能形成薄膜的 的英文怎麼說
中文拼音 [néngxíngchéngbómóde]
能形成薄膜的
英文
film-building-
The thickness had some influence on the development of the banded spherulites : when the thickness reduced to some degree, pcl would develop chrysanthemum - like spherulites, which had no extinction rings or the maltese cross pattern under the crossed polarized optical microscopy. the results of the phase - contrast microscopy showed that growth speed of the chrysanthemum - like spherulites along the radius was not constant
發現薄膜厚度對球晶的生長有一定的影響,當共混物膜薄到一定程度時, pcl不能形成環帶球晶,而是形成一種類似菊花狀的晶體,在偏光顯微鏡下看不到環帶,也沒有典型球晶所特有的maltese十字消光圖案。Fig. 3 and fig. 4 show that grooves in the width of 1 - 2micrometer on the surface of films sputtered at 180 forms optic trap of solar spectrum in the range of 0. 25 ~ 3micromete, and increase the absorption efficiency of solar radiation
在溫度約180的情況下的薄膜表面形貌,薄膜表面寬度為一兩個微米溝槽,形成了對0 . 25 ~ 3微米太陽光譜的光學陷阱,可提高太陽光譜范圍能量的吸收率。Such as join lubricate in hot candied of the metal, it can lighten the hot candied mechanical intensity, and after the moisture volatilizes, it can form the membrane on the metal surface and improve quality of the product
如在金屬拔絲時加入潤滑劑,可減輕拔絲機械強度,並且在水分揮發后,金屬絲表面能形成薄膜,可提高製品的質量。Surface states and the topmost surface atoms of the batio3 thin films have been analyzed by x - ray photoelectron spectroscopy ( xps ) and angle - resolved x - ray photoelectron spectroscopy ( arxps ). the results show that the as - grown batio3 thin films have an enriched - bao nonstoichiometric surface layer which can be removed by ar + ion sputtering, and the atomic ratio of ba to ti decreases with increasing the depth of ar + ion sputtering
用x射線光電子能譜技術( xps )和角分辨x射線光電子能譜技術( arxps )研究了薄膜的表面化學態以及最頂層原子種類和分佈狀況,結果顯示在熱處理過程中薄膜表面形成一層富含bao的非計量鈦氧化物層,並且鋇-鈦原子濃度比隨著探測深度的增大而逐漸減小。The properties of thin films have been investigated with modern analysis technique, such as afm ( atom force microscopy ), sem ( scanning electron microscope ), xrd ( x - ray diffraction ) and rocking curve ( - scan ). and the properties of ybco thin film and its substrate and deposition temperature have been analysed, comparing with lao substrate ' s crystallization quality, ybco thin film properties, such as morphology and degree of grain alignment, was concluded to correlate with the crystal orientation uniform of lao substrate as revealed by xrd
本文結合afm 、 sem研究ybco薄膜的表面形貌, xrd 、 fwhm分析薄膜的結晶情況,並結合成膜溫度和基片的質量進行一系列結構與性能的對比研究,發現laalo3 ( lao )基片的質量對ybco薄膜的結構完整性有很大影響,不僅影響了薄膜的c軸取向性,而且影響了ybco的超導性能。Zno thin films were deposited on silicon ( si ) and glass substrate by reactive radio frequency sputtering ( rf ) technique with zinc target in the mixed gas of ar ando2, and used zno buffer improving the quality of zno thin film. the effects of parameters on the thickness, composition, texture, morphology, optical properties and electrical properties of zno thin films had been systematically investigated by means of xrd, xps, sem, afm, pl and hall test system
採用x射線衍射( xrd ) 、 x射線光電子能譜( xps ) 、掃描電子顯微鏡( sem ) 、原子力顯微鏡( afm ) ,光致發光譜( pl )和霍爾效應測試技術系統研究了濺射工藝和退火工藝對zno薄膜的厚度、成分、織構、表面形貌、光學性能和電學性能的影響規律。The equipment adopts centrifugal sliding plow groove rotor and is the newest structure evaporator at present. it can form membrane under the condition of small flow. comparing with that of fixed space drag evaporator, its evaporation capacity can increase 40
本設備採用離心式滑動溝槽轉子,是目前國外最新結構蒸發器,在流量很小的情況下也能形成薄膜,在簡體蒸發段內壁表面附著處理液中的淤積物可被活動刮板迅速移去,和固定間隙的刮板蒸發器相比,蒸發量可提高40 69 。The ultra - thin er layers with the thicanesses in the range of 0. 5 ~ 3 monolayer ( ml ) are formed by electron beam evaporation on si ( 00l ) substrate at room temperature in an ultra - high vacuum system. after annealing at lower temperatures, ordered simcfores form on the surface. the trallsition of the surface reconsmiction pattem from ( 2 x l ) to ( 4 x 2 ) with the increase of er coverage up to l ml is observed by the reflective high energy electron diffraction ( rheed ) and low energy electron diffraction ( leed )
本文是關于硅( 001 )襯底與電子束淀積的鉺、鉿原子反應形成的超薄膜的界面與表面性質的研究,以及在該襯底上出現的共振光電子發射現象,包括了以下四個方面的工作: 1鉺導致的硅( 001 )襯底上的( 4 2 )再構研究利用反射高能電子衍射和低能電子衍射,在室溫淀積了0In the growth of c - bn films, the bombardment of particles with high energy plays a vital role
在立方氮化硼的形成過程中,高能粒子對薄膜的轟擊起著至關重要的作用。By increasing the h2 dilution ratio, it is found that atomic hydrogen can selectively etch amorphous phase and stabilize crystalline phase. from the study on the distance from substrate to catalyzer, choosing a proper distance can ensure the gas fully decomposed, while a relatively low substrate temperature can cause the nanocrystalline particles to lose mobility and keep their sizes. the pre - carbonization process can enhance the nucleation density and make the growth of high quality nanocrystalline p - sic films much easier
實驗結果表明:隨著工作氣壓的減小,薄膜的晶粒尺寸有所減小;通過提高氫氣稀釋度,利用原子氫在成膜過程中起的刻蝕作用,可以穩定結晶相併去除雜相;選擇適當的熱絲距離能保證反應氣體充分分解,又使襯底具有較高的過冷度,是形成納米薄膜的重要條件;採用分步碳化法可以提高形核密度,有利於獲得高質量的納米- sic薄膜;襯底施加負偏壓可以明顯提高襯底表面的基團的活性,因負偏壓產生的離子轟擊還能造成高的表面缺陷密度,形成更多的形核位置。The first important thin film from the thermal oxide group is the gate oxide layer under which a conducting channel can be formed between the souce and the drain
第一個重要的來自熱氧化組薄膜是柵氧化層,在它之下,源和漏之間就能形成導電通道。This paper determines the technological process, bath formularizstion and experimental parameter of electroless multicomponent cobalt based soft magnetic film with rare earth elements joined such as co - ni - b - re and co - fe - b - re by the means of perpendicular experiment and regression analysis. this paper also studies the active mechanism of rare earth elements, ultrasonic irradiation and magnetic field on the plating process, chemical component, surface configuration, microstructure and properties of electroless multicomponent cobalt based soft magnetic film in the way of examining in the component, microstructure and properties of such alloy
本文採用正交實驗和回歸分析的方法,確定了稀土化學沉積co - ni - b - re 、 co - fe - b - re多元鈷基軟磁薄膜的工藝流程、鍍液配方和實驗參數,並通過對合金鍍層的成分含量測定、形貌結構分析和力學磁學性能評估,研究了稀土元素、超聲波、磁場介入化學沉積多元鈷基軟磁薄膜工藝后,對合金成分、結構和性能的作用機制。The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage
利用掠入射x射線分析( gixa )技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射( saxs )技術測量了薄膜的厚度;採用原子力顯微鏡( afm )觀察了薄膜的表面形貌;運用能量損失譜( eds )及x射線熒光光譜( xrf )對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。The author makes a mathematics model by viscous hydrodynamics and so on theories of the flowing material a and b on the board, and deduces the formulas of the film thickness and perfusion measure. i also analyze the surface tension of liquid, in order to find out the best technical parameters and to control
作者利用粘性流體力學等理論建立了a 、 b混合料在太陽能電池板上流動的數學模型,從而推導出薄膜的厚度和灌注量的計算公式,並對所形成液面的表面張力進行分析,以找出最佳的技術參數,以便對其進行控制。Two coating approaches were adopted, one was to do next coating after 550 ? heat - treatment ( called a coating technique ) ; the other was to do next coating after 100 ? drying, the films coated by several times were heated at 550 ? ( calied b coating technique ). xrd, sem, tem and afm were used to characterize the crystallization behavior, orientation and surface morphology of the zno thin films
運用xrd 、 sem 、 tem以及afm等對所得的樣品進行了分析和研究,結果表明:採用不同的旋塗工藝得到不同的薄膜厚度,而採用每次塗膜形成氧化物膜后再進下一次塗膜的方式能更好的保持zno薄膜的c軸擇優取向生長。The results were summarized as follows : ( 1 ) diamond - like carbon films could be fabricated by plasma source ion implantation ; it was found that different parameters such as the negative voltage, frequency, gas flux influenced sp3 bond ratio of dlcs, the paper described the effect in details and showed that diamond - like carbon films with increasing negative voltage, reducing frequency, appropriate gas flux got high proportion of sp3 bond ; dlcs prepared by psii contained a good deal of sic, the composition affected its properties ( such as the films hardness ) ; psii method could offer good adhesion to dlcs, but it caused the surface morphology to become asperity
研究結果表明: ( 1 )用全方位離子注入技術能夠制備出類金剛石膜。在全方位離子注入技術中,不同的偏壓、頻率、氣體流量都對薄膜中sp ~ 3鍵比例有所影響,文中對具體的影響進行了分析,發現偏壓增加、頻率降低和適中的氣體流量可以制備出含sp ~ 3鍵較多的類金剛石膜;同時發現用全方位離子注入技術制備的類金剛石膜含有大量的sic成份,這對薄膜的性能(例如硬度)影響很大;用全方位離子注入制備的薄膜其結合力得到增強,但薄膜的表面形貌差。In this work, the influences of fabrication process on microstructure, dielectric properties, ferroelectric properties and pyroelectric properties of plt films have been studied. plt films were prepared on the pt ( 111 ) / ti / sio2 / si ( 100 ) substrates by radio frequency magnetron sputtering method and then annealed by rapid thermal annealing process ( rta ) or conventional furnace annealing process ( cfa ). with the help of atom force microscopy ( afm ), x - ray diffraction ( xrd ) and some other apparatus, it was found that : lower substrate temperature ( ts ) was helpful for plt films to form better surface morphologies. with the increase of substrate temperature, the dielectric constant of plt films increased
Afm 、 xrd以及性能測試結果表明:較低的基片溫度有利於形成表面均勻緻密的薄膜,且薄膜的表面粗糙度均方根較小;隨著基片溫度的升高,經過快速退火的plt薄膜的介電常數逐漸增大;相比于傳統退火,快速退火縮短了退火時間,提高了薄膜的介電和鐵電性能;快速退火隨著保溫時間的延長,大部分鈣鈦礦結構的特徵峰的峰強增大,半高寬減小,峰形越來越尖銳,但當保溫時間為80s的時候, ( 100 )和( 110 )峰的強度有所下降,因此保溫時間在60s較為適宜。Efficacy : rose essence can instantly permeate into hair and form thin and firm smoothing protective film on the hair surface to make hair soft and silky
功效:蘊含玫瑰精華能瞬間滲透至發絲深層,並在秀發表層形成薄而緊致的順滑保護膜,令秀發擁有與生俱來的柔滑,如絲般的感受。For the effects of dimension and surface, the lattice structure, chemical states and the electronic states in the film surface ( interface ) have greatly affected the properties of the films and the practical applies in industries
由於納米材料的小尺寸效應及表面效應,薄膜表(界)面的晶格結構、化學形態和電子態成為決定薄膜性能的重要因素,而這些因素又直接影響著鈦酸鋇系薄膜的實際應用。The residual stress in the thin films may lead the crack, hillock formation, or delamination or completely failure of the thin films
薄膜中的殘余應力可能會造成薄膜的開裂、表面形成小丘凸起或翹曲,導致鐵電薄膜器件失效。分享友人