電鍍液控制 的英文怎麼說
中文拼音 [diàndùyèkòngzhì]
電鍍液控制
英文
plating bath control- 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
- 鍍 : 動詞（用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上） plate
- 液 : 名詞（液體） liquid; fluid; juice
- 控 : 動詞1 （告發;控告） accuse; charge 2 （控制） control; dominate 3 （使容器口兒朝下 讓裏面的液體慢...
- 制 : Ⅰ動詞1 （製造） make; manufacture 2 （擬訂; 規定） draw up; establish 3 （用強力約束; 限定; 管束...
- 電鍍 : electroplate; electroplating; electrofacing; （electric） plating; electrocladding; galvanize; ga...
- 控制 : control; dominate; regulate; govern; manage; check; cybernate; manipulate; encraty; rule; rein; c...
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Since the dry plating does not require the reduction using electricity, the dry plating has many advantages in that it permits to plate the surface of non - conductive polymer materials, and further does not use the electrolyte solution so that wastewater is not produced and the plating thickness can be readily controlled
由於不要求用電還原，干鍍有許多優點，因為它允許對非導電性聚合物進行上鍍，其次不使用電鍍液，結果不產生廢水，而且鍍層厚度易於控制。A lot of experiments showed that the surface of carbon fibers might gain high quality plating copper coating in citrate solution and craft parameters of plating had great influence on plating copper
試驗表明採用檸檬酸鹽鍍液，可在碳纖維表面獲得優質鍍銅層，合理控制各種電鍍工藝參數對鍍銅效果有十分重要的影響。With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility
隨著薄膜科學與技術的發展，各種薄膜制備方法得到了迅速發展，傳統的所謂鍍膜，已從單一的真空蒸發發展到包括蒸鍍、離子鍍、濺射鍍膜、化學氣相沉積（ cvd ） 、 pecvd 、 mocvd 、分子束外延（ mbe ） 、液相生長、微波法及微波電子共旋（ mwecr ）等在內的成膜技術。其中電子束蒸發技術是一種常用的薄膜制備技術，它具有成膜質量高，速率可控性好，通用性強等優點。
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