蝕刻器 的英文怎麼說
中文拼音 [shíkèqì]
蝕刻器
英文
etcher-
In han culture circle there seems no such weapon with complex pattern on steel, especially in early time. moreover, how to add that pattern ? carve ? corrade
漢文化圈裡好象不會出現這種在鋼鐵上有復雜花紋的兵器，特別是早期。而且，那個花紋是如何弄上去的，鏨刻？腐蝕？This paper mainly discusses the designing and testing method to the dds acousto - optic mode locking. it also makes some further analysis on the critical technology - - - - - - the transducer acoustical membrane matching and transducer thinning, which can directly affect the performance of acousto - optic elements. it then analyses the heat effect of acousto - optic elements and the technology of transducer thinning by developing ion - beam sputtering of high frequency acousto - optic elements
本文重點討論了dds聲光鎖模器的設計及測試方法，討論和分析了影響聲光器件性能的關鍵工藝換能器聲學膜層匹配和換能器減薄工藝，對聲光器件的熱效應進行了測試分析，對離子刻蝕法聲光換能器減薄新工藝作了一定的探討。The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated
對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。Once it was new glassware, and his discerning eye immediately spotted an error in the presidential crest etched on the glass.
有一次，他那對明察秋毫的眼睛一下子就看出一件玻璃器皿上面蝕刻的總統像的紋飾有毛病。When the two layers of sio2 with different refractive index are finished, the designed mask pattern is printed on the film by photolithography. after that, icp is performed for dry etching, then, the waveguide structures are obtained. at present, the rudimental graph of edg has been obtained
兩層不同折射率的sio _ 2薄膜制備好之後，經過光刻、等離子體刻蝕（ icp ）的工藝步驟之後，形成了波導結構，初步製作出了器件的圖形。At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography
目前，場致發射陣列陰極的應用領域十分廣泛，主要包括微波器件（應用於twts ， klystron等） 、平板顯示器（ feds ） 、電子顯微鏡及電子束刻蝕系統等。其中，應用研究的焦點主要集中在平板顯示器和射頻功率放大器。Although the rigidity is 45hrc, toolox44 is easy to process, especially suitable for manufacturing plastic moulds with the help of its good polishing and etching performance. the other applications include rubber mould, forming mould, machine parts, and wearable parts
盡管硬度? 45hrc toolox44很容易加工，特別適合製造塑料模具，因?它的拋光和蝕刻效果很好。其他應用領域包括：橡膠模具成型工具機器部件耐磨部件。We had fabricated the variable optical attenuator of mmi structure with ridge wave - guide structure and also studied the reactive iron etching of silicon. at last, we tested the variable optical attenuator and draw some conclusions. after testing, we can draw a conclusion that the technology parameter of the device is ideal
在分析y分支和多模干涉器型（ mmi ）的光學衰減器結構的基礎上，採用脊形波導結構製作了mmi結構的可變光學衰減器，並對硅的刻蝕技術進行了研究和探討，最後對制得的器件進行了測試研究。Polarization dispersion analysis for etched diffraction grating demultiplexer
刻蝕衍射光柵解復用器的偏振色散分析A driving signal with a dc bias voltage and ac voltage is usually necessary for sensing very small capacitance. the reliable operation conditions of the capacitive sensor for foreign acceleration had been researched with the assumption of the parallel comb plates. but the comb plates are actually not parallel for the reason of the drie process
前人在研究外界加速度信號對傳感器的作用時，假定驅動信號產生的靜電力作用在平行梳齒電容極板上，但是，在用drie工藝對硅進行刻蝕時會產生側蝕效應，從而得到的梳齒電容有一定的傾斜角度。The accelerometer which has simple fabricated process and high sensitivity and small parasitic capacitance and residual stress is hybrid integrated with the interface circuit using ic nude chip. so the density of the package is increased, and the noise of the sensing system is decreased. these found the base of capacitive accelerometer module using the mcm method
該傳感器製作工藝簡單，靈敏度高，支撐梁採用u型，減小了刻蝕后的殘余應力，用玻璃作為襯底，減小了襯底和硅可動質量塊間的寄生電容，且把傳感器晶元和用ic裸片製作的介面電路集成在一起，提高了封裝密度，減小了傳感器系統的噪聲，為採用mcm技術製作電容式加速度傳感器模塊打下了基礎。Particulates can emanate from process equipment (e. g., in cvd and etch reactors)as well as from humans (from street clothes, skin flakes, etc. )
塵粒也能由工藝設備（如化學氣相淀積和刻蝕反應器）以及工作人員（身穿的外套，體表的皮屑等）而產生。A set of icp etching system has been designed and manufactured through the analysis of the probe diagnosed results. during the study of the system, the emphasis is laid on the matching problem of icp coupled antenna via the rf matching device and rf power source
通過對探針診斷結果的分析，設計並製作一套icp刻蝕系統，重點研究icp耦合天線通過射頻匹配器與射頻功率源的匹配問題，得到很好的匹配效果，在射頻輸出功率為500w以內時，反射功率小於10w 。A different approach, named " two step growth approach " has been applied to fabricate an 8x8 photodiode array in the first time. the micro - processing procedures of this photodiode array including standard photolithography, a number of metallisation, wet - chemical etching and sic2 deposition for insulation were developed in this study
首次採用「兩步法」制備出了新穎的8 8zns肖特基光電二極體陣列，詳細研究並確定了制備該器件的標準光刻、金屬沉積、濕化學腐蝕、 sio _ 2絕緣層沉積等一系列微電子處理工藝。It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。Plasma etching has been widely used in the etching process of si devices. now the study is focused on the microfabrication of compound semiconductor
等離子體干法刻蝕在硅器件的微細加工中已經得到廣泛應用，目前研究的焦點集中在化合物半導體。Based on this simulation method, the following novel designs are developed : 1, the two - stigma design, which can reduce the aberrations and improve the imaging of the grating ; 2, the flat - field design, which can omit the output waveguides and make an edg easier tc fabricate ; 3, the passband flattening design, which can relax the requirements on wavelength control for lasers and filters in a wdm system ; 4, the reduced back - reflection design, which guarantees very little reflection light back into the input channel and improves the feature of the return loss
本論文以用於光通信中的平面集成蝕刻衍射光柵為研究對象，具體的分析了的它的工作原理和設計思想，並給出了設計中的經驗和方法。器件設計后需要進行性能計算和模擬以減小復雜的集成光器件製作試驗，本論文描述了計算蝕刻衍射光柵比較準確的模擬方法，其結果能夠很好的接近實際情況。基於這樣的模擬計算方法，本論文提出了改進蝕刻衍射光柵設計的幾種方法： 1The sense of this work is to gain a further understanding of helium in the two metals. on the diffusion of helium - 3 in two spherical shell samples made of 21 - 6 - 9 type of stainless steel, during the storage of tritium at the pressure of 6. 13mpa for about 4 and 6 years at room temperature and later exposed to air for another 3 and 1 year. first, a calculation based on the analytical and numerical method to the diffusion and decay theories was developed to evaluate the concentration distribution of helium - 3 by tritium diffusion and decay in the samples
在不銹鋼氚衰變~ 3he的擴散行為研究中，建立了氚和~ 3he濃度分佈的解析解和數值計算方法，以評估充氚不銹鋼球形容器壁中氚衰變~ 3he的宏觀濃度分佈，同時還用數值計算方法以求解氚和~ 3he的多步擴散行為；對樣品表面逐層蝕刻、同時收集釋放的~ 3he進行分析，分別實測了經室溫條件下在6 . 13mpa高壓氚中貯存4年和6年、空氣中存放3年和1年的兩種21 - 6 - 9不銹鋼球殼樣品內壁中~ 3he濃度分佈；結果表明：由於he在金屬中的不可容性， he原子偏聚于不銹鋼表面以及內部的局部區域，在整體趨勢上， ~ 3he分佈與計算結果相一致，根據理論計算，兩種21 - 6 - 9不銹鋼球殼樣品內壁中~ 3he到達的深度分別為350 m及500 m 。As the key device of a dwdm system, etching diffraction grating ( edo ) is one of the most potential types of planar waveguide dwdm devices
作為波分復用中最關鍵的器件，蝕刻衍射光柵（ edg ）是平面波導密集波分復用器件中很有發展潛力的一種。Among all kinds of demultiplexers, etched diffraction gratings ( edgs ) are regarded as one of the most potential types of planar waveguide wdm devices. this phd thesis focuses on the design, simulation and fabrication of edgs for optical communications
蝕刻衍射光柵是採用平面波導技術製成的集成密集波分復用器件，它具有通道損耗低、串擾小、器件尺寸小、容易擴展通道、製作和封裝工藝相對簡單等優點。分享友人