蝕刻坑 的英文怎麼說
中文拼音 [shíkèkēng]
蝕刻坑
英文
etch pit-
P - type silicon crystal plates have been adopted in the text, which are formed mask sio2 by heat - oxygenation. and figures are diverted by normal light etching technology
本文採用p型單晶矽片,由熱氧化形成sio _ 2掩膜層,標準光刻工藝進行圖形轉移,用koh溶液濕法刻蝕製作倒四棱錐腐蝕坑列陣。The mechanism of the surface change has beenstudied by the xps, sem, contract anglemeasurements. we discuss the roles of the tree main fators playing in the fiber - resin adhesion, and their relation to plasma parameters. the three main factors ars the key mechanical effects, the chemical bonding effcts and nonpolar dispersion force
表面粘接性能改善的原因是:由表面引入的多種含氧基團引起的化學鍵力和界面非極性分子色散力,由表面刻蝕坑引起的界面機械鉸鏈力。它們對界面的粘接強度的貢獻隨參數而改變。Aramid filaments are treated by a low - temperature plasma with different treatment times. the surface of filaments is observed by sem and the results show that the filament surface is smooth before the treatment and becomes more rough if filaments are treated for 6 minutes. in addition, it is found that the filament peels after 9 minutes of plasma treatment
本課題採用低溫等離子體對芳綸纖維進行表面處理后,用sem觀察纖維表面,發現未經等離子體處理的纖維表面比較光滑;等離子體處理6分鐘后,纖維表面變得粗糙,產生很多微小的刻蝕坑;等離子體處理9分鐘后,纖維表面受到的刻蝕程度明顯增加,並產生表面剝離現象。
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