過蝕刻 的英文怎麼說

中文拼音 [guòshíkè]
過蝕刻 英文
over etch
  • 過 : 過Ⅰ動詞[口語] （超越） go beyond the limit; undue; excessiveⅡ名詞（姓氏） a surname
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Metal & flexible stencil was etched by two positive graphics through two sides and the erodent was done in the direction of horizontal and perpendicularity

    金屬模板和柔性金屬模板是使用兩個陽性圖形通過從兩面的化學研磨來蝕刻的。在這個過程中，蝕刻不僅按設計的垂直方向進行，同時在橫向進行。
  2. In early ic fabrication practice, etch bias was usually dealt with by introducing an appropriate amount of compensation in the masking layer.

    在早期的集成電路製作實踐中，刻蝕偏差通常是通過在掩膜層上引入一個適量的修正來處理的。
  3. Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]

    接著，光蝕刻法用一種類似照相暗房中進行的過程（見右頁圖） ，把圖案的尺寸縮小。
  4. Wind as a sculptor of landforms is frequently given more credit than it deserves.

    人們往往把風對地形所起的刻蝕作用估計過高。
  5. The polyphasic and episodic tectonism of these basins usually had a significant influence on the regional deposition - erosion cycles and the depositional patterns

    盆地構造演化的階段性、旋迴性及多期的構造變革對盆內多旋迴的沉積剝蝕過程的疊加和原型盆地的疊合等可產生深刻的影響。
  6. According to theoretic and experimental investigation, crystal direction has nothing to do with forming square - holes

    通過理論和實驗研究，發現即使矽片晶向不準，仍能刻蝕出方孔列陣。
  7. When the two layers of sio2 with different refractive index are finished, the designed mask pattern is printed on the film by photolithography. after that, icp is performed for dry etching, then, the waveguide structures are obtained. at present, the rudimental graph of edg has been obtained

    兩層不同折射率的sio _ 2薄膜制備好之後，經過光刻、等離子體刻蝕（ icp ）的工藝步驟之後，形成了波導結構，初步製作出了器件的圖形。
  8. Etch - a process of chemical reactions or physical removal to rid the wafer of excess materials

    蝕刻-通過化學反應或物理方法去除晶圓片的多餘物質。
  9. In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask

    在製作工藝的研究方面，首先研究了離子束刻蝕技術，通過對離子束刻蝕過程中各個參數對刻蝕元件的表面光潔度、輪廓保真度和線寬分辨的影響分析，結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和刻蝕時間等參數。
  10. His etchings and drawings never went out of fashion

    他的蝕刻畫和素描從不過時。
  11. A large number of attempt and painstaking experiment have been done in this paper according to existing project. we also do lots of chemical and electrochemical etching research in material of lab6, and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen, wet process etching and electrochemical etching. through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode, molybdenum field emitting cold cathode, tungsten field emitting cold cathode, tungsten rhenium field emitting cold cathode, molybdenum covered with lab6 film field emitting cold cathode

    而且，目前可借鑒的參考文獻較少，圍繞著前人做過的方案，本文做了大量工作，在已有文獻介紹的基礎上，結合原有的理論和實踐基礎，摸索出了包括高溫氧作用反應離子（ rie ）刻蝕法、濕法腐蝕法和電化學腐蝕法在內的三種制備工藝，運用電化學腐蝕工藝成功制備了單尖的六硼化鑭場發射冷陰極尖錐、鉬場發射冷陰極尖錐、鎢場發射冷陰極尖錐、鎢錸合金場發射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發射冷陰極尖錐。
  12. With metal fatigue in material mechanics, this paper deduces the limestone fatigue curve of longmen grottoes by means of marble s one within the error permission. by the experiment elects the crucial factors of current vibration environment in longmen grottoes, the author contrasts the result of the experiment with its fatigue curve referred above and analyses the fatigue effect of longmen grottoes. finally, it is pointed out that after longmen grottoes have being suffered weathering and water - erosion more than 1500 years, the vibration environment is becoming an crucial factor leads to fatigue effect, especially in those weak surface carvings just like the crossings of several rifts, serious weathering places, etc

    借鑒材料力學中金屬疲勞破壞的研究手段，在誤差允許范圍內用大理巖疲勞曲線推導出門石窟石灰巖疲勞曲線。通過對石窟實際振動環境中典型要素的抽取和振動試驗，將試驗結果與疲勞曲線進行對比，分析了門石窟的疲勞破壞效應。文章指出，在經歷了1500多年的風化和流水溶蝕后，振動環境已成為導致門石窟某些薄弱點如多條裂隙交叉點嚴重風化酥解的壁面雕刻品等產生疲勞破壞的重要誘發因素。
  13. There must be something beyond my power, otherwise, how can day and night alternate so quick, all the moments i have missed, grief gnaws my heart

    一定有些什麼，是我所無能為力的，不然日與夜怎麼交替得那麼快，所有的時刻都已錯過，憂傷蝕我心懷。
  14. There must be something, which is out of my powder, or how can day alternates with night so quickly. all the moments have been missed, and melancholy erodes my heart

    一定有些什麼，是我所無能為力的，不然日與夜怎麼交替得那麼快，所有的時刻都已錯過，憂傷蝕我心懷。
  15. Compared with the conventional chemical etching, laser assisted wet chemical etching can eliminate the effect of crystal orientation efficiently and fabricate more diversified etched pattern ; compared with the laser assisted gas chemical etching, the required condition for laser wet etching can be realized more easily and the operation can be simplified ; compared with the ion etching, it has advantages of no ion damage to substrate, avoiding over - etching and cost - effective

    半導體的激光誘導液相腐蝕與普通化學腐蝕相比，可以有效地消除晶體取向影響，製作出更加多樣化的腐蝕圖形;與激光誘導氣相腐蝕相比，其工藝條件更加容易實現，操作更加簡單;與干法離子刻蝕相比，對基片無離子損傷，過度腐蝕容易控制，成本低。
  16. By increasing the h2 dilution ratio, it is found that atomic hydrogen can selectively etch amorphous phase and stabilize crystalline phase. from the study on the distance from substrate to catalyzer, choosing a proper distance can ensure the gas fully decomposed, while a relatively low substrate temperature can cause the nanocrystalline particles to lose mobility and keep their sizes. the pre - carbonization process can enhance the nucleation density and make the growth of high quality nanocrystalline p - sic films much easier

    實驗結果表明：隨著工作氣壓的減小，薄膜的晶粒尺寸有所減小；通過提高氫氣稀釋度，利用原子氫在成膜過程中起的刻蝕作用，可以穩定結晶相併去除雜相；選擇適當的熱絲距離能保證反應氣體充分分解，又使襯底具有較高的過冷度，是形成納米薄膜的重要條件；採用分步碳化法可以提高形核密度，有利於獲得高質量的納米- sic薄膜；襯底施加負偏壓可以明顯提高襯底表面的基團的活性，因負偏壓產生的離子轟擊還能造成高的表面缺陷密度，形成更多的形核位置。
  17. Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation

    用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝
  18. The insertion loss of the iwtm was about 1. 5db / mirror. the offset between the waveguide and the mirror was responsible for the loss, which could be eliminated with a higher - resolution photolithography technology and more precise control of the etched mirror position

    實驗測得iwtm損耗約為1 . 5db鏡面，損耗主要來源於鏡面和波導間的水平移位，通過提高光刻精度和鏡面腐蝕位置的控制精度，可以使性能得到改善。
  19. Xxx current production exhibits minor seeding ( metal deposits ( gold color ) in scribe lines ), which is due to batch processing of plating process due to significantly lower volumes and breaks in ordering

    該公司目前產量小幅增加（蝕刻生產線的金黃色金屬沉澱物） ，由於整理量與斷裂品大減，導致電鍍過程可採用批次加工法。
  20. I understand the circuits are etched into the wafer by repeating the photolithographic process of light exposure and chemical treatment

    我知道這些電路是通過照相平板印刷法的曝光和化學處理蝕刻到晶元上的。
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