無掩模 的英文怎麼說

中文拼音 [wúyǎnmó]
無掩模 英文
maskless
  • 無 : 無Ⅰ動詞（沒有） not have; there is not; be without Ⅱ名詞1 （沒有） nothing; nil 2 （姓氏） a surn...
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  1. The prospect for the maskless lithography technology

    無掩模光刻技術的前景
  2. And ofttimes the beauty of poetry, so sad in its transient loveliness, had misted her eyes with silent tears that the years were slipping by for her, one by one, and but for that one shortcoming she knew she need fear no competition and that was an accident coming down dalkey hill and she always tried to conceal it

    詩是那樣可愛，其中所描繪的無常之美是那樣令人悲傷，以致她的眼睛曾多次被沉默的淚水模糊了。因為她感到時光年復一年地逝去，倘非有那唯一的缺陷，她原是不用怕跟任何人競爭的。那次事故是她下多基山時發生的，她總是試圖掩蓋它。
  3. The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division

    摘要無掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
  4. We have contrasted several methods on fabrication of passive matrix oled, then we mainly discuss two fabricating methods, one is the precise mask method, the other is the barrier wall method. we find that the barrier wall method to fabricate the passive matrix oled ( pmoled ) has the advantages of high resolution, simple process and no crosstalking problem, so the barrier wall method is the good one to fabricate pmoled. in this paper we adopt the both methods, and we have successfully fabricated the pmoled

    分析和對比了實現無源矩陣有機電致發光顯示器件的幾種方法，著重介紹了採用精密掩模技術和障壁技術等技術方案，來製作和設計無源矩陣有機電致發光顯示器件，其中採用障壁技術方案製作的器件具有解析度高、工藝簡單容易實現、器件的交叉效應少、成本低等許多優點，是一種可行的製作無源矩陣有機電致發光顯示器件的方案。
  5. The theoretical research, computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view, high resolution, distortionless, relatively simple system structure, low costs and convenient realization way. they have a broad application prospect

    激光干涉光刻技術研究四川大學博士學位論文理論研究、計算模擬和實驗結果分析表明，無掩模激光干涉光刻和全息光刻具有大視場、高解析度、無畸變、系統相對簡單、成本較低，實現方便等特點，具有廣闊的應用前景。
  6. With the three - dimensional ray - tracing program, the simulation of leo - gps occultation is given. the radio path of occultation observation is simulated, and then the excess phase delay is calculated. this work can be used for studying the effects of the neutral atmosphere and ionosphere on the occultation observations and evaluating the performance of the inversion techniques

    本文介紹了無線電掩星技術的發展狀況和基本原理，圍繞無線電掩星技術及其應用研究展開諸多研究和探討，主要工作內容如下: 1 、利用全球三維射線追蹤程序，開展leo - gps掩星觀測的模擬研究，以計算掩星觀測時電波傳播路徑、計算大氣引起的附加相位時延等。
  7. An interferometric lithographic experimental system with maskless and multi - beam exposure is built. an experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi - beam, multiple - exposure interferometric lithography research is proposed. the experimental study on interferometric lithography is carried out

    建立了無掩模多光束多曝光干涉光刻實驗系統，提出了一種採用梯形棱鏡進行波前分割和利用可選擇光闌進行多種多光束多曝光干涉光刻研究的實驗系統，進行了干涉光刻實驗研究，對模擬和實驗結果進行了分析。
  8. However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist

    然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。
  9. Zero defect mask

    無缺陷掩模
  10. The methods and systems ( including amplitude division double - beam interference system, three - beam interference system, liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared

    研究和比較了振幅分割無掩模激光干涉光刻方法和系統，包括振幅分割雙光束干涉系統、三光束干涉系統、液浸式深紫外干涉系統及全自動干涉光刻系統。
  11. Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography

    模擬和實驗結果表明，對點陣或孔陣圖形，在同樣的圖形尺度下，無掩模干涉光刻比傳統光刻簡單得多。
  12. The basic principle, theory, main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution, deep sub - micron and nanometer patterns in large field of view are deeply investigated

    深入研究了無掩模激光干涉光刻技術用於高分辨、大視場、深亞微米和納米圖形生成的基本原理、理論、主要類型和實現方法。
  13. Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography

    本論文基於光的干涉和衍射及光學全息照相理論，綜合評述了光學光刻的基本原理、主要類型、發展趨勢及開展激光無掩模干涉光刻和全息光刻研究的目的和意義。
  14. In this paper, research on such video error recovery and concealment techniques as decoder - side error concealment ( ec ) and feedback - based retransmission without waiting ( nwarq ) is carried out based on the test modal reference software jm1. 4 of the developing iso / iec mpeg and itu - t vceg video coding standard jvt ( joint video team )

    本論文以新一代視頻壓縮標準jvt （ jointvideoteam ）測試模型jm1 . 4為基礎，重點研究了視頻差錯恢復和掩蓋技術，其中包括解碼器端差錯掩蓋技術和基於編碼器解碼器交互的無等待arq技術。
  15. The foregoing states the sole and exclusive liability of the parties hereto for infringement of patents, copyrights, mask works, trade secrets trademarks, and other proprietary rights, whether direct or contributory, and is in lieu of all warranties, express, implied or statutory, in regard thereto, including, without limitation, the warranty against infringement specified in the uniform commercial code

    上文規定了本合同雙方就專利、版權、掩模、商業秘密、商標以及其他專有權利的侵權（無論是直接的還是協從的）所承擔的唯一責任，並且取代就其所做出的所有保證（明示的、暗示的或法定的） ，包括（但不限於）中規定的不侵權保證。
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