高流量膜 的英文怎麼說
中文拼音 [gāoliúliángmó]
高流量膜
英文
high flux membrane- 高 : Ⅰ形容詞1 (從下向上距離大; 離地面遠) tall; high 2 (在一般標準或平均程度之上; 等級在上的) above...
- 流 : Ⅰ動1 (液體移動; 流動) flow 2 (移動不定) drift; move; wander 3 (流傳; 傳播) spread 4 (向壞...
- 量 : 量動1. (度量) measure 2. (估量) estimate; size up
- 膜 : 名詞1. [生物學] (像薄皮的組織) membrane 2. (像膜的薄皮) film; thin coating
- 流量 : rate of flow; flow; runoff; discharge; throughput; (flow) rate; quantity (of flow); flux
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Patients treated with ergot derivatives who had grade 3 to 4 regurgitation of any valve had received a significantly higher mean cumulative dose of pergolide or cabergoline than had patients with lower grades
在服用麥角?生物進行治療的患者中,發生任何瓣膜3到4級返流的患者服用培高利特或卡麥角林的平均累積劑量顯著高於瓣膜返流級別較低的患者。Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate
在jgp560c型超高真空多功能磁控濺射鍍膜機上,採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜,揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大,隨濺射功率的增大沉積速率快速增大。( 2 ) on the leading edge, the film cooling effectiveness at the zone immediately downstream of the cooling holes is affected by blowing ratio and mainstream reynolds number, while the effects are not important in the downstream zone far from the cooling holes. ( 3 ) on the front half of pressure surface, the effectiveness increases with decreasing blowing ratio at the downstream near the cooling row and it is contrary at the downstream far from the cooling row. ( 4 ) on the rear pare of the pressure surface, the effectiveness decreases with increasing blowing ratio and does not vary so much downstream in the cases of higher blowing ratio
研究結果表明葉片吸力面端壁附近區域壓力系數分佈呈現出較強的三維特性,動葉吸力面尤其明顯;氣膜孔流量系數隨吹風比的增加而增大,在高吹風比情況下,流量系數逐漸趨于常數;在不同型面區域,冷卻效率分佈有較大的差異,而且吹風比與主流雷諾數的影響程度也不盡相同;低吹風比下,孔出口下游附近可以得到較好的冷卻,中、高吹風比下,冷氣射流在加速流動主流的作用下返回壁面進行二次冷卻,孔下游較遠區域可以得到較好的冷氣覆蓋。The equipment adopts centrifugal sliding plow groove rotor and is the newest structure evaporator at present. it can form membrane under the condition of small flow. comparing with that of fixed space drag evaporator, its evaporation capacity can increase 40
本設備採用離心式滑動溝槽轉子,是目前國外最新結構蒸發器,在流量很小的情況下也能形成薄膜,在簡體蒸發段內壁表面附著處理液中的淤積物可被活動刮板迅速移去,和固定間隙的刮板蒸發器相比,蒸發量可提高40 69 。According the key factors we find, we bring forward a new conception : multilevel suppressor and design a new high performance suppressor whose ion - exchange membrane has bigger areas and using three electrodes including one cathode ( anode ) and two anodes ( cathode ), at the same time we fill the suppression compartment with one kind of ion exchange resin which has moderate exchange capacity. according to our experiment ' s results, we find the new type suppressor has quite high working current efficiency and suppressing capacity. in most cases, the suppressor ' s current efficiency is over 90 % ; the suppressor can transform the naoh ( concentration : 200mmol / l, flow rate : i. oml / min, conductance : over 10000 i - i s cm " ) to pure water ( conductance : 8. 9 it s cm in chapter 3, the high performance suppressor is applied in determination some trace - amounts ions in plating solution, sewage. in this chapter, we also have a research on the gradient ion chromatography
第二章首先以xyz - 1型電化學抑制柱為例,分析了電化學抑制柱的抑制過程得出影響抑制容量的主要因素主要是抑制柱的電流效率和離子交換膜的極限電流密度,因此採用中等交換能力的離子交換樹脂作為抑制室的填料以提高電流效率,在通常情況下電流效率可達到90以上;在選用同種離子交換膜的前提下,可通過增加離子交換膜的有效面積達到提高極限電流的目的從而提高抑制柱的抑制容量,因此提出了多級抑制的概念並據此研製了共電極式高容量電化學抑制柱,該抑制柱最高可將流速為1 . 0ml / min ,濃度為200mmol / l電導率超過10000 s ? cm ~ ( - 1 )氫氧化鈉溶液抑制為電導率低至8 . 9 s ? cm ~ ( - 1 )的純水,並且具有穩定性高、分析結果準確等優點。It is shown that : with the enhancement of er effects, the pressure and the thickness of lubricant film are obviously increased, while the friction coefficient and force are increased, the leak flow is reduced
計算結果表明:隨著電流變效應的增強,油膜壓力和油膜厚度都有明顯提高,但是摩擦系數和摩擦力有所增加,端泄流量有所減小。The test research continuous two years, carry out land membrane cover, the ambient conditions that can improve garlic growth growth, raises winter spring soil temperature, maintenance has moist soil, loose, reduce moisture to evaporate run off, it is good to promote garlic to make sprout early, growth better, and take out moss early, raise output and quality, promote garlic to increase production and receipt
摘要經過連續兩年的試驗研究,實行地膜覆蓋,可以改善大蒜生長發育的環境條件,提高冬春季土壤溫度,保持土壤濕潤、疏鬆,減少水分蒸發流失,可以促進大蒜早出苗、齊苗、長勢好、早抽苔,提高產量和質量,促進大蒜增產增收。At the same time, when the thickness - diameter ratio was larger than 1, it has little influence on the discharge coefficient for the hole configuration, but when the thickness - diameter ratio was less than 1, the discharge coefficient of the hole with across arrangement is higher than that with sequence arrangement
同時,在氣膜孔厚徑比大於1時,氣膜孔的排列形式對流量系數的影響不大,當厚徑比小於1時,叉排氣膜孔的流量系數要高於順排氣膜孔的流量系數。Overpressures up to 40 bar at 500 litres min can be detected with the membrane measuring element and output in easily readable form
膜片式測量元件可以測量500升分鐘流量下最高達40 bar的過壓力,並將測量結果以便於閱讀的表格形式輸出。Air filtration portfolio, air filters, valve, oil mist machine, filter valve, oil mist separator, micro - mist separator, stability activated solenoid valve, pressure gauge, micro - valve and vacuum valves, links the release of the closure - pressure valves, and pipe connection, a one - way valve, t - shelves, shelves, brackets, diaphragm - type flow switches, blades type flow switches, further growth actuator, the valve lock, precision valve, pressure switches, mechanical pressure switches, pneumatic control ratio positioning devices, and electric - gas ratio positioning devices, and telecommunications - pressure converters, electro - pneumatic proportional valve, filter valve, shuttle valve, gas - electric relay and gas indicator, delay pneumatic valve and cylinder fcl, plumbing fcl, mufflers and exhaust cleaner, the excess flow valve with silencer, a one - way valve, rapid valve, rapid joints, rapid valve with fcl, rapid joint sub - cluster gas, micro joints, gas pipes, pipe from the devices, and helical coils, pipes, channels, scissors, multiple fastener, high - speed rotary joint, 10000 threaded joints, and insert the tube joints, rotary joints began, 68. 25 rapid joints and hoses, hose fittings and rapid non - electrostatic
空氣過濾組合空氣過濾器減壓閥油霧器過濾減壓閥油霧分離器微霧分離器穩定啟動電磁閥壓力表微型減壓閥減壓氣閥三通釋放式截流閥壓力開關管接頭單向閥t型隔板隔板托架膜片型流量開關漿葉型流量開關增速繼動器鎖定閥精密減壓閥壓力開關機械式壓力開關氣控比例定位器電-氣比例定位器電訊號-氣壓轉換器電-氣比例閥過濾減壓閥梭動閥氣-電繼電器氣源指示器氣動延時閥氣缸限流器管道限流器消聲器排氣潔凈器限流閥帶消聲器單向止回閥快速排氣閥快速接頭快速排氣閥帶限流器快速接頭集束分氣微型接頭氣喉管喉管脫離器螺旋管排管管道剪刀多管扣件高速旋轉接頭萬用螺紋接頭插入式管接頭旋式緊鎖接頭難燃性快速接頭和軟管不帶靜電快速接頭和軟管Microhardness tester indicate that the hardness increases with the increase of n2 flow rate ( ar flow rate is fixed ) and decreases with the increases of ar flow rate ( n2 flow rate is fixed )
經用顯微硬度計測試,我們發現隨著n2流量的增加(固定ar流量) ,薄膜的硬度增高。隨著ar流量的增加(固定n2流量)薄膜的硬度降低。The prepared sdse modified zirconum meinbrane was tested at the wider range of tcmperaure and pressure and differellt composihons of hydrogen mixturc gases ( i. e. different hydrgen panal pressure ) in order to examine the performance of this membrane and the sole hpermselechvity of the membrane. the results showed tha the purity of the permeated hydrgen is l00 % at the base of the detection greatest lower lanit of the qhle mass spectrometer, and there was no impurity gas passed, the permeating flux and permeability of this membrane are from several decades times to one decade times more higher than tha of a palladum membran in the range of from 593k to 773k, puv = 0. 2 ~ 0. 3mpa, pdn = 4x l04pa - - 0. lmpa, the hydrogen permeatng flux is increased with the difference of the squto root of pressure, and presents a linear relationship, the pressure seems has no influence on the permeablity, the permeabi1ity is decreased with the increasing of the temperature, and presents an exponential relationship, accondng to the fitting curve of the relationship betwen the permeability and the temperatur derived from the experimenta daa, in the range of 593k ~ 773k, pup0. 2 ~ 0. 3mpa, pha = 4 x l0 # pa ~ 0
在更寬的溫度范圍、壓差范圍內,在不同原料氣組成(即不同的氫氣分壓)條件下,對所制備的鋯表面改性膜進行了滲氫性能實驗,考核了膜對氫的唯一選擇滲透性,結果表明:在四極質譜的檢測下限內,只有氫氣存在,而無雜質氣體通過;在593k 773k溫度范圍內,鋯表面改性選擇滲氫膜具有高於鈀膜數十倍至十幾倍的滲氫流量和滲氫系數;其滲氫流量隨著膜兩側氫分壓平方根摘要差的增大而增大,並且呈線性關系;壓力對膜的滲氫系數幾乎無影響;膜的滲氫系數隨著溫度的升高而下降,井巨呈指數關系:根據對實驗數據所作滲氫系數與溫度關系曲線的擬合,在溫度593k 773k范圍內,壓差p 、 0二0With the carrier gas flux rising, the film ' s thickness and the degree of crystallization increase. the band gap decreased little, and the photocatalysed efficiency was enhanced
隨著載氣流量的增加,薄膜的厚度增加,結晶性能提高,光學帶隙變窄,光催化效率增加,親水性沒有明顯變化。It was founded that the flux increases as the feed temperature, concentration and flow rate increase, and increases as the downstream pressure decreases. the separation factor increases as the feed flow rate and downstream pressure increase, and decreases as the feed temperature increases
由試驗結果表明,溫度升高,增大料液濃度,降低冷側壓力,以及增加料液流速,膜蒸餾通量增大;同時流速提高,溫度降低,以及增大冷側壓力,分離因子增大。The flat yarn making machine is adopted micro - processor control, frequency conversion governor and setting and displaying technical data may be fully digitized on the basis of absorbing international advanced techniques. the main parts use quality products. the line enlarges l d ratio and adopts new type of separating screw and widens mixing smelt zone on the extruder screw pot which is specially processed using quality steel, fine plasticized effect, low energy consumption in relation to output
本平膜拉絲機組是我廠在廣泛吸收國外先進拉絲機組技術基礎上,採用微機控制變頻調速及可控硅直流調速等先進技術研製而成的,主要電氣元器件採用國外優質產品,整機結構設計先進控制靈敏運行平穩操作方便安全可靠生產效率高能量消耗低。Excessive or less n2o flux would lead the falling down of photocatalysed efficiency under the uv light irradiation. with the doping of n, the photocatalysed efficiency under visible light irradiation was improved obviously
N _ 2o流量過大和過小都會導致薄膜在紫外光照射下光催化性能下降, n的摻雜可以提高薄膜可見光照射下的光催化性能。But its high leakage current and poor retention is the main obstacle to its application. improving the quality of ferroelectric thin films and avoiding the reaction and diffusion between f - s interfaces is one of the crucial keys to overcome this problem. that is to say that the preparation and properties of ferroelectric thin films is compatible with the semiconductor integrated circuit
但是其漏電流過大和保持力差成為制約其實用化的最大障礙,攻克這一難題的關鍵之一就在於鐵電薄膜質量的進一步提高,盡量減少或者避免f - s界面的互擴散,也就是說鐵電薄膜的制備工藝和各項鐵電性能必須與半導體集成工藝兼容。The experiments indicate that the deposition rate will increase with the increase of the flow ratio of sihu / nhs, slightly decrease with the increase of substrate temperate, and increase obviously with the increase of rf power
氮化硅薄膜的折射率隨硅烷氨氣流量比增大而增大,隨溫度升高而略有增加,隨淀積功率增大而略為降低。By the pecvd ( plasma enhanced chemical vapor deposition ) system and the reactants of silane and ammonia, silicon nitride thin film with excellent anti - reflective and passivation effects was prepared. the relatively optimum parameters for depositing sinx thin film and the basic physical and chemical properties of sinx were investigated. the effects of substrate temperature, the flow ratio of silane over ammonia and the rf power on the refractivity and deposition rate were researched
實驗表明,氮化硅薄膜的沉積速率隨硅烷氨氣流量比增大而增大,隨溫度升高而略有降低,隨淀積功率增大而明顯增加;在襯底溫度300 ,射頻功率20w和硅烷氨氣流量比為1 : 3的條件下氮化硅薄膜的沉積速率大約為8 . 6納米分。This paper has discussed preparing diamond - like carbon films by means of micro - wave ecr plasma source ion implantation and plasma enhanced chemical vapour deposition. we use the raman spectrum, ft - ir, afm and so on to study the dlc film. the result indicates : different bias voltage, frequency and gas flow rate of psii will have impact on sp3 proportion of dlc films, we find high bias voltage, low frequency and moderate gas flow rate can prepare high sp3 proportion dlc films ; we simply illustrate the influence of bias voltage on sp3 proportion of dlc films in pecvd
研究結果表明:在全方位離子注入技術中,不同的偏壓、頻率、氣體流量都對薄膜中sp ~ 3鍵比例有所影響,文中對具體的影響進行了分析,發現偏壓的增加、頻率的降低和適中的氣體流量可以制備出sp ~ 3鍵比例高的類金剛石膜;在等離子增強化學氣相沉積技術中,對偏壓對sp ~ 3鍵比例的影響也進行了簡單分析。分享友人