透射光譜 的英文怎麼說

中文拼音 [tòushèguāng]
透射光譜 英文
transmittance spectra
  • : Ⅰ動詞1 (滲透; 穿透) penetrate; pass [seep] through 2 (暗地裡告訴) tell secretly; let out; lea...
  • : Ⅰ動詞1 (用推力或彈力送出) shoot; fire 2 (液體受到壓力迅速擠出) discharge in a jet 3 (放出) ...
  • : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
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  1. Under the applied voltage of 2v, the duration of colored process and bleaching process of the semisolid - state smart window was 2s and 1. 5s respectively, which denoted rapid response velocities. researches on the glass / ito / wo3 / linbo3 / niox / au all solid - state smart window were referred to the effect of each film ' s thickness on the device ' s electrochromic properties. through the test of the visible light transmittance of the colored state and bleaching state of the device, it proved good electrochromic capabilities with the dynamic optical density changed between 0. 2 - 0. 5

    並在此基礎上繼續研究了glass ito wo _ 3 linbo _ 3 nio _ x au結構的全固態智能窗器件模型,對于各薄膜層厚度對于器件電致變色性能的影響做了初步的研究,測試了器件可見范圍內的著色褪色透射光譜密度變化量在0 . 2 0 . 5范圍內,表明器件具有良好的電致變色性能。
  2. The transmittance and reflectance spectra of bn films were obtained as a function of incident photon wavelengths, and the thickness of films was measured by alpha - step meter

    用紫外-可見分度計測量了沉積在石英片上的bn薄膜的透射光譜和反,用臺階儀測量薄膜的厚度。
  3. Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg

    本文還研究了立方相含量與學帶隙的關系,在n型si ( 111 )片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜,薄膜的成分由傅立葉紅外吸收標識;用紫外-可見分度計測量了沉積在石英片上的bn薄膜的透射光譜te ( )和反re ( ) ,薄膜的厚度用臺階儀測得。
  4. Base on two - stage approach, we adjust experimental parameter to develop a new method ( three - stage approach ) to prepare c - bn thin films. the study proves that it is favorable to prepare bn thin films of high cubic phase content. depositing time and substrate bias voltage in the first stage are 5 min and - 180v respectively

    根據si片上bn薄膜的反r ( )和熔融石英片上bn薄膜的反r ( )和透射光譜t ( )各自獨立的計算了bn薄膜的學帶隙,利用兩種方法分別計算立方相含量均約為55 %的bn薄膜的禁帶寬度為5 . 38ev和5 . 4ev ,其結果均和由經驗公式計算得到的結果非常接近。
  5. To find the parameters of preparation and annealing process associated with the best electrochromic properties of these films, following researches and experiments were carried out : to compare the visible light transmittance of the colored state with bleaching state of the electrochromic films which were annealed at different temperatures and for different duration, to count the dynamic optical density change, and to test the i - v relations of these films " electrochromic cycles and their colored / bleaching response time

    對經過不同熱處理溫度和不同熱處理持續時間得到的薄膜樣品的著色褪色可見范圍內透射光譜的比較,計算薄膜動態密度變化量的大小,測試薄膜著色褪色循環伏-安關系以及薄膜著色褪色響應時間的快慢,尋求到薄膜呈現最佳電致變色性能時所對應的制備參數與熱處理參數。
  6. On the one hand, it can solve the problem of multiplicity of solutions efficiently ; on the other hand, it applies to all kinds of transmission spectra and does n ' t rely on the existence of fringe patterns or transparency

    一方面,它很好地解決了解的多值性問題;另一方面,它不依賴于干涉條紋及明區的存在,可以利用所有的測量數據,因而適合於處理各種不同的透射光譜
  7. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制,以控制沉積過程,減少金剛石膜生長過程中的缺陷,並採用儀檢測分析等離子體的可見以監測微波等離體化學氣相沉積過程;利用微波對材料的選擇加熱特性,通過構造等效方程,並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中,建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型,為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備,並對基片加熱材料進行了設計和優選,以獲取大面積均勻的溫度場區,甚至獲得大於基片臺尺寸的均勻溫度區;作為研究重點之一,開展了微波等離體化學氣相沉積金剛石的成核與生長研究,系統地研究了在( 100 )單晶硅基片上mpcvd沉積金剛石膜的實驗過程中,基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響,分別用raman、 x線衍( xrd ) 、掃描電鏡( sem ) 、紅外透射光譜( ir ) 、原子力顯微鏡( afm )對薄膜進行了表徵,確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  8. The xrd and ft - ir patterns show that the powder was transformed from amorphous to crystalline state with the increasing of urea. synthesis of ca, ca : yag powder by the mixed method was investigated

    通過xrd和紅外透射光譜的研究表明,隨著原料中燃燒劑尿素含量的升高,所得粉體由無定形態逐漸轉變成結晶態。
  9. X - ray diffraction ( xrd ), photoluminescence spectra, transmittance spectra, and van der pauw experiment are employed to study the electrical and optical properties of azo films

    並採用x線衍致發透射光譜和變溫vanderpauw測試等測量手段對樣品的結構和電特性進行了表徵。
  10. The fourier transform infrared ( ftir ) spectrum is an effective technology for studying the hydrogen content ( ch ) and the silicon - hydrogen bonding configuration ( si - hn ) of hudrogenated amorphous silicon ( a - si : h ) films. in the paper, ch and si - hn of a - si : h films, fabricated at different ratio of h2 / sih4 by microwave electron cyclotron resonance plasma chemical vapor ( wmecr cvd ) method, have been obtained by analyzing their ftir spectra that are treated by baseline fitting and gaussian function fitting. the effects of ratio of h2 / sih4 on ch and si - hn are studied

    Fourier紅外( ftir )是研究氫化非晶硅( a - si : h )薄膜中氫含量( c _ h )及硅-氫鍵合模式( si - h _ n )最有效的手段,對于微波等離子體化學氣相沉積( mwecrcvd )方法在不同h _ 2 sih _ 4稀釋比下制備出的氫化非晶硅薄膜,我們通過紅外透射光譜的基線擬合、高斯擬合分析,得出了薄膜中的氫含量,硅氫鍵合方式及其組分,並分析了這些參數隨h _ 2 sih _ 4稀釋比變化的規律。
  11. Effect of the surface of hgcdte epilayers on infrared transmission spectra

    外延薄膜表面對紅外透射光譜的影響
  12. Influence of slit width and sample interval on transmitted spectrum of porous aluminium coating inlaid with copper

    狹縫寬度與取樣間隔對鑲嵌銅多孔鋁膜透射光譜的影響
  13. In this paper, i studied transmission spectra method by which parameters of thin films can be determined explicitly and systematically

    本論文就透射光譜法測量薄膜的參數進行了較為詳細、系統地研究。
  14. The symmetry properties of the optical coherence with respect to the detuning of the light frequency from resonance show up in specific symmetries of the spectra

    研究表明,透射光譜隨薄膜厚度的增大而展寬,呈現對稱性。
  15. Many methods have been proposed in the past to measure the parameters of thin films, and the transmission spectra method is one of the most favorite methods for many people

    如何精確地測定薄膜的參數,一直是薄膜工作者非常關注的課題。在眾多測量薄膜參數的方法中,透射光譜法備受人們的推崇。
  16. The resistance of the films has been measured by the method of four feet probe. transmission has been characterized respectively by spectrophotometer. the structure feature has been measured by xrd

    用四探針法測量得到薄膜的電阻率,用范德堡實驗方法測量了薄膜的霍爾效應,用分度計測量了薄膜的透射光譜
  17. The transmittance formula included most of the film and substrate parameters, which affected the transmission spectra, was given in a simplified form, and it was rigorously derived from electromagnetic theory

    用極其簡單的形式給出了經電磁理論嚴格推導出來的率公式,該公式包含了影響透射光譜的大部分薄膜和基底的參數。
  18. The transmission spectra and reflectance spectra of the pc shift systematically with the spheres size, providing evidence of photonic crystal effects. photoluminescence measurements show efficient emission of the zno photonic crystals in the uv as well as a defect emission band at longer wavelength

    利用透射光譜及反研究了影響zno子晶體的子禁帶的工藝參數;利用x線衍儀分析了zno子晶體的結晶和取向性能;利用熒度計,研究了不同前處理溫度下的zno子晶體的致發
  19. The shimadzu uv - 3101 spectrophotometer was employed to get the uv - visible transmission and reflection spectra. both of the absorption coefficient ( a ) and optical band gap ( eg ) were calculated from the transmission and reflection spectra of the films. it was observed that eg decreased with an increase in the deposition pressure

    採用紫外-可見度計測定了納米- sic薄膜透射光譜和反,並通過樣品的透射光譜和反計算了納米- sic薄膜吸收吸收系數和學帶隙eto實驗結果表明,增大工作氣壓導致納米- sic薄膜的學帶隙的減小。
  20. A new method of simultaneous determination the multi - parameters by use of transmission spectra and simulated annealing algorithm has been presented. thin film parameters were obtained by solving the equations in inversion method from experimental transmission data

    提出了一種用透射光譜和模擬退火演算法一次性同時確定薄膜多個參數的新方法,該方法是根據所測的數據,通過解聯立方程組來反演計算出薄膜參數的。
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