輔助引發劑 的英文怎麼說

中文拼音 [zhùyǐn]
輔助引發劑 英文
coinitiator
  • : Ⅰ動詞(輔助) assist; complement; help Ⅱ形容詞(輔助) subsidiary Ⅲ名詞1 (車輪外旁增縛夾轂的兩條...
  • : 動詞(幫助; 協助) help; assist; aid; support
  • : Ⅰ動詞1 (牽引; 拉) draw; stretch 2 (引導) lead; guide 3 (離開) leave 4 (伸著) stretch 5 (...
  • : 名詞(頭發) hair
  • : Ⅰ名詞1 (藥劑; 制劑) a pharmaceutical or other chemical preparation 2 (某些有化學作用的物品) a...
  • 輔助 : 1. (從旁幫助) assist 2. (非主要的) supplementary; auxiliary; subsidiary
  1. The study on salc includes : 1 ) the study on the harmonization between aeration rate and melts thickly rate ; 2 ) the study and application of the new multi - function composite additive ( nmca ) ; 3 ) the study on the durability of salc ; 4 ) the designation of the structure of new multi - functional unbearing compound wall and fast equipment mold, etc. the results show : the additive can improve the harmonization of the workability and mechanics characteristic of salc to a certain extent ; improve the volume stability of salc under different environment by enhancing the resistance to the freeze and thaw, dry and wet circle and drying shrinkage

    在salc的研究方面,主要包括氣速度和稠化速度的協調性研究、新型多功能復合外加的研製、耐久性能的研究以及新型多功能非承重復合墻體結構及其澆注成型的快速組裝模具設計等內容;結果表明:科學合理的外加在一定程度上使salc材料的工作性及相應物理力學性能得以最佳匹配,增強了salc材料對凍融循環、干濕循環及乾燥收縮的抵抗能力,使salc在不同的環境下均具有較好的體積穩定性。
  2. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積,得到了含氮量為21at的cn薄膜;研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響,給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因;入脈沖輝光放電等離子體增強pld的氣相反應,給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑;應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並氣體h _ 2 ,得到了含n量為56at的晶態cn薄膜;探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系,證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果;採用光學射譜技術對cn薄膜生長過程進行了實時診斷,得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律,給出了cn薄膜沉積的主要反應前驅物,揭示了cn薄膜特性和等離子體內反應過程之間的聯系;採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性,揭示了si原子對薄膜生長過程的影響,給出了si基表面碳氮薄膜的生長模式;在金剛石研磨和催化fe處理的si襯底上進行cn薄膜沉積,證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性,並可顯著提高晶態碳氮材料的生長速率。
  3. However, concern has arisen regarding the potential for vascular complications due to high - dose neoadjuvant therapy before transplantation

    但是,人們擔心移植前的高量新治療有可能血管並癥。
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