argon atmosphere 中文意思是什麼

argon atmosphere 解釋
氬保護氣氛
  • argon : n. 【化學】氬〈元素名，符號為 A〉。
  • atmosphere : n. 1. 大氣；大氣層，氣圈；空氣。2. 四圍情況，環境，氣氛。3. （藝術品的）基調，風格。4. 氣壓。5. 【化學】霧。
  1. In this paper, we reported the structural and luminescent properties of si - based oxide films containing semiconductor si, ge or metal al powders prepared by a dual - ion - beam co - sputtering method ( si - sio2 films and al - si - sio2 films ) or rf magnetron sputtering technique ( ge - sio2 films ), and analyze the pl and el mechanism. 1. the composite films of si - sio2 films were prepared by dual ion beam co - sputtering method from a composite target in argon atmosphere

    我們利用雙離子束共濺射和射頻磁控共濺射技術制備了一系列含有半導體si 、 ge顆粒及金屬顆粒al的薄膜，即si - sio _ 2薄膜、 ge - sio _ 2薄膜和al - si - sio _ 2薄膜，分別對它們的結構、光吸收以及發光性質進行了研究。
  2. The theoretic cycle capacity of limno2 is 286 mah g - 1, which has attracted a great deal of people to research. aim at the impurity of limno2 which was synthesized by the predecessor and the phase change during the electrochemical process, we try several methods, including wet moist chemical method, liquid state method, solide state method and liquid dipping method. at the same time, we study the synthesis of limnc > 2 in defferent atmosphere, for example air, argon and nitrogen

    Limno _ 2具有286mah ? g ~ （ - 1 ）的理論容量，這種高容量材料深受廣大研究者的關注，針對前人合成出的還有少量雜相和在電化學循環過程中出現相變四川人學碩l :學位論文的問題，我們嘗試了幾種合成方法:濕化學法、液相法、固相法和溶液浸漬法，並在不同氣氛:空氣、氮氣和氫氣中進行limnoz的合成研究。
  3. Bell - style hydrogen furnace : the bell - style hydrogen furnace can be operated at temperature as high as 2050oc under reducing or inert atmosphere such as hydrogen, nitrogen and argon

    從美國進口的高溫真空氣氛燒結爐，最高燒結溫度2050 ，能在氫氣、氮氣以及氬氣等氣氛下完成工藝操作。
  4. Ni3al has a good wettability with tic. in purified argon atmosphere, melt ni3al can infiltrate tic preforms spontaneously

    Ni _ 3al熔體在氬氣保護下，可以自發浸滲充滿多孔tic預制體。
  5. Irradiation defects decompounded and recombined with oxygen impurity and large quantity of nucleation centers were introduced in czsi bulk during annealing at 1100. in nitrogen atmosphere, more defects were induced in fast neutron irradiated czsi than in argon atmosphere

    不同氣氛下快中子輻照直拉硅中缺陷形成的差異很大， 1100的高溫退火中，與氬氣氛相比，氮氣氛退火樣品中出現了更多缺陷。
  6. The optimized experimental conditions are determined and the densities of some elements in the mental alloy standard samples are measured. the experimental results shows that the spectral intensity of the plasma enhances significantly with the increase of the operating voltage and the power density. ( 1 ) to the steel ally sample, the emission intensities of the spectra reach to the maximum values when the laser operating voltage is 1600v and the argon pressure is 600 torr. under the same pressure, the spectral intensity of the plasma in the argon atmosphere is stronger than that in the air. when the argon pressure is 320 to rr, the signal - noise ration is about 5 times than that which the argon pressure is 700 torr, but the temperature of plasma is less about 1000k

    （ 1 ）對于光譜標鋼準樣品，當激光器工作電壓為1600v 、氬氣壓力為600乇時，譜線強度達到最大，並且在相同壓強下，氬氣中的等離子體與空氣中的等離子體相比，其輻射強度明顯增強；氬氣壓力為320乇時的譜線信背比約為600乇條件下的5倍，而等離子體溫度卻下降了近1000k ，即等離子體溫度隨環境氣壓的增大而增大；當激光束的焦斑在樣品表面上下移動時，激光誘導量、等離子體的激發溫度、譜線強度都呈不對稱性分佈，其最大值對應的焦斑位置都位於樣品表面之下0 . 4mm左右。
  7. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer

    本研究課題以氧化鋅鋁靶為靶材，採用直流磁控濺射工藝在純氬氣氣氛中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。
  8. Study on analytic precision of laser microemission spectral analysis in argon atmosphere at reduced pressure

    減壓氬氣環境下激光微區發射光譜分析精度的研究
  9. The dry atmosphere consists almost entirely of nitrogen ( 78. 1 % volume mixing ratio ) and oxygen ( 20. 9 % volume mixing ratio ), together with a number of trace gases, such as argon ( 0. 93 % volume mixing ratio ), helium, and radiatively active greenhouse gases such as carbon dioxide ( 0. 035 % volume mixing ratio ), and ozone

    干大氣幾乎完全由氮（ 78 . 1 %的體積混合比）和氧（ 20 . 9 %的體積混合比）構成，還包括一些微量氣體，如氬（ 0 . 93 %的體積混合比） 、氦，以及對輻射起作用的溫室氣體如二氧化碳（ 0 . 035 %的體積混合比）和臭氧。
  10. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively

    其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材，採用射頻磁控濺射和直流反應磁控濺射工藝在氬氣氣氛中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。
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