透射測厚儀 的英文怎麼說

中文拼音 [tòushèhòu]
透射測厚儀 英文
penetron
  • : Ⅰ動詞1 (滲透; 穿透) penetrate; pass [seep] through 2 (暗地裡告訴) tell secretly; let out; lea...
  • : Ⅰ動詞1 (用推力或彈力送出) shoot; fire 2 (液體受到壓力迅速擠出) discharge in a jet 3 (放出) ...
  • : 動詞1. (測量) survey; fathom; measure 2. (測度; 推測) conjecture; infer
  • : 名詞1 (人的外表) appearance; bearing 2 (禮節; 儀式) ceremony; rite 3 (禮物)present; gift 4 ...
  1. Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead

    全面分析了cpt電子槍發系統形成的電子鏡像差與磁偏轉系統形成的偏轉像差;分析了蔭罩的自身度與位移對電子束著屏的影響,並由此得出結論,著屏電子束分佈(即亮度分佈)受著許多因素的影響,理論分析是半定量的,著屏電子束分佈需要用精確的器來量。
  2. The components, microstructure, luminousness, thickness and surface topography of the films were analysised via xrd, uv ? vis, xps, ellipsometric examination and stm. the photocatalytic properties of these fims are characterized by the decomposition rate of methylene blue or rhodamine b. the effect of sputtering power, temperature, o2 mass flow, bias, w - doping and sputtering time on photocatalytic properties are discussed

    採用x線衍、紫外-可見光分光光度計、 x光電子能譜、薄膜及掃描探針顯微鏡等試手段,研究分析了薄膜的組分、結構、光率、膜和表面形貌等。
  3. The transmittance and reflectance spectra of bn films were obtained as a function of incident photon wavelengths, and the thickness of films was measured by alpha - step meter

    用紫外-可見分光光度計量了沉積在石英片上的bn薄膜的光譜和反光譜,用臺階量薄膜的度。
  4. Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg

    本文還研究了立方相含量與光學帶隙的關系,在n型si ( 111 )片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜,薄膜的成分由傅立葉紅外吸收譜標識;用紫外-可見分光光度計量了沉積在石英片上的bn薄膜的光譜te ( )和反光譜re ( ) ,薄膜的度用臺階得。
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