atomic concentration 中文意思是什麼
atomic concentration
解釋
原子濃度- atomic : adj. 1. 原子的。2. 極微的。3. 強大的。
- concentration : n. 1. 集中。2. 【化學】提濃，蒸濃，濃縮；濃度；稠密度；【礦物】汰選，選礦，富化。3. 集中注意，專心。
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In the trials of high concentration food wastewater treatment conducted by an anaerobic membrane bioreactor, the flux decline rule of four polyethersulphone ( pes ) uhrafiltration ( uf ) membranes with different surface morphology was investigated with atomic force microscopy
摘要在厭氧膜生物反應器處理高濃度食品廢水的試驗中，藉助原子力顯微鏡分析了四種表面形貌不同的聚醚碸超濾膜的通量衰減規律。 -
Surface chemical analysis - secondary ion mass spectrometry - determination of boron atomic concentration in silicon using uniformly doped materials
表面化學分析.次級離子質譜法.利用均勻摻雜材料測定硅中硼原子濃度 -
Nuclear energy - measurement of radioactivity in the environment - water - part 2 : measurement of the concentration of uranium in water by inductively coupled plasma atomic emission spectroscopy
核能.環境中放射性的測量.水.第2部分:感應耦合等離子體原子發射光譜法測量水中鈾的濃度 -
Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system
該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。 -
The images of the single crystals with different ge concentration were gotten by means of afm method. the atomic layer patterns of different crystals were gotten
利用原子力顯微鏡（ afm ）對不同鍺濃度的硅鍺單晶的形貌進行了觀察，得到了不同單晶的原子層形貌。 -
Surface chemical analysis - secondary - ion mass spectrometry - determination of boron atomic concentration in silicon using uniformly doped materials
表面化學分析.次級離子質光譜測定法.採用均勻塗料的硅中硼原子濃度測定 -
Thirty - five lead operators were selected and their blood was drawn twice, before and after the chinese new year break, and measured for lead concentration using an atomic absorption spectrometer
我們利用農歷年前及年假結束后，分別抽取35名鉛作業員工前、后兩次血液檢體，以原子吸收光譜儀分析血鉛濃度。 -
By using atomic force microscopy ( afm ) investigation on the membrane surface, different separation properties can be explained very well according to the data of pore size. increasing temperature or nmmo concentration of coagulation bath or decreasing concentration of casting solution leads to larger skin pore size, wider pore size distribution and higher values of the roughness parameters
用原子力顯微鏡（ afm ）對膜表面形態的分析表明：膜表面孔徑隨著鑄膜液濃度的降低、凝固浴溫度和濃度的升高而逐漸變大，且孔徑分佈變寬。
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