氬氣處理 的英文怎麼說

中文拼音 [chǔ]
氬氣處理 英文
argon treatment
  • : 名詞[化學] (氣體元素) argon (ar)
  • : Ⅰ名詞1 (氣體) gas 2 (空氣) air 3 (氣息) breath 4 (自然界冷熱陰晴等現象) weather 5 (氣味...
  • : 處名詞1 (地方) place 2 (方面; 某一點) part; point 3 (機關或機關里一個部門) department; offi...
  • : Ⅰ名詞1 (物質組織的條紋) texture; grain (in wood skin etc ) 2 (道理;事理) reason; logic; tru...
  • 氬氣 : argon gas
  1. The results indicated that argon plasma treatment had some effects on the mechanical properties of pylen nonwoven fabric, but had no effect on the application of pylen nonwoven fabric

    結果表明,通過等離子體表面活化,雖然會對無紡丙綸非織造物的力學性能造成影響,但是不會影響丙綸非織造物的使用。
  2. The surface of pylen nonwoven fabric was treated by argon plasma treatment, and the effects of the plasma power, plasma treating time and pressure on the mechanical properties of pylen nonwoven fabric were studied

    摘要研究了應用等離子體表面改性技術對丙綸非織造織物進行的技術,探討了時放電功率、放電時間、反應壓力等對丙綸非織造織物的力學性能的影響。
  3. This provides an extremely lightweight and strong racing machine, where the geometry of the frame is tailored by working the tube sets to create the perfect ride. at hang lun we take the design, fabrication, and material selection process very seriously, creating the best product possible for the intended application ; making bikes go fast

    為了使車架的設計更加完美並滿足輕量化幾何學結構空動力學的要求,管材的加工採用專用的設備保證其精密的尺寸,管形被設計加工成橢圓水滴錐管垂直橢圓等各種形狀,再經過工藝要求很高的弧焊接和外表面的手工打磨
  4. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法,在不同的溫度下制備了tio _ 2薄膜,並對薄膜進行了不同溫度和時間的退火,通過原子力顯微鏡( afm ) 、 x射線衍射( xrd ) 、掃描電鏡( sem )等檢測手段對薄膜的表面形貌和組成結構進行了分析,結果如下: ( 1 )濺射工藝條件與薄膜沉積速度的關系表明:採用1 . 2pa工作壓, 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ,並隨射頻功率的增加而提高,呈近似的線性關系,在0 . 3pa 1 . 6pa壓范圍中,壓強升高沉積速率迅速增加,濺射溫度提高和退火能使薄膜的厚度減小和折射率提高。
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