氬氣氛 的英文怎麼說

中文拼音 [fēn]
氬氣氛 英文
argon atmosphere
  • : 名詞[化學] (氣體元素) argon (ar)
  • : Ⅰ名詞1 (氣體) gas 2 (空氣) air 3 (氣息) breath 4 (自然界冷熱陰晴等現象) weather 5 (氣味...
  • : 名詞(氣; 氣氛) atmosphere
  • 氣氛 : atmosphere; air
  1. Bell - style hydrogen furnace : the bell - style hydrogen furnace can be operated at temperature as high as 2050oc under reducing or inert atmosphere such as hydrogen, nitrogen and argon

    從美國進口的高溫真空燒結爐,最高燒結溫度2050 ,能在氫、氮以及下完成工藝操作。
  2. Irradiation defects decompounded and recombined with oxygen impurity and large quantity of nucleation centers were introduced in czsi bulk during annealing at 1100. in nitrogen atmosphere, more defects were induced in fast neutron irradiated czsi than in argon atmosphere

    不同下快中子輻照直拉硅中缺陷形成的差異很大, 1100的高溫退火中,與氬氣氛相比,氮退火樣品中出現了更多缺陷。
  3. Helium - charged al films are prepared by direct current ( dc ) magnetron sputtering with a he / ar mixture

    摘要採用氦混合下直流磁控濺射沉積方法制備含有氦原子的金屬鋁膜。
  4. The results indicate that it has an excellent surface. aln thin film was prepared from an aluminum target by dc and af reactive magnetron sputtering in nitrogen gas mixed with argon gas

    氮化鋁薄膜樣品是利用高純鋁靶,在氮下用直流和射頻反應磁控濺射法制備的。
  5. The sem shows : the c60 thin films, which were prepared in vacuum condition, consist of spherical cluster and have an average diameter about of 20 ~ 50nm. while in gas condition, the average diameter from 50nm to 200nm, and the average diameter of particles increases with the increase of gas pressure

    Sem測量表明:真空條件下制備的c60薄膜表面粒子粒徑約20 50nm ;(氮)條件制備的薄膜表面粒子粒徑為50 200nm ,並隨壓的增大而增大,表面結晶現象也隨壓增大而明顯。
  6. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer

    本研究課題以氧化鋅鋁靶為靶材,採用直流磁控濺射工藝在純中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。
  7. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively

    其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材,採用射頻磁控濺射和直流反應磁控濺射工藝在中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。
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