氣膜溫度下降 的英文怎麼說

中文拼音 [qìmówēndùxiàjiàng]
氣膜溫度下降 英文
gas-film drop
  • 氣 : Ⅰ名詞1 （氣體） gas 2 （空氣） air 3 （氣息） breath 4 （自然界冷熱陰晴等現象） weather 5 （氣味...
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 溫 : Ⅰ形容詞（不冷不熱） warm; lukewarm; hot; gentle; mild Ⅱ名詞1 （溫度） temperature 2 （瘟） acute ...
  • 度 : 度動詞[書面語] （推測; 估計） surmise; estimate
  • 下 : 下動詞1. （用在動詞后,表示由高處到低處） 2. （用在動詞后, 表示有空間, 能容納） 3. （用在動詞后, 表示動作的完成或結果）
  • 降 : 降動詞1. （投降） surrender; capitulate 2. （降伏） subdue; vanquish; tame
  • 溫度 : [物理學] temperature
  1. Tensile strength ( ts ) and elongation ( e ) of zein films decreased with the decreasing of freezing storage temperature ; the emc increased with the decreasing of freezing storage temperature, but then it had a little decrease ; with the decreasing of freezing storage temperature, the wvp of zein films showed an increase

    隨著凍藏溫度的降低，蛋白膜的抗拉強度和延伸率都呈下降的趨勢；蛋白膜的平衡水分含量隨凍藏溫度的降低先上升，而後又略有下降；水蒸氣透過率隨凍藏溫度的降低而上升。
  2. These equipments are vacuum system which is made up of diffusion pump, pipes, water - cooling baffle and rotary vane pump ; the whole chamber, wall and water - cooling wall are made of stainless steel ; the lower part is equipped with cool water sleeve which can fast take out air to gain 10 - 4 or higher vacuum, therefore they are widely used in high - tech fields, such as the platting, electronic, metallurgy, chemical engineering, atomic energy, materials and medicine etc

    Kt系列擴散泵機組是由凸腔擴散泵管道水冷擋板機械泵等組成的高真空系統，整個泵腔泵壁及水冷壁全部由不銹鋼作成，下部配有降溫用急冷水套，抽氣速度快，極限真空高，它可使被抽容器獲得10 - 4或更高的高真空，因此廣泛適用於鍍膜裝飾電子冶金化工原子能材料醫藥等等各種高新技術領域。
  3. The prepared sdse modified zirconum meinbrane was tested at the wider range of tcmperaure and pressure and differellt composihons of hydrogen mixturc gases ( i. e. different hydrgen panal pressure ) in order to examine the performance of this membrane and the sole hpermselechvity of the membrane. the results showed tha the purity of the permeated hydrgen is l00 % at the base of the detection greatest lower lanit of the qhle mass spectrometer, and there was no impurity gas passed, the permeating flux and permeability of this membrane are from several decades times to one decade times more higher than tha of a palladum membran in the range of from 593k to 773k, puv = 0. 2 ~ 0. 3mpa, pdn = 4x l04pa - - 0. lmpa, the hydrogen permeatng flux is increased with the difference of the squto root of pressure, and presents a linear relationship, the pressure seems has no influence on the permeablity, the permeabi1ity is decreased with the increasing of the temperature, and presents an exponential relationship, accondng to the fitting curve of the relationship betwen the permeability and the temperatur derived from the experimenta daa, in the range of 593k ~ 773k, pup0. 2 ~ 0. 3mpa, pha = 4 x l0 # pa ~ 0

    在更寬的溫度范圍、壓差范圍內，在不同原料氣組成（即不同的氫氣分壓）條件下，對所制備的鋯表面改性膜進行了滲氫性能實驗，考核了膜對氫的唯一選擇滲透性，結果表明：在四極質譜的檢測下限內，只有氫氣存在，而無雜質氣體通過；在593k 773k溫度范圍內，鋯表面改性選擇滲氫膜具有高於鈀膜數十倍至十幾倍的滲氫流量和滲氫系數；其滲氫流量隨著膜兩側氫分壓平方根摘要差的增大而增大，並且呈線性關系；壓力對膜的滲氫系數幾乎無影響；膜的滲氫系數隨著溫度的升高而下降，井巨呈指數關系：根據對實驗數據所作滲氫系數與溫度關系曲線的擬合，在溫度593k 773k范圍內，壓差p 、 0二0
  4. By the pecvd ( plasma enhanced chemical vapor deposition ) system and the reactants of silane and ammonia, silicon nitride thin film with excellent anti - reflective and passivation effects was prepared. the relatively optimum parameters for depositing sinx thin film and the basic physical and chemical properties of sinx were investigated. the effects of substrate temperature, the flow ratio of silane over ammonia and the rf power on the refractivity and deposition rate were researched

    實驗表明，氮化硅薄膜的沉積速率隨硅烷氨氣流量比增大而增大，隨溫度升高而略有降低，隨淀積功率增大而明顯增加；在襯底溫度300 ，射頻功率20w和硅烷氨氣流量比為1 ： 3的條件下氮化硅薄膜的沉積速率大約為8 . 6納米分。
  5. Distance between target and substrate get longer also increase the transmission of aln films. as the temperature of substrate get higher, the transmission of ultrathin aluminum films decrease slightly. nitrogen gas concentration and sputtering time barely take effect on the transmission of aln films

    發現，隨著工作壓強的升高、靶距的增加，薄膜的透光率上升;基片溫度的升高在非晶襯底上會導致樣品透光率的下降;而氮氣濃度和濺射時間對薄膜的透光率影響不大。
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