critical roughness 中文意思是什麼

critical roughness 解釋
臨界粗度
  • critical : adj 1 批判的,批評的;(在某方面)有鑒定力的 (in)。2 吹毛求疵的;愛挑剔別人的 (of about)。3 ...
  • roughness : n. 1. 粗糙;凹凸不平,崎嶇;蓬亂。2. 粗暴;狂風暴雨。3. 未加工。4. 難聽,刺耳;味澀;不調和。5. 概略。6. 【工業】粗糙程度。
  1. The results show that, when increasing the feed rate of the grinding wheel, decreasing the rotating speed of the wafer chuck table and using coarser grit grinding wheel, the material removal rate in the wafer rotating grinding increase, the feed rate of the grinding wheel has greater influence on the material removal rate ; when suitably increasing the rotating speed of the grinding wheel, decreasing the feed rate of the grinding wheel and using finer grit grinding wheel, the wafer surface roughness can be reduced ; there exists a critical rotating speed of the grinding wheel ( about 2300rpm ), beyond which the material removal rate evidently decreases and the spindle motor current and wafer surface roughness steeply increase ; when the grit size of the grinding wheel is finer than # 2000, the material removal rate decreases and the wafer surface roughness has no obvious improvement

    研究結果表明,增大砂輪軸向進給速度和減小工件轉速,採用粗粒度砂輪有利於提高磨削矽片的材料去除率,砂輪軸向進給速度對材料去除率的影響最為顯著;適當增大砂輪轉速,減小砂輪軸向進給速度,採用細粒度砂輪可以減小磨削表面粗糙度;在其它條件一定的情況下,砂輪速度超過一定值會導致材料去除率減小,主軸電機電流急劇增大,表面粗糙度變差;採用比# 2000粒度更細的砂輪磨削時,材料去除率減小,矽片表面粗糙度沒有明顯改善。
  2. An experimental investigation on the transition in the boundary layer of horizontal plane with and without single two - dimensional roughness elements has been carried out in the wind tunnel. the distribution in normal and stream - wise directions of intensity of t - s wave excited by vibrating beam was measured in every condition. neutral curves were obtained by measuring the growth of the t - s wave at the normal critical location along the stream - wise direction

    在風洞中對水平光滑平板以及加有粗糙元平板的邊界層轉捩進行了測量與研究,比較了不同情況下平板邊界層內由振動梁激勵生成的t - s波沿流向和法向強度的分佈規律,得到了相應的振型增長曲線以及中性曲線。
  3. As the sample - chamber is an critical part of a microfluidic chip, its roughness has an direct influence on the sampling

    進樣儲液池是晶元微通道的重要結構之一,其側壁粗糙度是直接影響進樣效果的重要技術指標。
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