蝕刻圖 的英文怎麼說

中文拼音 [shí]
蝕刻圖 英文
etch figures
  • : Ⅰ動詞1. (損失; 虧耗) lose 2. (腐蝕) erode; corrode Ⅱ名詞(天體現象) eclipse
  • : Ⅰ名詞1 (繪畫表現出的形象; 圖畫) picture; chart; drawing; map 2 (計劃) plan; scheme; attempt 3...
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Metal & flexible stencil was etched by two positive graphics through two sides and the erodent was done in the direction of horizontal and perpendicularity

    金屬模板和柔性金屬模板是使用兩個陽性形通過從兩面的化學研磨來的。在這個過程中,不僅按設計的垂直方向進行,同時在橫向進行。
  2. Three potentials pertinent to various etching techniques are labeled in fig. 10.

    與各種技術有關的三個電勢標出在10中。
  3. The resolution of an etching process is a measure of the fidelity of pattern transfer.

    工藝的解析度是形轉移保真度的量度。
  4. Electron-beam lithography with a novel multilevel resist structure defines the pattern.

    採用新型的多層抗劑結構的電子束光來形成形。
  5. The design of manganin film and copper film were etched by the first time

    首次採用以半導體光的方法來錳銅敏感薄膜和銅電極薄膜的形。
  6. Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]

    接著,光法用一種類似照相暗房中進行的過程(見右頁) ,把案的尺寸縮小。
  7. Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing

    建立準確描述由於掩模製造工藝、光膠曝光、顯影、所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光工藝模型,有助於開發由成品率驅動的版設計工具,自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。
  8. Single particles irradiating scattergrams of china map profile etched on cr - 39 film

    39膜上中國地邊界研究
  9. When the two layers of sio2 with different refractive index are finished, the designed mask pattern is printed on the film by photolithography. after that, icp is performed for dry etching, then, the waveguide structures are obtained. at present, the rudimental graph of edg has been obtained

    兩層不同折射率的sio _ 2薄膜制備好之後,經過光、等離子體( icp )的工藝步驟之後,形成了波導結構,初步製作出了器件的形。
  10. Theoretical and experimental research of minimum incidence angle of prism

    離子束入射角對形側壁陡度影響的研究
  11. P - type silicon crystal plates have been adopted in the text, which are formed mask sio2 by heat - oxygenation. and figures are diverted by normal light etching technology

    本文採用p型單晶矽片,由熱氧化形成sio _ 2掩膜層,標準光工藝進行形轉移,用koh溶液濕法製作倒四棱錐腐坑列陣。
  12. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光的原理、理論、實現方法及傳統光掩模?全息掩模?抗形傳遞機理進行了深入的研究,設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光實驗系統,進行了實驗研究。
  13. Compared with the conventional chemical etching, laser assisted wet chemical etching can eliminate the effect of crystal orientation efficiently and fabricate more diversified etched pattern ; compared with the laser assisted gas chemical etching, the required condition for laser wet etching can be realized more easily and the operation can be simplified ; compared with the ion etching, it has advantages of no ion damage to substrate, avoiding over - etching and cost - effective

    半導體的激光誘導液相腐與普通化學腐相比,可以有效地消除晶體取向影響,製作出更加多樣化的腐形;與激光誘導氣相腐相比,其工藝條件更加容易實現,操作更加簡單;與干法離子相比,對基片無離子損傷,過度腐容易控制,成本低。
  14. Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation

    用核粒子照射塑料薄膜形成徑跡,再經化學試劑和成像技術,得到由微米級微孔組成的案.這種案具有物質透過特性.用這種方法生產的核徑跡防偽標志,具備核尖端技術不易擴散,製作設備不易得到,產品用其他方法難以偽造,防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測,可以用於各種商品(包括食品)的包裝
  15. The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer

    最常用的步驟是用光或電子束法,在矽晶圓表面的光阻層上製作出案。
  16. Although the creation of a finely detailed bas - relief master is expensive because it requires electron - beam lithography or other advanced techniques, copying the pattern on pdms stamps is cheap and easy

    雖然得花上大筆金錢,才能以電子束或其他高階技術製作出有精密細節的淺浮雕主片,但要復制pdms壓模的案卻是便宜又容易。
  17. Depending on how long a single piece of foil is utilized - in attempts to block the pulsing microwave energy - will determine how many lines are etched in the foil

    這取決於一個單張的金屬箔被用了多久-在試組織微波的脈沖能量-這將決定了有多少條線將被在金屬箔上。
  18. The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars

    要在晶片上做出小於100奈米的案細節,所需的光工具每件要花上幾千萬到幾億美元。
  19. In the manufacture of semiconductor devices, a photographically reduced representation of a circuit or element as used to establish an etching pattern

    在半導體器件製造中,以縮小的照相方式表示的電路或元件,用於建立案。
  20. Despite erosion and man - made destruction, the 492 caves are well preserved, with frescoes covering an area of 45, 000 square metres, more than 2, 000 colored sculptured figures and five wooden eaves overhanging the caves

    盡管腐和人為的破壞, 492個洞穴還完好保存,連同著45 , 000平方公里的壁畫, 2000多個彩色雕形,五個木製屋檐懸于洞穴之上。
分享友人