離子源 的英文怎麼說
中文拼音 [líziyuán]
離子源
英文
io ource-
Investigation on coloration of metal - doped sapphire by mevva ion source
離子源金屬摻雜藍寶石著色的研究Characteristics of rf ion source electromagnetic field
型放電離子源的場特性( 5 ) glassy oxide film of samples processed by mevva al / piid si covered the surface of sic coating thickly and uniformly, and left few holes as a result of a good ability of sealing, which made weight loss of sic - c / sic smaller in air at1300
（ 5 ） mevva源注入al再piid （等離子源全方位沉積） si塗層，玻璃氧化層厚而均勻，愈合性能好，孔洞少，對塗層缺陷有最佳的改性效果。復合材料在1300空氣中的氧化失重顯著降低，甚至出現增重。During ion source operating, alternating axial magnetic field and azimuthal electric field in discharge tube ionize hydrogen gas purified by hot palladium pipe, and form plasma, hi fifties year, research reports studied on rf ion source are numerous however most of them are concerned about application, and research reports relevant to discharge theory or experiment model are unfrequent
離子源工作時，放電空間交變的軸向磁場和渦漩電場激發放電管中經鈀管純化后通入的氫氣電離，形成等離子體。 50多年來，關于高頻離子源的研究報告很多，但是，這些研究主要都集中在應用研究方面，有關高頻無極環形放電離子源的理論與實驗模型研究不是很多。Duoplasmatron ion source
雙等離子體離子源Three typical ion source, radio - frequency ion source, duoplasmatron ion source and penning ion source, are usually used in neutron generator
在通過d - t反應產生中子的低能倍壓加速器中，一般採用三種類型的離子源：高頻離子源（ rf ） 、潘寧離子源（ pig ）和雙等離子體離子源（ dp ） 。A vacuum interface used for atmospheric pressure ionization ion source was designed to couple with an orthogonal - injection electrospray ionization time - of - flight mass spectrometer ( tofms )
摘要研製了一種大氣壓離子源真空介面，並已將其用於自製高解析度垂直引入式電噴霧電離飛行時間質譜儀。Construction of electrostatic accelerator rf ion source
用於靜電加速器的高頻離子源的設計和調試( 4 ) chapter vi. the theory of ion curren extraction of rf ion source is investigated, the reason of emission surface formation and its effect on ion curren extraction are reasearched emphatically
（ 4 ）對高頻離子源的束流引出原理作了理論推導和分析，著重研究了發射面的形成及其對引出束流特性的影響。Finally, the characteristics of ion curren extraction in different conditions are simulationed with magic software, and the parameter of best emission surface is obtained
最後，採用magic程序對高頻離子源不同引出參數下的束流引出特性進行了數值模擬，得到了獲得最佳的引出離子束所要求的等離子體發射面參數。Diamond - like carbon gradient film on ti6a14v alloy substrate have been prepared by means of plasma source ion implanted - ion beam enhanced deposition ( psii - ibed ). for potential applications as artificial joint materials and artificial cardiac valve materials, its trobological performance and hemocompatibility has also been evaluated in the present ph. d. thesis
本研究採用等離子源離子注入?離子束增強沉積技術（ psii - ibed ）制備了鈦合金基類金剛石梯度薄膜材料，對類金剛石梯度薄膜這一新型人工關節材料和人工心臟瓣膜材料的生物摩擦學性能和血液相容性進行了研究和評價，研究了摩擦磨損對材料血液相容性的影響。Distribution of electromagnet field in the space of h - type rf ion source is worked out derivation from maxwell equations, and three - dimensional vector graphs of e and b in the space of rf ion source are calculated and plotted by mafia software
並採用mafia軟體進行了三維實體建模，計算了高頻離子源放電擊穿前和穩定工作后的電磁場分佈，得到了高頻離子源放電空間電磁場分佈的直觀圖像。On - line measurement of microwave power in ecr ion source
離子源中的微波功率在線測量Studies of microcluster ion source using in tandem accelerator
用於串列加速器的微團簇離子源研究Study of lmis emitting tip
液態金屬離子源發射尖端模型的研究Extraction property of rf ion source
離子源引出特性的研究Electron impact ion source ; ei source
電子轟擊離子源Fast stom bombardment, fab
快速原子轟擊離子源Crucible type solid source
坩堝型固體離子源( 3 ) chapter v. plasma characteristics of rf ion source is investigated. a zero - dimensional numerical dynamic colisional radiative atomic and molecular ( cram ) model is suggested to simulate the microphysical process. all species " population number densities in plasma are calculated in non - thermodynamics equilibrium condition, and proton content in extracted ion current are measured with 60 ? magnetic analyzer
（ 3 ）提出了高頻離子源等離子體的零維cram模型（ collisionalradiativeatomicandmolecularmodel ） ，計算了非平衡態（ nte ）下等離子體中分子、電子、離子、基態原子、激發態原子等粒子濃度，並在zf - 200kev中子發生器上，用60磁分析器實驗測定了引出束流的質子比。分享友人