柵驅動特性 的英文怎麼說

中文拼音 [zhàdòngxìng]
柵驅動特性 英文
grid-drive characteristic
  • : 柵名詞(柵欄) railings; paling; palisade; bars
  • : 動詞1. (趕) drive (a horse, car, etc. ) 2. (快跑) run quickly 3. (趕走) expel; disperse
  • : Ⅰ形容詞(特殊; 超出一般) particular; special; exceptional; unusual Ⅱ副詞1 (特別) especially; v...
  • : Ⅰ名詞1 (性格) nature; character; disposition 2 (性能; 性質) property; quality 3 (性別) sex ...
  • 驅動 : [機械工程] drive; prime mover
  • 特性 : characteristic(s); character; performance; features; properties; behaviour; response; character...
  1. Based on the hydrodynamic energy transport model, the influence of variation of negative junction depth caused by concave depth on the characteristics of deep - sub - micron pmosfet has been studied. the results are explained by the interior physical mechanism and compared with that caused by the source / drain depth. research results indicate that with the increase of negative junction depth ( due to the increase of groove depth ), the threshold voltage increases, the sub - threshold characteristics and the drain current driving capability degrade, and the hot carrier immunity becomes better in deep - sub - micron pmosfet. the short - channel - effect suppression and hot - carrier - effect immunity are better, while the degradation of drain current driving ability is smaller than those with the increase of depth of negative junction caused by source / drain junction shallow. so the variation of concave depth is of great advantage to improve the characteristics of grooved - gate mosfet

    基於能量輸運模型對由凹槽深度改變引起的負結深的變化對深亞微米槽pmosfet能的影響進行了分析,對所得結果從器件內部物理機制上進行了討論,最後與由漏源結深變化導致的負結深的改變對器件的影響進行了對比.研究結果表明隨著負結深(凹槽深度)的增大,槽器件的閾值電壓升高,亞閾斜率退化,漏極能力減弱,器件短溝道效應的抑制更為有效,抗熱載流子能的提高較大,且器件的漏極能力的退化要比改變結深小.因此,改變槽深加大負結深更有利於器件能的提高
  2. And the differernt characteristics of different close voltages are analyzed. at last, an experimental full bridge device is designed and some experiments are carried out. the results of the experiments show that the drive and protect circuit has excellent performances

    本文還對不同關電壓的關斷進行了分析,最後對所設計的保護電路進行了實驗,結果令人滿意,證明所提出的保護電路的可行
  3. After structure design aimed to high transconductance, parameters of device structure are modified in detail. the simulation results of soi nmos with strained si channel show great enhancements in drain current, effective mobility ( 74 % ) and transconductance ( 50 % ) beyond conventional bulk si soi nmosfet. the strained - soi nmosfet fabrication process is proposed with lt - si ( low temperature - si ) technology for relaxed sige layer and simox technology for buried oxide

    其次,根據器件參量對閾值電壓和輸出的影響,以提高器件的跨導和電流能力為目的設計了strained - soimosfet器件結構,詳細分析極類型和氧化層厚度、應變硅層厚度、 ge組分、埋氧層深度和厚度以及摻雜濃度的取值,對器件進行優化設計。
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