正性膠光刻 的英文怎麼說
中文拼音 [zhēngxìngjiāoguāngkè]
正性膠光刻
英文
positive resist lithography-
Photoresist technology is the important constitute of exposure technology, high performance resolution can be attained by using high performance exposure tools with matched high performance photoresist
摘要光刻膠技術是曝光技術中重要的組成部分,高性能的曝光工具需要有與之相配套的高性能的光刻膠才能真正獲得高解析度的加工能力。Intensity distribution in photoresist is analyzed during ldw exposure process in terms of the improved theoretical model and the method of selecting the optimal exposure is described. results of ray - tracing using zemax that is optical design software agree well with the calculated results of theoretical model and l dw experimental results verify the accuracy of the model. therefore this improved model is important significant for directing ldw research
本文完善了激光直寫光刻理論,分析了直寫曝光中膠層內光場的分佈,探討了最佳曝光量的選擇方案,利用zemax軟體進行光線追跡的結果和理論模擬十分相近,實驗結果驗證了理論模型的正確性,該理論模型對激光直寫光刻技術研究具有重要指導意義。
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