等氫離子濃度 的英文怎麼說

中文拼音 [děngqīngzinóng]
等氫離子濃度 英文
isohydric concentration
  • : Ⅰ量詞1 (等級) class; grade; rank 2 (種; 類) kind; sort; type Ⅱ形容詞(程度或數量上相同) equa...
  • : 名詞[化學] (氣體元素) hydrogen (h)
  • : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
  • : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
  • : 形容詞1. (液體或氣體中所含的某種成分多; 稠密) dense; thick; concentrated 2. (程度深) (of degree or extent) great; strong
  • : 度動詞[書面語] (推測; 估計) surmise; estimate
  • 離子 : [物理學] ion
  • 濃度 : potency; thickness; concentration; consistence; strength; consistency; density
  1. This paper mainly aims at the strategic demands for large - aperture lightweight mirror proposed by high - tech development. its main research contents are : select material blank for lightweight mirror according to physical and chemical properties of optical glass ; analyze and calculate the deformation quantity of the mirror with finite element method ; design and optimize mirror body structure of 400 lightweight plane mirror and 450 lightweight spherical mirror, analyze glass cutting principle, design specisl - use grinding wheel structure, select reasonable technological parameters to implement the processing of weight reduction holes on 400 plane mirror ; analyze etching mechanism of hydrofluoric acid, look for the technological parameters such as the optimal acid concentration and etching time etc. ; eliminate the stress of weight reduction holes and micro - cracks on 400 lightweight plane mirror ; discuss the processing principle and

    本論文的研究主要是瞄準國家高技術對大口徑輕型鏡的戰略需求而開展的。主要研究內容是:根據光學玻璃的物理與化學性能,選擇輕型鏡坯材料;用有限元法對鏡的變形進行分析、計算,找出變形規律,優化設計400mm輕型平面鏡、 450mm輕型球面鏡鏡體結構;分析玻璃切削原理,設計專用磨輪結構,選擇合理工藝技術參數,完成400mm平面鏡輕量化減重孔的加工;分析氟酸腐蝕光學玻璃機理,尋找最佳酸、腐蝕作用時間工藝參數,實現400mm平面鏡減重孔應力與微裂紋的消除;討論分器加工原理和工藝技術特點,完成400mm平面輕型鏡面形加工。
  2. According the key factors we find, we bring forward a new conception : multilevel suppressor and design a new high performance suppressor whose ion - exchange membrane has bigger areas and using three electrodes including one cathode ( anode ) and two anodes ( cathode ), at the same time we fill the suppression compartment with one kind of ion exchange resin which has moderate exchange capacity. according to our experiment ' s results, we find the new type suppressor has quite high working current efficiency and suppressing capacity. in most cases, the suppressor ' s current efficiency is over 90 % ; the suppressor can transform the naoh ( concentration : 200mmol / l, flow rate : i. oml / min, conductance : over 10000 i - i s cm " ) to pure water ( conductance : 8. 9 it s cm in chapter 3, the high performance suppressor is applied in determination some trace - amounts ions in plating solution, sewage. in this chapter, we also have a research on the gradient ion chromatography

    第二章首先以xyz - 1型電化學抑制柱為例,分析了電化學抑制柱的抑制過程得出影響抑制容量的主要因素主要是抑制柱的電流效率和交換膜的極限電流密,因此採用中交換能力的交換樹脂作為抑制室的填料以提高電流效率,在通常情況下電流效率可達到90以上;在選用同種交換膜的前提下,可通過增加交換膜的有效面積達到提高極限電流的目的從而提高抑制柱的抑制容量,因此提出了多級抑制的概念並據此研製了共電極式高容量電化學抑制柱,該抑制柱最高可將流速為1 . 0ml / min ,為200mmol / l電導率超過10000 s ? cm ~ ( - 1 )氧化鈉溶液抑制為電導率低至8 . 9 s ? cm ~ ( - 1 )的純水,並且具有穩定性高、分析結果準確優點。
  3. The chief results and conclusion thus arrived at are as folloes : ( 1 ) the morphology and electrical properties of indium - tin - oxide ( ito ) films which were treated respectively by ethanol, naoh, sulfuric and oxygen plasma, were studied from microscopic view by atomic force microscopy, x - ray photoelectron spectroscopy and goniometer

    ( 1 )利用原力顯微鏡、接觸角測試儀、紫外分光光計從微觀角研究了乙醇、氧化鈉、硫酸、氧體處理對ito薄膜的表面性能和光電性能的影響。
  4. Plasma characteristics of a rf ion source are investigated by emission spectroscopy. the spatiotemporal spectral line intensities of the first three atomic lines in hydrogen bahner series ( = 656. 28, 486. 13, 434. 05nm ) of rf ion source plasma, are measured with calibrated optical multichannel analyzer ( oma ). some plasma parameters, including electron temperature, hydrogen atom density and hydrogen ion density, are calculated and analyzed using partial local thermodynamic equilibrium ( plte ) theory and abel transform

    實驗採用絕對定標后的光學多道分析系統( oma )測定了體不同時間和空間位置的巴耳末譜線系中前三條譜線( = 656 . 28 , 486 . 13 , 434 . 05nm )的強,並採用plte的理論和abel變換方法,計算出了高頻體的電參數在放電的不同階段和徑向分佈情況,並進行了簡要分析。
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