金屬剝離工藝 的英文怎麼說

中文拼音 [jīnzhǔgōng]
金屬剝離工藝 英文
metal lift-off technology
  • : Ⅰ名詞1 (金屬) metals 2 (錢) money 3 (古時金屬制的打擊樂器) ancient metal percussion instrum...
  • : 屬名詞1 (類別) category 2 [生物學] (生物分類系統上所用的等級之一) genus 3 (家屬; 親屬) fami...
  • : 剝動詞(去掉外面的皮或殼) skin; shell; peel
  • : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
  • : Ⅰ名詞1 (工人和工人階級) worker; workman; the working class 2 (工作; 生產勞動) work; labour 3 ...
  • : Ⅰ名詞1 (技能; 技術) skill 2 (藝術) art 3 [書面語] (準則) norm; standard; criterion4 [書面語...
  • 金屬 : metal
  1. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件,本論文設計並試驗了器件的製作的全部,包括波導薄膜的沉積,掩模的設計製作,光刻,濺射薄膜,法製作掩模,干法深刻蝕,矽片切割,端面磨拋,波導對準和性能測試。
  2. It is formed when an irritant gets inside of a shell and the shell protects itself by coating the irritant with the same material of its lining. in essence it is formed in the same way pearls are formed

    在菲律賓,常見的珍珠母品是茶杯墊,一般用從珍珠貝殼內側出來的珍珠母貼在基板上,然後用一條很窄的薄片鑲邊。
  3. By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes

    研究利用常規的硅集成電路技術結合電子束光刻,反應子刻蝕和等技術制備半導體和納米結構,很好地解決了普通光刻與電子束光刻的匹配問題,提高了加效率,經過多次的實驗,摸索出一套制備納米結構的方法,首次用電子束光刻,反應子刻蝕和等技術制備出了多種納米結構(硅量子線、量子點,雙量子點和三叉指狀的柵結構) 。
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