記憶峰 的英文怎麼說
中文拼音 [jìyìfēng]
記憶峰
英文
memory peak-
Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities
通過濺射法,在玻璃襯底上淀積了tini薄膜,並在600進行了真空退火, dsc法測得其馬氏體逆相變峰值溫度為75 ,利用原子力顯微鏡,對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析,發現:生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢,晶粒緻密性差,微孔洞多;而襯底面晶粒緻密,幾乎沒有微孔洞存在。To analyse varying measuring signals a peak value memory min max and a filter function are available
為了分析變化的測量信號,還可以選擇峰值記憶功能最大值最小值和過濾功能。Optionally a peak value memory, an analogue output or a limit contact can be provided
可選功能有峰值記憶模擬輸出或極限接點。As hurst parameter estimated bias exists, the precision may be improved by using non - linear estimate, where arfima model is proposed and used for verification
從統計結果來看,樣本序列呈現出尖峰、胖尾等有偏特徵,明顯不滿足正態分佈的假設,表明收益序列可能具有長程相關或記憶性。For the digital indicator the functions actual value memory and peak value memory min and max are also available via menu
對于數字顯示器,可以通過菜單選擇"實際數值記憶保持"和"峰值記憶最大和最小值"功能。Compared the average value of experimental group with that of the control, when fed with water containing low concentration of lead, we got longer memory maintaining time in experimental groups than the control during the first few trainings and shorter time when fed with water containing high concentration of lead
訓練後期低濃度組與高濃度組記憶保持時間均低於正常組。討論正常對照組小鼠腦細胞漿pkc活性在pi至ps期間增加較緩,而在ps至n段迅速增加,並達到高峰,從n至p22段又明顯降低n為低谷,而後p30又升高。Also, the relation is built between stress and magnetic memory characteristic parameter, and measurement of magnetomechanical effect is reached
相同邊界條件下,同階振型的磁記憶特徵除峰值不同外,其它特徵量相同。By differential scanning calorimetry ( dsc ), respectively. without any supplementary method, a ti - rich alloy target ( ti - 48at % ni ) were used to enrich ti content in films during sputtering. as the first step, tini thin film is deposited on a glass substrate by sputtering, and annealed at 600
採用絲材冷軋法,制備了75 m 、 90 m兩種厚度的tini形狀記憶薄膜,示差掃描量熱( dsc )法測得其馬氏體逆相變峰值溫度分別為35 、 109 ,在濺射工藝中,採用富ti的tini合金靶( ti - 48at ni )而不是其它成分補償措施,來增加tini薄膜中的ti含量。分享友人