鍍膜厚度 的英文怎麼說

中文拼音 [dùmóhòudù]
鍍膜厚度 英文
schichtdicke coating thickness thickness of layer
  • 鍍 : 動詞（用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上） plate
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 度 : 度動詞[書面語] （推測; 估計） surmise; estimate
  1. In order to solve the above - mentioned problems, the present invention provides a method for plating a polymer material with a metal film, which can form the film on the surface of polymer materials, which are difficult to plate by the prior wet plating method, at a relatively low cost in comparison to the dry plating method and exhibits a uniform thickness and a good adhesion of the metal film and further, shows a good reproducibility

    為了解決上述問題，本發明提供了一種給聚合物材料上鍍金屬膜的方法，用該方法可以在聚合物材料表面形成膜層，這是原來的工藝難于做到的，而且比干鍍成本低，鍍層厚度均勻，金屬膜的粘附性好，最後，還顯示出好的重現性。
  2. Microcracks and stresses will appear if the dropping speed, aluminum content and dropping cycles are too high. high temperature heat - treatment can eliminate and help to obtain compact thick film

    當提拉速度、溶膠濃度和鍍膜次數較大時膜內易出現微裂紋和脫落等缺陷， 550熱處理5h可以消除缺陷，獲得緻密厚膜。
  3. A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware

    本文介紹了離子束濺射鍍膜機膜厚控制的一種實用的系統，文中論述了離子束濺射鍍膜機的工作原理及鍍膜厚度控制系統的硬、軟體的實現方案。
  4. Research on test methods regarding aluminium alloy oxygenation and electroplate layer of metal furniture

    金屬傢具金屬件電鍍層和鋁合金氧化膜厚度檢測方法的探討
  5. Thickness testing method of the metal deposits and aluminum oxide films for the light industrial products. weighing method

    輕工產品金屬鍍層和鋁氧化膜的厚度測試方法.測重法
  6. The realization of the algorithm drives the research of micro - electron structure. 2. the la2o3 thin film is prepared by rf technology, the film is analyzed by arxps, the thickness is calculated by quantitative analysis software, the thickness of sio2 thin film between la2o3 and si is 0. 6nm

    利用射頻濺射鍍膜技術在si片上制備了la _ 2o _ 3膜，通過變角xps分析和多層結構的定量計算，測得la _ 2o _ 3與si襯底之間的sio _ 2層厚度為0 . 6nm 。
  7. Again the coating thickness has to be precisely made

    同樣地，鍍膜的厚度要精確地製造。
  8. Recalling high - school or college science, the coating should be quite precisely made to a thickness of 1 4 of the wavelength of light in the coating material

    回想高校或大學的科學課，鍍膜的厚度要求精確，須為在膜層物質中光波波長的四分之一。
  9. Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively

    利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究，結果顯示，所制備的薄膜為六方纖鋅礦型結構，具有高c軸擇優取向性；表面均勻、緻密，薄膜材料由許多星狀晶粒組成，晶粒尺寸大約為10 - 30nm左右；薄膜可見光透過率平均可達90 % ；對薄膜厚度以及電學性能進行了測定后發現：單次鍍膜厚度約為75 - 240nm ， al ~ （ 3 + ）離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內；分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。
  10. The capillary force can be dropped through vacuum drying process, and compact film with thickness of 6 u m was obtained by low spinning speed and few plating times

    鍍膜次數較高時膜內易產生斷層。採用真空乾燥制度后通過低速少次就可以獲得厚度約為6 m的緻密膜。
  11. In this thesis we have expatiated on the methods of the c60 thin films preparation, and the process with vacuum evaporation. the effect, which was caused by different gas pressures and other element doped, on surface morphology, structure and optical properties of c60 films have been studied by using scanning electron microscopy ( sem ), ultraviolet visible optical absorption spectroscopy ( uv / vis ) ( type : uv - 240 ), ellipsometer and x - ray diffraction

    本論文闡述了用真空蒸鍍法制備c60薄膜的方法和過程，研究了在不同氣氛下生長和摻雜對c60薄膜的表面形貌、結構和光吸收特性的影響；用xl30fge型掃描電鏡對c60薄膜表面形貌進行觀察；用uv - 240型紫外可見光雙光束分光光度計進行紫外、可見光吸收測量；用橢偏儀對薄膜進行厚度和折射率測量；用x射線衍射對薄膜結構進行分析。
  12. Abstract : the main factors including pre - coating ' s qualities and depositing process which affect the appearance, adhesion and thickness of sputtering film have been discussed in this paper

    文摘:本文對鍍層的外觀、鍍層的附著力以及鍍層的厚度的影響因數包括塗層的質量和鍍膜工藝參數進行了分析。
  13. At 500 c the curves show interference peaks. the photocatalytic performance studies show that thrice layers have better photocatalytic characteristic. and heat treatment can improve the triple layer ' s reaction coefficient

    在ti氏/ tin / ti仇多層膜中在ti02與tin之間鍍制一層適當厚度的ti膜過渡層可以提高多層薄膜的透過率。
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