蝕刻 的英文怎麼說
中文拼音 [shíkè]-
Abstract : the preparation of cuprous chloride from etching waste liquor of cupric chloride and crude copper powder was studied. the result showed that this method had many advantages, including simple process, easy operation and good quality of product, therefore it had remarkable economic and environmental benefits
文摘:以氯化銅蝕刻液廢液、粗銅粉等為原料，在常溫下反應制備氯化亞銅，工藝簡單，操作簡便，產品質量好，具有顯著的經濟效益和環境效益。Standard test method for scaling resistance of concrete surfaces exposed to deicing chemicals
暴露于防凍化學藥品的混凝土表面抗蝕刻性的標準試驗方法Upgrade conversion kit for dicker max
馬克斯自行火炮升級改造蝕刻片金屬炮管Upgrade conversion kit for dicker max upgrade conversion kit for dicker max
馬克斯自行火炮升級改造蝕刻片金屬炮管Metal & flexible stencil was etched by two positive graphics through two sides and the erodent was done in the direction of horizontal and perpendicularity
金屬模板和柔性金屬模板是使用兩個陽性圖形通過從兩面的化學研磨來蝕刻的。在這個過程中，蝕刻不僅按設計的垂直方向進行，同時在橫向進行。Mary is very keen on etching.
瑪麗很喜愛蝕刻藝術。Three potentials pertinent to various etching techniques are labeled in fig. 10.
與各種蝕刻技術有關的三個電勢標出在圖10中。I know his etchings a little.
我知道一點他的蝕刻畫。Magnetization magneto - microwave plasma etching system
磁場微波型等離子體蝕刻系統Magnetron enhanced reactive ion etaching system
磁控管增強型反應性離子蝕刻系統Mir ? also experimented in a wide array of other media, devoting himself to etchings and lithographs for several years in the 1950s and also working in watercolour, pastel, collage, and paint on copper and masonite
米羅也用相當廣泛的媒材來實驗他的想法，在1950年代時有好幾年都沉浸在蝕刻畫及平版印刷之中。Why not use photolithography to make nanostructures
為什麼不使用光蝕刻法製造奈米結構？Various technical improvements have made it possible to push the limits of photolithography
各種技術若能改進，便可推進光蝕刻法的極限。Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]
接著，光蝕刻法用一種類似照相暗房中進行的過程（見右頁圖） ，把圖案的尺寸縮小。Determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
測定在蝕刻期間光致抗蝕劑同硬表面光掩膜坯及半導體片的有效粘附性Etch, plana curved surface processing printing
蝕刻平面，曲面印刷加工Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium - dioxid coating ; optical method
半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第2部Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium monocrystals ; gravimetric method
半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第1部Several of commonly used methods are photoprinting, photoengraving, mechanical engraving, and stencil.
通常所採用的幾種儲存方法是：影印法、照相蝕刻、機械雕刻和模板。分享友人