非反射膜 的英文怎麼說

中文拼音 [fēifǎnshèmó]
非反射膜 英文
non reflecting coating
  • 非 : Ⅰ名詞1 （錯誤） mistake; wrong; errors 2 （指非洲） short for africa 3 （姓氏） a surname Ⅱ動詞1 ...
  • 反 : Ⅰ名詞1 （方向相背） reverse side 2 （造反） rebellion 3 （指反革命、反動派） counterrevolutionari...
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  1. The series have outstanding floatage, lightness and excellent covering effect which come into being effect of mirror surface. they may reflect light and heat

    該類產品具有非常好的漂浮力，可以漂浮於漆膜表面，能夠有效地反射光和熱；另外，還有很好的遮蓋力和白亮度，在低酸值樹脂體系中能產生鏡面效果。
  2. Therefore, in principle the scattering may be predicted from measurements of the surface profile. in this paper the author also discussed nonspecular scattering for mo / si multlayer coated primary and secondary mirrors of the measured schwarzschlid optics based on power spectral density of these mirrors measured by both optical profilometer ( wyko ) and atomic force microscopy ( afm )

    因此，我們可以通過檢測多層膜反射鏡基底的粗糙度來表徵多層膜反射鏡非鏡面散射對光學系統性能的影響，亦即通過檢測多層膜反射鏡基底的粗糙度調整拋光工藝參數，獲得低散射的多層膜反射鏡。
  3. The dissertation firstly discusses the reflectance of euv and soft x - ray in " multilayer system based on classical electrodynamics and optical characteristics of materials. the nns surface roughness in different spatial frequency range is carefully studied since scattering can seriously reduce the reflectance in euv and soft x - ray wavelength region. we discuss representative model of residual stress in

    首先從材料在極紫外、軟x射線波段的光學特性出發，討論了極紫外、軟x射線在理想和非理想多層膜系中的反射特性；研究了影響極紫外、軟x射線多層膜反射率的表面粗糙度的空間頻率范圍；重點探討了多層膜殘余應力的典型模型、應力形成機制以及薄膜的形成過程。
  4. Besides, the growth of gasb expitaxy film was monitored by reflection high energy electron diffraction ( rheed ). the rheed images and intesity oscillation are collected by computer system. it showed that the gasb film prepared in 400 was amorphous and it became monocrystalline when the temperature rose to 500. atomic force microscope ( afm ) was applied to analyse the surface morphology of the films which were grown in diffrent growth rates or substrate temperature. the analysis were compared to simulation results. the experiment results indicated it was easy to form clusters when the rate of growth is high or

    此外，本文通過反射式高能電子衍射（ rheed ）監測了gasb外延薄膜的生長，利用rheed強度振蕩的計算機採集系統實現了rheed圖像和rheed強度振蕩的實時監測。實驗發現在400生長的gasb薄膜為非晶態，溫度升高到500薄膜轉變為單晶。利用原子力顯微鏡對不同生長速率和襯底溫度生長的gasb薄膜的表面形貌進行觀察分析，並與模擬結果進行比較。
  5. Base on two - stage approach, we adjust experimental parameter to develop a new method ( three - stage approach ) to prepare c - bn thin films. the study proves that it is favorable to prepare bn thin films of high cubic phase content. depositing time and substrate bias voltage in the first stage are 5 min and - 180v respectively

    根據si片上bn薄膜的反射光譜r （ ）和熔融石英片上bn薄膜的反射光譜r （ ）和透射光譜t （ ）各自獨立的計算了bn薄膜的光學帶隙，利用兩種方法分別計算立方相含量均約為55 %的bn薄膜的禁帶寬度為5 . 38ev和5 . 4ev ，其結果均和由經驗公式計算得到的結果非常接近。
  6. Preparing anti - reflective coating and hydrogen passivation are two key procedures in the process of high efficiency crystalline silicon solar cells

    減反射膜的制備和氫鈍化是制備高效率的晶體硅太陽電池的非常重要工序之一。
  7. In this paper, amorphous tio _ 2 : w films deposited on the sildes by magnetron sputtering are studed. and the effecf of process parameters on photocatalytic properties of these films are disussed. tio _ 2 : w films were deposited on the slides with pure ti and pure w targets

    本研究課題以純鈦靶和純鎢靶為靶材，採用反應磁控濺射法在玻璃基片上制備非晶態tio _ 2 : w薄膜。
  8. This part emphasizes the synthesis of nanoarrays, aiming at controlling the size and distance of nanocrystallites using calixarene derivatives by altering the size, length and chemical structure of the organic molecules ; 2. this part emphasizes in situ synthesis strategy for fabrication of polymer network of zns based nanopowder, aiming at size controls, coating and preventing agglomeration following " one - pot " synthesis ; this method fits to low cost, large scale production ; 3. according to development in zno nanomaterials, we first report on the synthesis, characterization of amorphous zno, aiming at describing the principles and approaches of synthesis techniques, optical properties, spatial structure and doped effect ; the amorphous zno displays cage - like structure, showing a strong ultraviolet emission while the visible emission is nearly fully quenched, a potential uv - emission material ; 4

    本論文以量子結構自組裝為出發點，提出利用杯芳烴及其衍生物的化學受限反應實現尺寸可調半導體納米粒子自組裝；提出有機聚合網路原位組裝zns基納米熒光粉方法，把熒光粉的納米化、包敷、防團聚在「一鍋」反應中完成，適于低成本，批量生產；根據當前zno的研究情況，我們首次合成了非晶zno ，研究了它的光學性質，確定了它的結構，並對其摻雜進行了初步的研究，非晶zno表現出強的深紫外發光特性，而可見發射非常弱，是一種有巨大潛在應用價值的深紫外發光材料；利用非晶zno的亞穩特性，對晶化過程中非晶zno納米晶zno三維受限量子結構特性，界面特性進行了深入的研究；利用固相熱分解一般受擴散控制特性，實現了尺寸可控的zno三維量子結構的自組裝；利用非晶zno的高度分散性，容易均勻成膜特性，實現了非晶籽晶誘導低溫液相外延自組裝生長高取向zno晶體薄膜。
  9. Centering at soft x - ray multilayer uniformity technology, we introduce general situation of multilayer, design of multilayer structure, simulation calculation, ion - beam sputtering deposition and evaluation of samples. above all, we carry out study of improving uniformity of period thickness spatial distribution, and develop correction mask for controlling period thickness. as a result, we improve uniformity from 4. 5 % to 2. 0 %, the error of period thickness on ( 130nm field is controlled within 0. 18nm, and the reflectivity reach 35 % at center wavelength 17. 1nm

    特別地，我們設計並應用膜厚擋板補償技術控制多層膜的膜厚分佈，將膜厚分佈非均勻性從4 . 5減小到2 ，周期厚度絕對差值控制在0 . 18nm以內，並且制備得實際多層膜樣品在中心波長17 . 1nm處實測反射率達到35 ，達到實用水平。
  10. With single and double imported reflecting photoelectric switches, this machine can automatically correct the unevenness of the end face of various pringing and non - printing plastic films, wet glue tape and aluminium foil, etc. and it is a kind of ideal auliliart equipment for packing products

    該機具有單，雙進口反射式光電開關自動糾正各種印刷及非印刷塑料薄膜，不幹膠、鋁箔等材料端面不整齊功能，是包裝製品的理想配套設備。
  11. In succession, tini thin film is deposited on single - crystal silicon substrate using optimized parameters utilizing sputtering, and its transformation temperature ( a * ) is 72 ? indicated by dsc curve after being annealed in an ultra - high vacuum ( uhv ) chamber. in addition, the composition of the silicon - based tini film was analyzed by an energy dispersive x - ray spectroscopy ( eds ), and the ti content in the film is approximately 51at %

    按照改進的工藝參數，在單晶硅襯底上濺射-淀積了tini薄膜，並進行了超高真空退火， dsc法測得其馬氏體逆相變峰值溫度為72 ，利用能譜分析（ eds ）技術測得其ti含量約為51at ，通過對非晶tini薄膜與單晶硅襯底之間的界面進行eds及x射線衍射（ xrd ）分析，發現在用大功率（ 2000w ）直流磁控濺射法制備tini薄膜過程中，存在ti 、 ni與si的雙向擴散，發生了界面反應，並有三元化合物ni _ 3ti _ 2si生成。
  12. Firstly, as an important optical thin film, it has the many good properties of high transparence in visible region, high refractive index, high chemical stability, high strength and high degree of hardness, which applied widely to anti - reflection coatings, interference filters, electrochromism windows and thin film optical waveguides

    作為光學膜， tio _ 2薄膜在可見光區透射率高，折射率大，化學穩定性高、強度大、硬度高，是非常重要的光學膜，已被廣泛地應用於抗反射塗層、干涉濾波片、電致變色窗和薄膜光波導。
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