鍍膜的 的英文怎麼說

中文拼音 [dùmóde]
鍍膜的 英文
cated
  • 鍍 : 動詞（用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上） plate
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 的 : 4次方是 The fourth power of 2 is direction
  1. This product is the newest filming technique, the latest achievement of usa electronic magic, it utilizes decomposition principle of electronic material to form a positive negative ions film on the surface of car coating, which has high water repellency and makes the surface of coat has more than 95 % brightness of mirror surface, lt has preeminent performance on weathering resistance, ageing resistance, oxidation resistance static resistance and wear resistance, with the force of charged ions, this product can easy removes the dirt, water drop acid rain and grease on the surface of the film and perennially and effectively protect coat surface, lt is the fourth generation car beauty and protective product which replaces glaze sealing products

    本品屬于當今最新的鍍膜技術，屬美國電子工學魔法的最新成果，它利用電子物質的分解原理，在車漆表面生成持有高撥水性的正負離子覆膜，使漆面光亮度可達鏡面光澤的95 %以上，並具有超強的耐候性、抗老化、防氧化、防靜電、耐磨性極好的功能，它利用電離子的力量，可輕松彈去覆膜表面的污垢、水滴、酸雨、油脂等，平時只需清水沖洗，便可立即使之恢復離子效應，達到長期保護漆面的目的，是取代封釉的第四代汽車美容保護產品。
  2. According to the requirements of the cng on neutron flux, critical wavelength and distance between inpile guides and the cns, the relation between the source size and the critical angle of the coating material of the inpile guides as well as neutron flux at exit of the cngs have been studied

    根據導管設計指標的需要，研究了冷源尺寸與堆內導管內壁鍍膜材料的全反射臨界角和導管系統出口處中子注量率的關系。
  3. In order to solve the above - mentioned problems, the present invention provides a method for plating a polymer material with a metal film, which can form the film on the surface of polymer materials, which are difficult to plate by the prior wet plating method, at a relatively low cost in comparison to the dry plating method and exhibits a uniform thickness and a good adhesion of the metal film and further, shows a good reproducibility

    為了解決上述問題，本發明提供了一種給聚合物材料上鍍金屬膜的方法，用該方法可以在聚合物材料表面形成膜層，這是原來的工藝難于做到的，而且比干鍍成本低，鍍層厚度均勻，金屬膜的粘附性好，最後，還顯示出好的重現性。
  4. The use of metallised fabrics is sometimes proposed to reduce the emissivity of a fabric.

    不時地有人建議採用鍍有金屬膜的織物以減少織物的發射率。
  5. The prototype is made by a concave sphere primary and a plane secondary deposited the mo / si multilayer on the fused quartz substrates. the reflectivity peak and the reflectivity uniformity of the multilayer mirrors are respectively 25 % and around + 2. 5 % at 17. 1nm

    望遠鏡主鏡為球面，次鏡為平面，所用反射鏡為在熔石英基底上鍍制mo si多層膜的euv波段反射鏡，在17 . 1nm的反射率25 ，反射率的均勻性2 . 5 。
  6. The spray pyrolysis technique has a great application potential to be a method to prepare the economical tin dioxide film for its unsophisticated equipment, low - cost and high deposition rate. in this paper, antimony - doped snoa ( ato ) thin films were deposited onto soda - lime glass by the spray pyrolysis method, using metal salts snch ? 2h2o and sbcls as precursors

    噴霧熱分解法以其設備簡單、成本低、制備樣品快等優點成為一種很有應用潛力的制備sno _ 2薄膜的方法，另外噴霧熱分解法在鍍膜玻璃的工業化生產中有著廣闊的應用領域。
  7. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  8. Tribology performance of zrcn - ti and zrcn - w films

    鍍膜的磨潤性能研究
  9. Choosing high quanlity colored glass for material, utilizing processing, we fanricate xiangyang filter. its coated surface and its specific spectral characteristic can meet your all kinds of demands

    向陽牌系列光學濾色鏡，是採用有色光學玻璃材料，經過光學加工和表面真空鍍膜的，它具有特定光譜特性。在攝影或攝像時使用向陽牌濾色鏡，定能獲得理想的效果。
  10. In this paper, the property difference of sio2 sols used for preparing thin films by esam method or sol - gel process has been discussed. three kinds of sio2 sols were prepared, catalyzed by hcl or nh3 h2o only, or hcl first and then nh3 h2o respectively ( please note : in following text, the sio2 sol catalyzed by hc1 first and then nh3 h2o and its correspondent films will be named sio2 sol 1 # and film 1 ; the sio2 sol catalyzed by nh3 h2o only and its correspondent films will be named sio2 sol 2 # and film 2 # ). through investigating the assembling properties of the sols, observing thin films " microscopic structure with tem and testing their transmissivity with 721 spectrophotometer, we find that the first kind of sol is not suitable for preparing esam films, but the last two, i. e. sol 1 # and sol 2 #, are good

    本文討論了esam法制備薄膜所用的溶膠與sol - gel法所用的溶膠在性能上的區別，在hc1或nh _ ? h _ 2o分別單獨催化和hc1 nh _ 3 ? h _ 2o分步催化三種催化條件下制備了sio _ 2溶膠（以下規定hc1 nh _ 3 ? h _ 2o分步催化的sio _ 2溶膠為1 ~ #溶膠，相應的薄膜為1 ~ #薄膜， nh _ 3 ? h _ 2o催化的sio _ 2溶膠為2 ~ #溶膠、相應的薄膜為2 ~ #薄膜） ，在通過組裝薄膜並用透射電鏡（ tem ）觀察薄膜微觀結構以及用721分光光度計測試樣品的光透射率，得出了后兩種催化方法所制備的溶膠適合於esam法鍍膜，而第一種溶膠不適于用此法鍍膜的結論，用傅立葉紅外光譜（ ft - ir ）研究了溶膠組成；用差熱失重分析儀（ dta - tg ）對膠體進行了熱分析。
  11. The phases structure of the kapton film and protective film were determined by x - ray diffraction ( xrd ) and x - ray photoelectron spectroscopy ( xps )

    用x射線衍射分析（ xrd ） 、光電子能譜（ xps ）對基體薄膜及鍍膜的物相成分、化學結構進行表徵。
  12. The range of firing temperature of ceramic tube after dipping changed from 450 c to 1000 c. the above four slurries were also respectively favorable combination with al2o3 ceramic tube, and the range of firing temperature of ceramic tube after dipping slurry varied from 1 000 c to 1400 c

    鍍膜的陶瓷管燒成溫度范圍為450 1000 。前述的四種料漿也能良好地與al _ 2o _ 3陶瓷管結合，塗覆料漿的al _ 2o _ 3陶瓷管燒成溫度為1000 1400 。
  13. Again the coating thickness has to be precisely made

    同樣地，鍍膜的厚度要精確地製造。
  14. Lower water vapor partial pressure during processing for higher quality, better adhesion and more reproducible deposition

    改善鍍膜的質量，提高薄膜的附著力和多層鍍膜能力。
  15. On the other hand, we design the vacuum equipment to research the coating technology using explosive wires

    此外，利用裝置的初級能源系統，設計了利用爆炸絲在真空腔中鍍膜的裝置。
  16. Recalling high - school or college science, the coating should be quite precisely made to a thickness of 1 4 of the wavelength of light in the coating material

    回想高校或大學的科學課，鍍膜的厚度要求精確，須為在膜層物質中光波波長的四分之一。
  17. The input of the heater is controlled with proportional - integral - differential ( pid ) logic. the flux of the cooling fluid is regulated by electronic expansion valve

    系統採用pid演算法控制導電鍍膜的加熱量，同時使用電子膨脹閥調節冷卻介質的流量。
  18. The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron - beam evaporation and plasma enhanced eb evaporation process were reviewed

    摘要介紹了新一代連續帶鋼鍍膜技術真空鍍膜的工藝特點及應用現狀。
  19. This paper describes the theory of oxide vacuum coating and the form mechanism of film. it is discussed the technique that nonmetal is conated on polymer. the barrier performance of this new material that is produce by using different deposited method and raw materials is compared

    論述了非金屬真空鍍膜的蒸發理論和鍍層的形成機理，討論了非金屬鍍膜的技術方法與工藝，比較了不同蒸鍍原料與方法對材料阻隔性能的影響與效果。
  20. This paper mainly discusses the performance specification of plasma source ( gis ), technology and quality of tio2 and sio2 coatings and the technology for large antireflection coatings deposited with plasma - iad. the research shows that the index of optical coating increases remarkably by using plasma ion assisted deposition and approach to the massive material further, the coating structure is more compacted than the one obtained through conventional deposition method and the adhesive power is high as well

    研究了用於輔助鍍膜的等離子體源（ gis ）的結構原理及性能指標，並從光學特性、顯微特性和機械特性三方面著手，研究了使用等離子體源所做的單層tio _ 2膜和單層sio _ 2膜的成膜工藝與質量。
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