離子鍍膜機 的英文怎麼說
中文拼音 [lízidùmójī]
離子鍍膜機
英文
ion plating equipment- 離 : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
- 子 : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
- 鍍 : 動詞(用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上) plate
- 膜 : 名詞1. [生物學] (像薄皮的組織) membrane 2. (像膜的薄皮) film; thin coating
- 機 : machineengine
- 離子 : [物理學] ion
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Character of magnetic filtering ion platting machine
磁過濾離子鍍膜機特點Vacuum coating machine, vacuum coating equipment, diffusion pump, vacuum plating factory, vacuum coating, ion injector, vacuum thermal treatment, vacuum thermal treatment equipment, vacuum equipment, thermal treatment equipment - longkou bite vacuum technology co., ltd
真空鍍膜機,真空鍍膜設備,擴散泵,真空電鍍廠,真空鍍膜,離子注入機,真空熱處理,真空熱處理設備,真空設備,熱處理設備-口市比特真空技術有限公司A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware
本文介紹了離子束濺射鍍膜機膜厚控制的一種實用的系統,文中論述了離子束濺射鍍膜機的工作原理及鍍膜厚度控制系統的硬、軟體的實現方案。The product widely applies in profession domain and so on the galvanization, ion coating, electron, mechanical hardware components, automobile, aviation, national defense weapon, clock and watch, glass product, chemical fiber, medical instrument, liquid crystal, optics, jewelry, bearing
產品廣泛應用於電鍍離子鍍膜電子機械五金零件汽車航空國防武器鐘表玻璃製品化纖醫療器械液晶光學珠寶軸承等行業領域。Magnetic filtering ion plating machine
磁過濾離子鍍膜機Magnetic filtering ion plating machine - product - longkou bite vacuum technology co., ltd
磁過濾離子鍍膜機-產品廊-口市比特真空技術有限公司Magnetic filtering ion plating machine, short named fad, is one advanced plasma plating technology
磁過濾離子鍍膜機是近年來我所研發成功的一種先進的等離子體鍍膜技術,簡稱fad 。It can also install several filtering arc source so it can make special multi - layer plating and mixed platting
另外磁過濾離子鍍膜機可裝備多個磁過濾弧源,因此可以制備特種多層膜或混合膜。Application of multiple plasma arc discharge vacuum magnetron sputtering coating plant in ceramic surface decoration
磁控等離子多弧真空濺射鍍膜機在陶瓷表面裝飾的應用Cubic nitride boron ( c - bn ) films have been prepared at room temperature ( 25 ) by radio frequency plasma enhanced pulsed laser deposition ( rf - pepld ), assisted with substrate negative bias. in this paper, we primarily studied the effect of laser energy density, radio frequency power, substrate bias and depositing time on the growth of c - bn films, and analyzed the formation process and mechanism of c - bn films deposited by rf - pepld method at room temperature
本文採用偏壓輔助射頻等離子體增強脈沖激光沉積( rf - pepld )方法在常溫下( 25 )制備立方氮化硼( c - bn )薄膜,初步研究了薄膜沉積參數:激光能量密度、射頻功率、基底負偏壓和鍍膜時間對立方氮化硼薄膜生長的影響,並分析了常溫下用rf - pepld方法沉積立方氮化硼薄膜的形成過程和機理。This paper mainly discusses the performance specification of plasma source ( gis ), technology and quality of tio2 and sio2 coatings and the technology for large antireflection coatings deposited with plasma - iad. the research shows that the index of optical coating increases remarkably by using plasma ion assisted deposition and approach to the massive material further, the coating structure is more compacted than the one obtained through conventional deposition method and the adhesive power is high as well
研究了用於輔助鍍膜的等離子體源( gis )的結構原理及性能指標,並從光學特性、顯微特性和機械特性三方面著手,研究了使用等離子體源所做的單層tio _ 2膜和單層sio _ 2膜的成膜工藝與質量。分享友人