bombardment by ions 中文意思是什麼
bombardment by ions
解釋
離子轟擊離子沖擊- bombardment : n. 1. 炮擊；轟炸，轟擊。2. 痛斥，連珠炮似的提問。
- by : adv 1 在側，在旁，在附近。2 （擱）在一邊，（放）到旁邊，（存）在一旁；收著。3 （由旁邊）經過，過...
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Sputtering is the process in which material is removed from a surface as the result of a bombardment by atoms or ions with energies in excess of about 30ev.
濺射就是用能量大於30eV左右的原子或離子，轟擊材料表面，把表面上的材料除掉的過程。 -
A hydrogen and argon ions mixing beam was implanted into the deposited vanadium oxide film. after annealing, vo2 film with tcr ( temperature coefficient of resistance ) as high as 4 % was obtained. the bombardment of ar + could break v - o bond of v2o5 molecule in deposited film and implanted h + resulting in the deoxidization of v2o5, so the vo2 thin film could be prepared by proper control of the dose of ar + / h + implantation
利用離子束增強沉積設備，在ar ~ +離子束對v _ 2o _ 5靶濺射沉積的同時，用氬、氫混合束對沉積膜作高劑量的離子束轟擊，使得被氬離子轟擊后斷鍵的氧化釩分子，再被注入氫降價，然後經適當的退火，成功地制備了熱電阻溫度系數高達4的vo _ 2薄膜（國外報道值為2 - 3 ） ，並研製了單元懸空結構探測器和8 1 ， 16 1線性陣列。
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