真空濺射 的英文怎麼說

中文拼音 [zhēnkōngjiànshè]
真空濺射 英文
vacuum sputtering
  • 真 : Ⅰ形容詞（真實） true; genuine; real Ⅱ副詞1 （的確; 實在） really; truly; indeed 2 （清楚確實） cl...
  • 空 : 空Ⅰ形容詞（不包含什麼; 裏面沒有東西或沒有內容; 不切實際的） empty; hollow; void Ⅱ名詞1 （天空） s...
  • 濺 : 動詞（液體受沖擊向四外射出） splash; spatter
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 真空 : [物理學] vacuum; empty space; vacuo
  1. Excellent results have been obtained by using dc magnetron sputtering technology. a solar absorptance of 0. 94 - 0. 96 with an emittance of 0. 04 - 0. 06 at 100 has been achieved

    磁控濺射技術的準確結果顯示這種真空管在100時能夠達到吸收率： 0 . 94 - 0 . 96
  2. The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc

    干鍍是一種在真空下在聚合物表面沉積金屬的方法，包括濺射、氣相沉積、真空沉積等。
  3. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  4. Product range includes diaphragm, piston, peristaltic, rotary vane, linear, and vibratory armature pumps for medical, analytical, environmental, and automotive uses

    -研發與製造旋片式真空泵往復式真空泵冷陰極濺射離子泵爪式無油真空泵等系列產品。
  5. Vacuum technology - acceptance specifications for getter ion pumps

    真空技術.濺射離子泵驗收規范
  6. The results are as follows : as the sputtering pressure increases, the atomic ratio of o to ti increase in the films, which is attributed to the fact that the absolute oxygen content increases, as the pressure increases despite the ratio of 62 to ar remains unchangless

    結果發現：在氧氣、氬氣分壓比不變的條件下，薄膜表面o和ti原子比增大，這可能是由於濺射氣壓增大，而氧氣與氬氣比未變，真空室中氧氣的絕對含量增加，參加反應的氧原子數增加的緣故造成的。
  7. The evacuated tube is similar to a conventional dewar flask and consists of two borosilicate glass tubes, a glass with high chemical and thermal shock resistance. the outer side of the inner tube is coated with a sputtered solar selective surface

    真空玻璃管和傳統意義上的真空玻璃細頸瓶是相似的，它由兩層高強度耐沖擊性的高硼硅玻璃組成，內管外壁是磁控濺射選擇性吸收塗層。
  8. The zircondri filin wtut rirconia wa prepared and the removing technology of the zirconia on the zirconium sdrices was obtalned. the methods of chemistry and magnetron sputtring plating were used in order to platc a palladium film, which is characteristic of self catalysis for hydrogen and the sole h - permselectivity on the clean rirconium sdrices prepared by the methods of electrochemitw and ( or ) high temperatur vacuum hydrgenization, which was firstly studied. the plating tedrilogy was obained and the surface modified zirconium membran was prepared

    在利用電化學法和真空高溫除氧加氫法去除了鋯表面氧化膜的基礎上，分別採用化學法、磁控濺射法兩種鍍膜技術在其表面上鍍上了一層對氫具有自催化分解、唯一選擇滲透性的金屬鈀膜，首次獲得了鋯基材膜表面上鍍鈀的制備工藝，成功制備了鋯表面改性選擇滲氫膜。
  9. Our factory specializes in manufacturing cabinet vacuum coaters, magnetic control sputter coaters and vacuum exhaust equipments, industrial boiler, all kinds of valves, coaters and press packer specially used in the industry of quartz crystal

    我廠是國內專業生產箱式真空鍍膜機、磁控濺射鍍膜機、真空排氣設備、石英晶體行業專用被銀機和壓封機、工業爐及各種真空閥門設計製造的專業廠家。
  10. To discuss the technological project of setting up many ethernets

    磁控濺射真空制膜技術
  11. Scanning electron microscopy : after fixed in 2. 5 % glutaraldehyde made up in 0. 1 m phosphate buffer ( ph 7. 2 ), the tissue of testis was post - fixed in 1. 0 % oso4, dehydrated in a progressive ethanol solution, dried and sputter - coated with gold, then observed with kyky - 1000b microscopy and photographed

    掃描電鏡樣品以2 . 5戊二醛（ ph7 . 2 ， 0 . 1m lpbs緩沖液配製）和1鋨酸雙固定，酒精系列脫水，乾燥，真空離子濺射儀噴金， kyky - 1000b型掃描電鏡觀察並拍照。
  12. Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities

    通過濺射法，在玻璃襯底上淀積了tini薄膜，並在600進行了真空退火， dsc法測得其馬氏體逆相變峰值溫度為75 ，利用原子力顯微鏡，對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析，發現：生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢，晶粒緻密性差，微孔洞多；而襯底面晶粒緻密，幾乎沒有微孔洞存在。
  13. Secondly, we have studied the properties of the conbzr high frequency soft - magnetic thin film, and use the dc magnetron sputtering system by conquering the key technology to fabricate double - sides thin - film inductors on 10mm * 10mm printed circuit board and 20mm * 20mm ceramic board

    再次，研究了薄膜電感所使用的conbzr高頻軟磁薄膜材料的性能，並利用真空磁控濺射設備，克服各種關鍵技術及工藝難度，在10mm 10mm的pcb板、 20mm 20mm陶瓷基片上製作了薄膜電感。
  14. Vacuum sputtering coating plant

    真空濺射鍍膜設備
  15. In the work, mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells. the best techological condition was obtained by optimizing the preparing conditions, ( var is decided by the deposition rate, target voltage : 265v, gas pressure : 0. 6pa, the high base vacuum is expected

    本文採用中頻脈沖磁控濺射法，通過優化zno ： al薄膜的制備工藝，如靶電壓、本底真空度、工作氣壓、襯底溫度、 o _ 2 ar ，得到可用於硅薄膜太陽能電池背電極的zno ： al薄膜。
  16. Manufactures pressure sensors, transducers, load cells, accelerometers, force sensors and strain gages from stock. specialist in micro - miniaturization and applications of semiconductor, thin film, metallic foil and hybrid circuit technologies for the measurement of acceleration, force, and pressure in a multitude of environments

    -提供薄膜制備微粉制備真空冶金分子束外延磁控濺射化學氣相沉積電子束鍍膜激光鍍膜甩帶機磁控電弧爐空間環境模擬等設備
  17. Application of multiple plasma arc discharge vacuum magnetron sputtering coating plant in ceramic surface decoration

    磁控等離子多弧真空濺射鍍膜機在陶瓷表面裝飾的應用
  18. High - quality flow controller, pressure transducer, pressure gauge ect. for vacuum equipment, coating equipment and semiconductor equipment

    用於真空鍍膜、真空濺射、半導體製造設備的質量流量計、壓力傳感器、壓力表及相關產品。
  19. Cdte films deposited by close space sublimation have better appearance and larger grain than the films deposited by rf - sputtering and vacuum thermal evaporation

    近距離升華法制備的cdte薄膜與射頻濺射和真空蒸發相比，具有其獨有的特性。
  20. Growth of high - quality cuinse2 polycrystalline films by magnetron sputtering and vacuum selenisation

    用磁控濺射和真空硒化退火方法制備高質量的銅銦硒多晶薄膜
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