濺密的 的英文怎麼說
中文拼音 [jiànmìde]
濺密的
英文
splash tight-
It was concluded that, the structure of ito thin films were influenced by many working parameters such as substrate temperature, oxygenous pressure and substrate and so on. it was indicated by sem spectra of zno thin films that the surface of the sample was leveled off, and the crystals were felsitic
結果表明，對于ito薄膜，薄膜的光電性能薄膜結構的擇優取向性和與襯底溫度、濺射氧氣壓等工藝參數有很大關系， ito薄膜的sem表明，樣品表面較平整，且晶粒也比較緻密。Compared to other commonly referenced high - k materials, hfo2 is known for its stability on silicon and process compatibility. the fabrication and electrical properties of hfo2 and hfoxny gate are carefully studied. with the study on hfo2. we can receive a few significative conclusion : 1
結果表明，與傳統的hf清洗的si表面相比， nh _ 4f清洗的si表面與hfo _ 2具有更好的熱力學穩定性，因而可獲得更低的eot和柵泄漏電流密度； 3 ）研究了濺射氣氛和退火工藝對hfo _ 2柵介質薄膜性質的影響。The results show that proper control the motion mode of the particle in plating results in many strengths of the nickel films, such as good uniformity, high compactness, and strong interfacial adhesion
濺射鍍膜時，通過控制空心微珠的運動方式，在空心微珠表面沉積了一層均勻性好、附著力強和緻密性好的金屬鎳膜。It was found that an uniform and compact tio2 nanoparticulate film can be deposited on pet substrates in a short time, and it ' s thickness increases with the treating time. when the thickness comes to a critical value, there grows a greater size cluster on the nano - sized film. this is an interesting film growing pattern, which has never been reported
與以往報道的生長模式不同，發現在很短的時間內即可在基底上濺射生成緻密均勻的納米膜層，其膜厚隨著時間的延長而增加，且當達到一定厚度時，又在原有納米膜層上生長出更大尺寸的團蔟結構。The character of tube roll mill is that it combines the advantages of ball mill and roller, then great improves the grinding efficiency through the study of the grinding theory of tube roll mill, pressing stress, grinding effect and the comparation between roller and vertical mill, this text combined the national important technology equipment crert item - - tube roll milling developing item, gets following results : firstly, because of the special structure of tube and roll, powder from single particle grinding in the early peried contincely transit press grinding stage, it better stops the loss of splash energy, secondly, during the grinding progress, powder form loose to dense fully uses the nonsmoth surface of particle and stress focus to make its stress lower than roller " s
本文結合國家重大技術裝備國產化創新項目-筒式輥碾磨開發項目，通過對筒輥磨的粉磨機理、層壓應力的分析、粉磨效果的研究及與輥壓機、立磨粉磨效果、粉磨機理的比較，可知：首先，由於筒與輥的特殊結構方式，筒輥磨內粉體由初期的單顆粒破碎逐漸過渡到層壓粉碎階段，較好地防止了飛濺能的損失，其次，在粉磨過層中，粉體由疏鬆到密實，充分利用了顆粒的非光滑表面及應力集中效應使其應力低於輥壓機。實驗證實，筒輥磨的粉磨效果大大優于立磨和輥壓機。Moreover, the tio2 film particles distribute more uniform and join tightly with the increasing of power, but the surfaces of films become closer and smoother when pressure increased or the ratio of oxygen decreased
提高功率可提高膜的覆蓋度，使濺射膜顆粒分佈均勻，結合更加緊密。提高壓力或減小氧氬比，可使濺射膜的顆粒更加密集。In this paper, fluorocarbon films are deposited on polyetylene terephalate ( pet ) substrate by radio frequency magnetron sputtering polytetrefluoroethylene ( ptfe ) targets to examine the effect of discharge condition on the properties and mechanism of deposited films. the effect of the power, pressure and treating time on morphology is observed by means of scanning electron microscopy ( sem ) and atom force microscopy ( afm ). it is found that the fluorocarbon film particles distribute more uniform and join tightly with increasing power, the surfaces of films become closer and denser as pressure increases
利用掃描電鏡（ sem ）和原子力顯微鏡（ afm ）研究了成膜機理以及cf膜的表面形貌，觀察了不同功率、壓力和時間下對氟碳膜表面形貌的影響，系統研究了氟碳膜表面結構隨功率和壓力的變化規律，發現功率提高使得氟碳膜顆粒分佈均勻，結合更加緊密，而提高壓力，氟碳膜的顆粒更加密集，並且濺射條件不同，粒子的形態、粒子間構成的介觀結構也不相同。Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found
並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; （ 2 ）為克服現有磁控濺射設備的不足，提出了一種新的磁控濺射方案，採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; （ 3 ）運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究，找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。The one deposited at 300 substrate temperature owns denser crystallites. during the annealing process, with the increasing of annealing temperature, the crystallites become bigger, and crystalline phase begins to transfer. when the annealing temperature gets to 800, tio2 transfers to rutile structure completely
（ 2 ）常溫下制備的tio _ 2薄膜是無定型的， 300濺射薄膜表面有緻密的晶粒，熱處理溫度升高，晶粒變大，晶相開始轉化， 800退火tio _ 2完全轉化為金紅石結構。Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities
通過濺射法，在玻璃襯底上淀積了tini薄膜，並在600進行了真空退火， dsc法測得其馬氏體逆相變峰值溫度為75 ，利用原子力顯微鏡，對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析，發現：生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢，晶粒緻密性差，微孔洞多；而襯底面晶粒緻密，幾乎沒有微孔洞存在。Standard practice for approximate determination of current density of large - diameter ion beams for sputter depth profiling of solid surfaces
固體表面濺射深度仿形加工用大直徑離子束的電流密度近似測定的標準規程In case of small mercury spills one typical thermometer, mercury can be collected with a plain sheet of paper or an eye dropper and then stored in a sealed plastic container e. g.,
倘若濺漏少量汞份量相等於一支溫度計，可用紙張或滴管將汞收集起來，並放進密封的塑膠容器內如密實袋棄置。分享友人