電解蝕刻 的英文怎麼說

中文拼音 [diànjiěshíkè]
電解蝕刻 英文
cautery
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 解 : 解動詞（解送） send under guard
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 電解 : electrolyze; electrolysis; electrolyzation; galvanolysis 電解銅 [冶金學] electrolytic [cathode] c...
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. The silicon plates are formed reverse four wimble array in koh solution by wet - etching technology. then the electrochemical etching experiments are done in three poles electrobath. and some technology questions such as heat oxygenation, light etching, wet etching and electrochemical etching have been analyzed. at the same time sample appearances are analyzed by scanning electron microscope. according to current burst model theory, the electrochemical deep holes etching mechanism are analyzed

    在三極電解槽中，進行了電化學深刻蝕的探索性實驗。對氧化、光刻、濕法刻蝕和電化學刻蝕中的工藝問題進行了初步的理論和實驗研究，同時，採用sem對實驗樣品進行了形貌分析，並採用電流突破模型對電化學深孔刻蝕機理進行了理論分析。
  2. By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes

    研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。
  3. Study on anodic oxidation etching of pan - based carbon fiber

    基炭纖維陽極電解表面刻蝕工藝研究
  4. Then based on the principle for pcr, 20 - cycle continuous - flow pcr is designed using cad software. to the designed 20 - cycle continuous - flow pcr chip, a krf excimer laser ( direct write method ) is adopted as the fabrication technology, and the polymethyl methacrylate ( pmma ) is selected as the substrate. so the appearances of pmma surface etched before and after by 248nm excimer laser under different incident fluences are analyzed using sem

    為此在應用掃描電鏡和三維形貌分析儀對pmma表面被準分子激光刻蝕前後的形貌、刻蝕粗糙度以及單脈沖刻蝕率等進行詳細分析的基礎之上，總結出了準分子激光刻蝕pmma的宏觀規律和微觀刻蝕機制，提出了一種準分子激光刻蝕pmma的是光熱光化學以及羽輝共同作用的理論解釋。
  5. Topics on computer interface control technologies are discussed in detail, together with hardware design on control circuit, interpolation algorithm, and control software. all of our efforts are concentrated in one purpose - to establish a cnc system suitable for excimer laser micro fabrication. based on computer local bus tech.,

    本文針對由反應式步進電機驅動的微加工工作臺控制和準分子激光器外觸發控制特點，就計算機介面控制技術、硬體控制電路設計、插補演算法求解、控制軟體實現以及準分子激光微刻蝕加工過程進行了較詳細的討論。
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