曝光量測量 的英文怎麼說
中文拼音 [pùguāngliángcèliáng]
曝光量測量
英文
exposure amount measurement- 曝 : 動詞[書面語] (曬) expose to the sun
- 光 : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
- 量 : 量動1. (度量) measure 2. (估量) estimate; size up
- 測 : 動詞1. (測量) survey; fathom; measure 2. (測度; 推測) conjecture; infer
- 曝光量 : amount of exposure
- 曝光 : exposure
- 測量 : measure; survey; gauge; meter; measurement; measuring; surveying; mensuration; metering; gauging;...
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Exposure ratios between spectral bands are determined from in situ reflectance spectra of objects in scene.
光譜波段之間的曝光量比值,可以根據景物中目標的就地測定的反射光譜確定。It is promising to use this technology in the fabrication of oeics to solve the incompatibility problem. in laser assisted microprocessing, time is an important parameter, which has effect on component ’ s performance, so temperature distributing for small laser - processed region must be well measured
在激光誘導擴散等半導體激光微細加工過程中,溫度是一個很重要的參數,它對器件的性能有很大影響,因此微小曝光區域的溫度分佈是關鍵的工藝參數,必須得到精確的測量。Methods of calibration for exposure meters, air kerma meters, air absorbed dose meters and dose - equivalent meters
曝光計空氣比釋動能測量儀空氣吸收劑量測量儀和劑量當量測量儀的校正方法Total uv integrate sesor. insure exposure volume
全面紫外線積量感測、準確控制曝光量。Photoelectric methods for measuring light exposure in focal planes of cameras
照相機及電影攝影機畫面曝光量的光電測定方法The metering will be affected by the film divider, so that the metering result can ' t show the needed exposure
由於分幅器會影響測光系統,測光結果不能真實地反映所需的曝光量。Focal - plane shutters ; technical terms, exposure times, synchro contacts, measuring devices
焦點平面快門.技術術語曝光時間測量裝置同步觸Standard test method for measuring optical angular deviation of transparent parts using the double - exposure method
用雙重曝光法測量透明部件的光學角偏差的標準試驗方法Because energy of laser can be focused, the exposure time can be decreased to micron second level, the error brought by wire liberation was reduced
由於激光具有能量集中的特點,因此,本文所研製的測徑儀,其系統曝光時間被降至微秒級,從而降低了線芯抖動所引起的測量誤差。The improvement of the temperature measurement system for the small exposed region in laser assisted microprocessing
激光微細加工中微小曝光區溫度測量系統的改進In order to make temperature measurement not effect temperature distributing, we developed a real - time temperature measurement system using radiation thermometry
為了使溫度測量不影響曝光區的溫度分佈,需採用不接觸輻射測量方法。Standard test method for determining relative image quality of industrial radiographic film exposed to x - radiation from 4 to 25 mv
曝光於4至25mv的x射線放射的工業放射照相膠片的相對影象質量的測定方法Multi - segment ( 256 ) metering automatically gauges and adjusts light readings over the entire image area to give you the best exposure for your subject
多區分割( 256區)測光系統會自動測量整個影像區域的光線,並為主體選擇最適合的曝光。The projection optics with aspherical mirror of sub - nanometer accuracy are required to get a resolution of less than 0. 1 m m and wide exposure area simultaneously. the precision of polishing and testing for such ashperical surface is fairly high and it has not been achieved yet in our current state
Euvl微縮投影物鏡為了同時實現大的曝光視場和0 . 1 m以下的成像解析度,微縮投影光學系統需採用面形精度達亞納米量級的非球面,但我們現階段的光學加工和檢測技術距此要求尚有一定的差距。In addition, from the point of view of practicality, we make a study of experiment and application for double - exposure digital holographic interferometry, namely measuring gradn and grad / i of plane optical flat and measuring phase modulation characteristic of a kind of liquid crystal spatial light modulator ( lc - slm ) - liquid crystal television ( lctv )
另外,本文還從實用的角度出發對二次曝光數字全息干涉術進行了實驗及應用的研究,具體就是平面平晶gradn和gradh的測量以及液晶空間光調制器( lc - slm )中液晶電視( lctv )的相位特性的測量。1 if a standard or specification for general use requires a defined property level after a specific time or radiant exposure in an exposure test conducted according to this practice, base the specified property level on results from round - robin experiments run to determine the test reproducibility from the exposure and property measurement procedures
在依據此規程作曝露測試時,如果一個通用的標準或者規格要求一個在一個特定時間或者發光曝露之後明確的屬性級,基於此從循環試驗得到結果的特定屬性級來檢測曝露和屬性測量程序的再現性。In this paper, we design an optical system for double - exposure digital holographic interferometry. the comparison of the other measured result and experimental result proves the feasibility and validity of double - exposure digital holographic interferometry
在具體的實驗測量中,本文提出了適合二次曝光數字全息干涉術的光學系統,而其它方法的測量結果對本文測量結果的佐證,則證明了二次曝光數字全息干涉術的可行性和有效性。分享友人