迅速減壓實驗 的英文怎麼說
中文拼音 [xùnsùjiǎnyāshíyàn]
迅速減壓實驗
英文
rapid decompression experiment- 迅 : 形容詞(快; 迅速) fast; swift
- 速 : Ⅰ形容詞(迅速; 快) fast; rapid; quick; speedy Ⅱ名詞1 (速度) speed; velocity 2 (姓氏) a surna...
- 壓 : 壓構詞成分。
- 實 : Ⅰ形容詞1 (內部完全填滿 沒有空隙) solid 2 (真實; 實在) true; real; honest Ⅱ名詞1 (實際; 事實...
- 驗 : 動詞1. (察看; 查考) examine; check; test 2. (產生預期的效果) prove effective; produce the expected result
- 迅速 : rapid; swift; speedy; prompt
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The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity
本實驗是採用磁控濺射方法,在不同的溫度下制備了tio _ 2薄膜,並對薄膜進行了不同溫度和時間的退火處理,通過原子力顯微鏡( afm ) 、 x射線衍射( xrd ) 、掃描電鏡( sem )等檢測手段對薄膜的表面形貌和組成結構進行了分析,結果如下: ( 1 )濺射工藝條件與薄膜沉積速度的關系表明:採用1 . 2pa工作氣壓, 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ,並隨射頻功率的增加而提高,呈近似的線性關系,在0 . 3pa 1 . 6pa氣壓范圍中,氬氣壓強升高沉積速率迅速增加,濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
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