電刻器的 的英文怎麼說
中文拼音 [diànkèqìde]
電刻器的
英文
electrographic-
As one of the most important applications, cmr bolometer is fabricated using the lacamno3 films, which has a metal - insulator transition temperature at 300k. the archetypal bolometer is fabricated after the film is photolithographed, evaporated au electrodes and fixed
以製作室溫超巨磁電阻測輻射熱儀為目標,將t _ ( mt ) 300k , tcr 5的薄膜進行光刻、電極製作、封裝等處理製作測輻射熱儀原型器件。Appling closed loop control strategy in the power factor dynamic compensation system. then the key techniques, for example, the fashion of real time sampling idle current and the fashion of compensation capacitor connected with, the time when the compensation capacitor are thrown up, are researched
針對本系統的應用對象,確定了本系統中所應用的無功電流實時檢測理論和方式、補償電容器接線和分組方式、補償電容器投入時刻的選擇等關鍵技術;並對can技術應用於功率因素動態補償系統進行了研究。Determining pinhole density in photoresist films used in microelectronic device processing
微電子器件加工過程用的光刻膜中針孔密度的測定The result is a surprisingly good. “ i was developed for the purpose of research into natural human - robot communication, ” repliee says in velvety prerecorded japanese, raising its arm in instantaneous response to a touch picked up by its piezoelectric skin sensors
復制人一號皮膚上的壓電式感測器一偵測到碰觸,會立刻舉起手臂,透過柔和的語調以預錄的日語說:我出現的目的,是為了研究真人與機器人之間的自然溝通。This is not a malfunction. in this case, lower the volume level and wait for a few moments until the unit resumes normal operation
這並非故障。此時,請調小音量電平並等候片刻至機器恢復正常的操作。In the dissertation, the effects of the air slide - film damping on the capacitive accelerometers having different slot structures which are completely or partly etched, and fabricated by the anodic bonding between silicon and glass and bulk silicon micromachining process are researched by changing the distance between the moving structure and substrate, the thickness of the structure, the width of the completely etched slot structure, the depth of the partly etched slot structure according to the two well known air slide - film damping models
對于橫向運動的體微機械器件,其周圍空氣表現為滑膜阻尼。本文基於滑膜阻尼的兩個模型,通過改變振子與襯底的間距、振子的厚度、刻透的柵槽的寬度、沒有刻透的柵槽的深度等參數,研究了這些參數對硅?玻璃鍵合工藝製作的體硅微機械電容式傳感器阻尼特性的影響。High - frequency link power converters are receiving increasing attention. when the input frequency of ac - ac converter is quite high, such as 20khz or above, in order to make sure the converter switching action is restricted to the zero crossing point of the link voltage, the switching cycle becomes discrete pulse spectrums, however, the conventional pwm converters are ruled out because they would fail either to the efficiency or the low - distortion criteria
當交-交變頻器的輸入頻率非常高,通常為20khz時,為了在零電壓條件下實現逆變器開關管的通斷,變換器的開關時刻必須選擇在高頻交流電壓脈沖為零時,這意味著變換器開關時刻在時間軸上成為不連續的點,而常規的硬開關pwm變換器是將開關時刻選擇在任意時刻。At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography
目前,場致發射陣列陰極的應用領域十分廣泛,主要包括微波器件(應用於twts , klystron等) 、平板顯示器( feds ) 、電子顯微鏡及電子束刻蝕系統等。其中,應用研究的焦點主要集中在平板顯示器和射頻功率放大器。On the base of widely investigating and researching, author deems that the conventional reactive power compensation devices used by consumer had many defects with among others : lower response time, remaining residual voltage on the compensation capacitors, and so on. because of existing improper trigging time, it is impossible to realizing balance compensation for 3 - phrase unbalance loads
本文在充分調研的基礎上,認為目前採用的傳統的無功功率補償裝置存在響應速度慢、觸發時刻不合適、補償電容器上有殘壓、不能實行三相平衡補償、對電網產生污染、不能消除負荷本身產生的高次諧波等弊病。First, mr. iwasaki of sharp corporation started with the introduction of their " aquos high vision recorder " series and its features. features of the new high vision recording technology " t3 " engine installed for high quality recording, equipped with double digital terrestrial tuners in models " dv - arw15 arw - 12 ", and " one - shot start up " function in 1 second from stand - by position with actual demonstration was made
首先由夏普株式會社的巖崎先生介紹了" aquos高清晰刻錄機"系列的特點,並說明了使用該公司的高清晰錄像的新技術" t3 "引擎的高畫質錄像與配備有地面波數字雙調諧器的" dv - arw15 arw12 "的特點,然後他還通過實機演示介紹了通電約1秒后即能工作的"瞬速啟動"模式。It is difficultly to enhance the resolution of encoders if commonly depending on thinner engraving grating. therefore, at present, the primary technology to improve the encoders " resolution is the interpolation technology of the moire stripe signal
由於單純依靠製造上刻劃更細的光柵來提高光電軸角編碼器的解析度是很難實現的,目前普遍採用光電信號細分技術來提高光柵系統的精度和解析度。We have many industry automize instruments such as temperature transmitter ( integrate temperature transmitter module ( double temperature transmitter module ), integrate temperature transmitter, track isolation temperature transmitter, hanging temperature transmitter, pressure transmitter ( expanding silicon pressure transmitter, sapphire pressure transmitter, spraying ( metal slim film ) pressure transmitter, strain pressure transmitter, ceramic resistor, capacitance pressure transmitter, 1151 and 3151 series pressure transmitter, fluid location transmitter module ( specializing for fluid location meter ), collocated electricity meter ( sigle round, double round ), signal isolation ( single round, double round ), transducer ( temperature, pressure ), display head ( showing 100 % scale, lcd fluid crystal, led digital display ), numerical instrument and so on
產品有溫度變送器(一體化溫度變送器模塊(雙支溫變模塊) 、一體化溫度變送器、導軌式隔離溫度變送器、壁掛式溫度變送器、架裝式溫度變送器) 、壓力變送器(擴散硅壓力變送器、藍寶石壓力變送器、濺射式(金屬薄膜)壓力變送器、應變式壓力變送器、陶瓷電阻、電容壓力變送器、 1151 、 3151系列壓力變送器) 、液位變送器模塊(專為液位計廠配套) 、配電器(單迴路、雙迴路) 、信號隔離器(單迴路、雙迴路) 、傳感器(溫度、壓力) 、配變送器的顯示表頭( 100刻度顯示、 lcd液晶顯示、 led數碼顯示) 、數字儀表等工業自動化儀器儀表。A driving signal with a dc bias voltage and ac voltage is usually necessary for sensing very small capacitance. the reliable operation conditions of the capacitive sensor for foreign acceleration had been researched with the assumption of the parallel comb plates. but the comb plates are actually not parallel for the reason of the drie process
前人在研究外界加速度信號對傳感器的作用時,假定驅動信號產生的靜電力作用在平行梳齒電容極板上,但是,在用drie工藝對硅進行刻蝕時會產生側蝕效應,從而得到的梳齒電容有一定的傾斜角度。The article relates that the tool ' s measurement precision has been improved by applying cycling acquisition method, self calibration function and phase - sensitive detector. the image coverage rate is improved and reached to 60 percent by increasing the number of pad ' s buttons. the tool carried out two logging functions : fast - scanner mode and dip mode
本文敘述了採用循環採集法、自刻度功能、相敏檢波等方法提高了儀器的測量精度;通過增加極板電扣的數量將圖像覆蓋率提高到60 ;實現了快掃描、傾角兩種測井模式;將測斜短節與預處理短節合二為一,縮短了儀器長度;去除了零伺服控制系統,簡化了電路;用fpga晶元對採集控制器重新設計。It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造,高分辨、大面積光柵和網格製造,在抗蝕劑性能測試、面形測量和計量等領域,干涉光刻技術都具有廣闊的應用前景。Inductively coupled plasma etching technology and its application in optoelectronic devices fabrication
刻蝕技術及其在光電子器件製作中的應用Interferometirc lithographic technology incorporates laser, interference optics, diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china. the research for this technology in theory, simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit, developing nanometer electronic and photoelectron devices, novel large screen panel display and novel lithographic equipment of our country
干涉光刻技術集激光、干涉和衍射光學及光學光刻於一體,是國家自然科學基金資助的微細加工技術和微電子領域的前沿研究課題,對其進行理論、模擬和實驗研究,對推進光學光刻極限,發展我國納米微電子和光電子器件、新型大屏幕平板顯示器和新型光刻機具有重要的科學意義和廣闊的應用前景。With the development of micro - electronics and information processing, microelectronic devices with high density, high velocity and superfrequency have been get rid of the stale and brought forth the fresh, which vastly prompt the development of the micro fabrication technologies to the field of the hyperfine, and put forward the higher requirement for the resolution of the conventional photo 1 i tho graphy
隨著微電子和信息技術的飛速發展,高密度、高速度、超高頻微電子器件不斷推陳出新,促使微細加工技術不斷向著超精細領域發展,對傳統光學光刻技術的分辨本領提出更高的要求。傳統光學光刻中提高解析度往往是以犧牲系統焦深為代價的。For the development of nc engraving machine, chapter five designs a 3 - axis step motor motion controller. the implementation of the software and hardware of the controller is discussed in detail
第五章結合計算機數控雕刻機的研製,針對基於dsp的三軸步進電機運動控制器進行了設計,並詳細討論了其實現方法。The basic calibration for a multi - decade ivd will include measurement of voltage ratio at one frequency for all separate settings of the first and second dials of the ivd
一個多盤感應分壓器的基本校正工作包括按一頻率,測量該感應分壓器的首個及第二個刻盤所有分開定位的電壓比。分享友人