高壓光譜學 的英文怎麼說

中文拼音 [gāoyāguāngpǔxué]
高壓光譜學 英文
high-pressure spectroscopy
  • 高 : Ⅰ形容詞1 （從下向上距離大; 離地面遠） tall; high 2 （在一般標準或平均程度之上; 等級在上的） above...
  • 壓 : 壓構詞成分。
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 譜 : Ⅰ名詞[書面語]1 （按類別或系統編成的書或冊子等） table; chart; register 2 （指導練習的格式或圖形）...
  • 學 : Ⅰ動詞1 （學習） study; learn 2 （模仿） imitate; mimic Ⅱ名詞1 （學問） learning; knowledge 2 （學...
  • 高壓 : 1 （殘酷迫害; 極度壓制） high handed 2 [氣象學] （高氣壓） high pressure3 （高電壓） high tension...
  1. Wt has been applied to denoising, data compression, and resolution of overlapping signals in analytical chemistry that includes flow injection analysis ( fia ), voltammetric analysis, high performance liquid chromatography ( hplc ), infrared ( ir ) spectroscopy, mass spectroscopy ( ms ), nuclear magnetic resonance ( nmr ) spectroscopy, ultraviolet - visible ( uv - vis ) spectroscopy, photoacoustic spectroscopy ( pas ), extended x - ray absorption fine structure ( exafs ) spectrum, etc

    在分析化學領域中，小波變換在流動注射分析、伏安分析、高效液相色譜、紅外光譜、質譜、核磁共振譜、可見紫外光譜、光聲光譜、擴展x -射線吸收精細結構（ exafs ）譜等分析化學信號的平滑濾噪、數據壓縮、重疊信號解析等方面都有成功的應用。
  2. With the development of laser techniques, the optical cavity has played an important role on monitoring laser mode, measurement and narrowing of laser linewidth, laser mode cleaner, laser frequency stabilization, optical spectrum and cavity - qed etc., due to its advantages of ultra - low losses, high finesse and narrow linewidth

    隨著激光技術的發展，諧振腔由於其腔內損耗小、精細度高、線寬窄等特點，使得其在監視激光模式、測量並壓窄激光線寬、激光模式清潔、激光穩頻、激光光譜學、腔量子電動力學等方面起到重要的作用。
  3. A quick spectroscopic diagnostic system for the flame temperature is set up in this paper. it consists of an optic imaging system, a scanning system, a dispersive system, a photoelectricity conversion cell, operational amplifiers, a computer - based data collection system and a data processing. the temperature profile varying with the time can be quickly measured by this system

    目前光學診斷由於其相應快、精度高，屬于非接觸式測量手段，在研究中得到越來越多的應用，這里要介紹的就是本文中建立的一套光學診斷系統，它由高壓燃燒室、旋鏡掃描儀、旋鏡控制器、小型光柵攝譜儀、光電轉換裝置，微弱信號放大器以及數據採集系統組成。
  4. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  5. The morphology and structure of ti - dlc films were investigated by high resolution electron microscopy ( hrem ), atomic force microscopy ( afm ), scanning electron microscopy ( sem ) and raman spectroscopy. the mechanical properties were investigated by a mts nano indenter xp system with a berkovich indenter. the ti - dlc film with a titanium content of 27at. %

    利用高分辨電子顯微鏡（ hrem ） 、原子力顯微鏡（ afm ） 、掃描電鏡（ sem ）和拉曼光譜儀等手段分析了沉積ti - dlc薄膜的成分、形貌和結構，使用帶berkovich壓頭的納米壓痕儀（ mtsnanoindenterxp ）測試了薄膜的力學性能。
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