed pod ! style - free and fashion deprived.

    這位時尚「毒舌」對剛回歸單身的布蘭妮和豪門女星希爾頓給出了這樣的評價： 「活像過度曝光豆莢里的兩顆豌豆！
  17. The poison - penned arbiter of style described newly single spears and celebrity socialite hilton as " two peas in an over - exposed pod ! style - free and spears and hilton have been regularly photographed together enjoying nights out on the town in the wake of spears

    這位時尚「毒舌」對剛回歸單身的布蘭妮和豪門女星希爾頓給出了這樣的評價： 「活像過度曝光豆莢里的兩顆豌豆！
  18. Britney spears and paris hilton have been named the worst dressed celebrities of 2006, according to an annual list from us fashion critic " mr. blackwell. " the poison - penned arbiter of style described newly single spears and celebrity socialite hilton as " two peas in an over - exposed pod

    這位時尚「毒舌」對剛回歸單身的布蘭妮和豪門女星希爾頓給出了這樣的評價： 「活像過度曝光豆莢里的兩顆豌豆！
  19. This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step

    提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。
  20. On this condition, based on the experimental results gotten by the microwave absorption dielectric - spectrum measure technique, the photographic process at room temperature in agcl cubic microcrystals doped with k4fe ( cn ) 6 is simulated. through the optimization of simulating parameters, not only the cross - section and trap depth of the shallow electron trap induced by the dopant, but also the optimal doping amount is obtained

    在此基礎上，以微波吸收介電譜檢測技術的實驗結果為依據，對摻有k _ 4fe （ cn ） _ 6的agcl立方體微晶在室溫下的曝光過程進行了模擬，通過調節模擬參數，不但計算出由摻雜劑引入的淺電子陷阱的俘獲截面和陷阱深度，而且得到了這種摻雜乳劑的最佳摻雜濃度。
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