電子束槍 的英文怎麼說

中文拼音 [diànzishùqiāng]
電子束槍 英文
electron beam gun
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 束 : Ⅰ動詞1 （捆; 系） bind; tie 2 （控制; 約束）control; restrain Ⅱ量詞（用於捆在一起的東西） bundle;...
  • 槍 : Ⅰ名詞1 （舊式兵器） spear 2 （兵器） rifle; gun; firearm 3 （槍形的東西） a gun shape thing 4 [書...
  • 電子 : [物理學] [電學] electron
  1. To select a cylindrical plane cathode ; to design proper focus electrodes in order to control the formation of beam in methods of solving equations, electrobath and simulation aided by computer. to correct effects of anode hole and work out curves of designing guns ; to discuss plasma cathode guns at last

    選用圓形平面陰極;設計恰當的聚束極形狀以控制電子束的成形，並使用解析法、電解槽法和數值方法三種方法進行設計;考慮陽孔效應對電子束傳輸的影響，修正陽孔效應，給出電子槍設計曲線;最後討論一下等離子體陰極電子槍。
  2. An electron gun shoots a beam of electrons at a screen coated with a substance which lights up when the electrons hit it.

    電子槍把電子束射向螢光屏，螢光屏上塗有一層被電子射束照射時能發光的物質。
  3. Function of bunching segment in multi - cell rf gun

    多腔微波電子槍聚束腔作用分析
  4. Part 2 analyses beam landing shifts made by thermal deformations of a shadow mask and vibration of a new type of shadow mask - aperture grille. an automatic measurement system for cpt decolorization and a vibration measurement system for aperture grille are established. part 3 analyses the difference of perception and discrimination to color between the human eyes and ccd system, and develops a new method based on ccd technology to evaluate the screen white - balance

    主要內容分為三部分： （ 1 ）分析著屏電子束分佈與電子槍、偏轉系統及蔭罩之間的關系，研製自動測試裝置，為設計和改進相關結構提供依據； （ 2 ）分析蔭罩熱變形和振動對顯示屏色純度影響，建立了色純漂移自動測試裝置和張緊式蔭罩振動測試系統； （ 3 ）分析了人眼與ccd對彩色刺激的不同響應，建立了基於ccd的顯示器全屏色純均勻性測試方法。
  5. Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead

    全面分析了cpt電子槍發射系統形成的電子透鏡像差與磁偏轉系統形成的偏轉像差；分析了蔭罩的自身厚度與位移對電子束著屏的影響，並由此得出結論，著屏電子束分佈（即亮度分佈）受著許多因素的影響，理論分析是半定量的，著屏電子束分佈需要用精確的測量儀器來測量。
  6. The shadow mask is the critical component of the colour picture tube and the important component for the choice of colour, its function concentrates on the limitation of electronics bound diameter and the screening direction, the electronics bound which is sent by the electronics gun goes scanning, during the scanning process, we should guarantee every bound gathering into the small holes situated on the screen, then these bounds will point to the regularized position through the small holes on the flat mask, and then three basic colours will be produced, at the same time, those useless electronics will be blocked by the mask board

    平板蔭罩是彩色顯像管的關鍵部件之一，是一個重要選色元件，其作用是限制電子束直徑和上屏方向，由電子槍發射的電子束在偏轉磁場的作用下進行掃描，掃描過程中必須使每個電子束只能射中熒光屏上的為該束指定的那些小孔上會聚，並通過蔭罩上諸多的小孔分別打到各自對應的熒光質點上，發出三種基色（紅，綠，藍） ，而無用的電子則被蔭罩板截獲。
  7. Design of electron optical system for electron gun for electron beam welding

    電子束焊接電子槍電子光學系統設計
  8. By using auto - adjusting boundary conditions and the method of three cubed spline curve fitting, the system software can recover both of the horizontal and vertical beam profile. the measurement system can also measure the beam landing screen error of cpt. it provides a important measurement and analysis tool to improve the performance of electron gun and dy, and improve the definition of cpt

    系統軟體中，提出了採用動態確定邊界條件，通過對離散采樣點的三次樣條插值曲線的擬合恢復束斑x和y方向的輪廓，本系統既能準確客觀地描述電子束輪廓，又能夠準確快速地測量電子束著屏誤差等多種參數，為cpt電子槍和偏轉系統的性能改進與解析度的提高提供了有力的測試分析和研究手段。
  9. To make pic ( particl - in - cell ) simulations. to set up models of guns and magnetic field and simulate them in the vacuum and plasma, respectively. we found that plasma held back part of space charge effects and improved trajectory of electrons. but beam would oscillate and became instable as accretion of plasma density. by simulating again and again, we draw a conclusion magic could n ' t work when plasma density was more by far than beam electron density. at last a four - stage depressed collector was simulated

    建立電子槍和聚焦系統模擬模型，分別在真空和填充等離子體條件下進行模擬。發現填充等離子體能補償部分空間電荷效應，改善電子束包絡軌跡，提高電子的流通率，但是隨著等離子體密度的增大，束電子會出現振蕩不穩定性，遺憾的是通過反復多次模擬發現本文所用粒子模擬的代表性軟體magic無法用於模擬等離子體密度遠高於束電子密度的情況。
  10. 2. to design an axial magnetic field. the cathode lies in 0. 4 - 0. 7 of peak value of the magnetic field and excursion channel in a uniform magnetic field to suppress space charge effects ; to design transition section between the gun and excursion channel in converse computation. 3

    選擇電子槍陰極處于軸向聚焦磁場峰值的0 . 4 - 0 . 7倍處;漂移通道（互作用區）位於均勻軸向聚焦磁場中，以抑制電子束的空間電荷效應;使用反演算法設計電子槍和漂移通道之間的過渡區。
  11. Due to applying double beams, the velocity spread is lower because of smaller influence of space charge compared with single beam mig. in the interaction region this beam is easy to start oscillation and reject mode competition effectively

    與單注磁控注入槍相比，雙注槍可以提供速度零散小、高束流的電子注，在互作用區更容易起振，且能更好的抑制模式競爭。
分享友人
分享到 Line

分享到臉書