激波增壓 的英文怎麼說

中文拼音 [zēng]
激波增壓 英文
pressure rise across shock envelope
  • : Ⅰ動詞1 (水因受到阻礙或震蕩而向上涌) swash; surge; dash 2 (冷水突然刺激身體使得病) fall ill fr...
  • : Ⅰ名詞1 (波浪) wave 2 [物理學] (振動傳播的過程) wave 3 (意外變化) an unexpected turn of even...
  • : 壓構詞成分。
  1. The results show : laser beam far field intensity distribution deflect to the wave length increasing direction, the influence to laser beam far field intensity distribution of different inflow mach number is little than the influence of different inflow pressure ; flow field has more aberration to 1. 315um laser beam than to 10. 6um laser beam

    研究表明光束遠場強度分佈都向流場光程大的方向偏折,噴流出口馬赫數的變化對光束遠場強度分佈的影響較小,噴流出口力的變化對光束遠場強度分佈的影響較強;在相同的流場結構下,流場對長1 . 315 m光束的干擾要明顯強于對長10 . 6 m光束的干擾。
  2. The method permits the calculation of the three stages of shock wave evolution, and gives the temporal and spatial relationship of peak pressure, velocity, and profile of shock wave

    文中採用流體動力學模型,解析地描述了脈沖強光輻照靶材時,的產生及強、維持和衰減規律,給出了峰值力、速度、形的時空關系。
  3. The revision on the pressure broadening of miniature optically pumped submillimeter wave laser

    小型光泵亞毫米光理論計算的寬修正
  4. Finally, the two dimensional flow in the diffuser is calculated, the results show that the change of ma makes an effect to the performance of the diffuser. owing to the accretion of ma, the action of oblique shock waves and the boundary layer pricks up, the flow separates from the wall where the shock waves impinge on the boundary layer more quickly, the cluster of diamond shock waves becomes larger. moreover, by comparing the change of flow field under different structure parameter, it is found that the augment of length of constant area section alter the structure of fluid field little, a smaller area ratio and larger angle of compression section make the diffuser working better

    最後,針對擴器中的二維流場進行了數值模擬,結果表明馬赫數對擴器性能影響較大,隨著馬赫數的大,擴器管道內-附面層干擾加劇,流動從附面層分離相應加劇,串數目多;通過比較不同結構參數下的擴器內流場,發現等直段長度的變化幾乎沒有改變流場結構,只是對局部流場稍有影響,並且在其它參數不變的情況下,一定范圍內減小面積比a2 / a1和大收縮角有利於擴器性能的提高。
  5. Microwave plasma chemical vapor deposition ( mpcvd ), a kind of chemical vapor deposition method with low temperature , low intensity of pressure and clearance , is commonly used for the growth of diamond thin films

    等離子體強化學氣相沉積法( mpcvd法)是眾多低氣活cvd工藝方法的一種,也是目前在國內外比較流行的制備金剛石薄膜的工藝方法之一。
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