積分反射強度 的英文怎麼說

中文拼音 [jīfēnfǎnshèqiángdù]
積分反射強度 英文
integrated reflection intensity
  • 積 : Ⅰ動詞（積累） amass; store up; accumulate Ⅱ形容詞（長時間積累下來的） long standing; long pending...
  • 分 : 分Ⅰ名詞1. （成分） component 2. （職責和權利的限度） what is within one's duty or rights Ⅱ同 「份」Ⅲ動詞[書面語] （料想） judge
  • 反 : Ⅰ名詞1 （方向相背） reverse side 2 （造反） rebellion 3 （指反革命、反動派） counterrevolutionari...
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 強 : 強形容詞（強硬不屈;固執） stubborn; unyielding
  • 度 : 度動詞[書面語] （推測; 估計） surmise; estimate
  • 積分 : 1. [數學] integral; integrate; integration 2. [體育] （積累的分數） accumulate points
  1. On the basis of theory analysis, the average transmitted light intensity ( correspond to dc value ) was determined as characteristic parameter of raw water using photoelectric method for monitoring the fluctuation of transmitted light and photometric dispersion analyzer ( pda ). the dc value was closely related to both particle concentration and surface area of sand clay simultaneously. the experimental results shows that there is an exponential function relation between dc and surface area of sand clay in unit volume water ( sp ) : dc = asbp in which a and b are empirical coefficients. then the formula of macromolecule flocculant dosage is found to be d = f ( dc ) = e ( dc ) f in which e and / are empirical coefficients and the average correlation coefficient equal to 0. 981. so the model of automatical control system of water treatment plant was established using the formula

    應用透光率脈動檢測技術和光散射顆粒粒度分析儀（ pda ） ，通過理論分析，將pda的輸出信號之一? ?平均透光強度（對應于dc值）作為原水的特性表徵參數， dc值可以同時反映顆粒濃度和比表面積因素的影響，試驗結果證明， dc值與單位體積水中泥沙顆粒總表面積s _ p之間具有很好的冪函數關系： dc = cs _ p ~ d ，式中c 、 d為經驗系數，進而得到了以dc值為參數的高分子絮凝劑投藥量公式： d = f （ dc ） = e （ dc ） ~ f ，式中： e 、 f為經驗系數，平均相關系數達0 . 981 ，利用所建立的公式，建立了前饋? ?后饋聯合控制的在線自動投藥模型。
  2. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  3. The main works and results are as follows : 1. by use of one order multiple scattering theory, light scattering and reflection by a single coating layer is analyzed. the variance of radiation intensity, bidirectional reflection distribution function ( brdf ) and laser radar scattering cross section with coating layer parameters is given, with the effect of rough contrast on bidirectional reflection distribution function

    本文主要研究了單層和多層塗層結構介質的光散射特性，以及近場條件下復雜目標對激光波束的散射，其主要工作如下： 1 、採用一階多重散射近似理論分析單層塗層對光波的散射和反射，計算並討論了輻射強度、雙向反射分佈函數和單位面積激光雷達散射截面隨塗層結構參數的變化規律，數值分析了粗糙基底對雙向反射分佈函數的影響。
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