浮石研磨膏的英文怎麼說

中文拼音 [dànyángāo]
浮石研磨膏英文
pumice grinding grease

  • : Ⅰ動詞1 (漂在液體表面) float; drift 2 [方言] (在水裡游) swim Ⅱ形容詞1 (在表面上的) superfici...
  • : 石量詞(容量單位, 十斗為一石) dan, a unit of dry measure for grain (= l00 sheng)
  • : 研同 「硯」
  • : 磨動詞1 (摩擦) rub; wear 2 (研磨) grind; mull; polish 3 (折磨) grind down; wear down [out]:...
  • : 膏名詞1. (脂肪;油) fat; grease; oil 2. (很稠的糊狀物) cream; ointment; paste; plaster

※中文詞彙浮石研磨膏在字典百科國語字典中的解釋。

  1. Bleaching preparations and other substances for laundry use ; cleaning, polishing, scouring and abrasive preparations ; soaps ; perfumery, essential oils, cosmetics, hair lotions ; dentifrices

    洗衣用漂白劑及其他物料清潔擦亮去漬及用制劑肥皂香料精油化妝品發水牙牙粉。
  2. Class3 : bleaching preparations and other substances for laundry use ; cleaning, polishing, scouring and abrasive preparations ; soaps ; perfumery, essential oils, cosmetics, hair lotions ; dentifrices

    類別3 :洗衣用漂白劑及其它物料;清潔、擦亮、去漬及用制劑;肥皂;香料、精油、化妝品、發水;牙、牙粉。
  3. It produces even more of the glittery, shining tiny crystals than pyrites. the base color is generally pale bronze to greyish. because of it s base metal color and the shimmering of the crystals marcasite has been dubbed " black diamond ". its name is derived from a french word whose meaning is not clear

    馬克賽亦為人工,在925銀制臺座上起爪釘鑲而成,做工極其精細,然後經染黑處理,使銀飾不變色,並增添了「 marcasite 」的光澤,產生一種典雅的韻味。
  4. High pressure grinder brief introdction high pressure grinder. the machine is on purpose to grind the barite, h igh pressure grinder limestone, kaolinite, cerames, ahd slags, etc, below scale 9. 3 of moh, shardness and 280 - odd sorts of non - inflammable and non - explosive stuff in the trades of mining, metallurgical industrial, chemical engineering and building material for high fine powder generation and processing

    高壓微粉主要適用於常規物料的粉碎,如高嶺土方解大理重晶氧化鐵紅氧化鐵綠氫氧化鋁顏料膨潤土陶土等濕度小於8 ,莫氏硬度在6級以下的非易燃易爆物料的超細粉加工。
  5. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積,得到了含氮量為21at的cn薄膜;究了襯底溫度和反應氣體壓強對薄膜結構特性的影響,給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因;引入脈沖輝光放電等離子體增強pld的氣相反應,給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑;應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ,得到了含n量為56at的晶態cn薄膜;探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系,證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果;採用光學發射譜技術對cn薄膜生長過程進行了實時診斷,得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律,給出了cn薄膜沉積的主要反應前驅物,揭示了cn薄膜特性和等離子體內反應過程之間的聯系;採用高氣壓pe - pld技術究了不同襯底溫度條件下cn化合物薄膜的結構特性,揭示了si原子對薄膜生長過程的影響,給出了si基表面碳氮薄膜的生長模式;在金剛和催化劑fe處理的si襯底上進行cn薄膜沉積,證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性,並可顯著提高晶態碳氮材料的生長速率。
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