dc rate 中文意思是什麼
dc rate
解釋
發展中國家優惠關稅稅率-
Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate
在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。 -
A method of fuzzy optimization design based on genetic algorithm is presented as a new method of parameter optimization design for dc double closed loop speed adjusting system. the method covers three steps. firstly, speed overshoot rate and settling time are chosen as performance indice according to the demand of engineering. these indice are normalized by using fuzzy membership function and then weighted to form objective function of optimization model of the system. secondly, the dynamic response curve of the system with corresponding parameters and peoformance indice are obtained by computerized numerical calculation and simulation. finally, parameters of engineering design are expanded as searching space ; and parameters of speed regulator and current regulator are taken as genes in chromosome. these genes in searching space are optimized to get best solution by way of genetic algorithm. as shown by experimental results, the parameters designed by this method are capable of significantly improving performance indice of the system, which proves that it is a practical and effective method
提出一種基於遺傳演算法的直流雙閉環調速系統參數優化設計方法.根據工程技術的要求，選用速度超調量和過渡時間作為參數優化性能指標.將該指標用模糊隸屬度函數歸一化，再加權平均形成系統優化模型的目標函數.採用計算機數值計算方法，通過模擬獲得系統對應參數的動態響應曲線及其性能指標.最後以工程設計的參數為搜索范圍，以速度調節器和電流調節器的參數為染色體中的基因，通過遺傳演算法在搜索范圍中優化這些基因，獲得優化解.實驗結果表明，所設計的參數能使系統性能指標有顯著提高 -
It throughly solved some long time complicated questions such as high service rate in dc motor, large quantities of maintaining contact type drive controller, high energy consumption of dc locomotive
徹底解決了直流電機維修率高、換向火花及接觸組火花大、觸頭式司控器維修量大、直流電機車能耗高等老大難問題。 -
Dc - g570 mainly for the carving of artistic works suchas crystal dianmond jade and various medals portraits wood board characters. laser machine for the carving of artistic works. the processing area is 500700mm. the up and down board can move 400mm up ward or downward. the 40mm laser end can move at the highest speed of 1500m s. it is under the control of the dsp industrial system with the differentiation rate 0. 015mm
如：水晶玉石等雕刻，各種獎碑獎牌的雕刻人像雕刻木版書雕刻工藝禮品包裝盒雕刻，加工面積500700mm ，電動升降平面上下400mm可調，激光頭40mm可調，最大移動速度為1500mm s 。 dsp工業級高速控制，分辯率0 . 015mm 。 -
A dc transit system can never be fully protected because the protection cannot always distinguish between distant faults and train load currents for both of the currents have the similar magnitude and the rate of change
在各種短路故障中，地鐵直流側遠方短路故障由於其故障電流的大小和變化率都很難同正常負荷電流鑒別開來，所以至今難以做到百分之百的保護。 -
( 4 ) the study of the optical band gap of cnx film by uv - vis spectrophotometer. ( 5 ) by using the microhardness tester, we study the hardness of cnx film on the ceremic substrate by dc magnetron reactive sputtering with the feed ar and n2 flow rate, film thickness, substrate temperature and substrate bias
（ 5 ）用直流磁控反應濺射法，以陶瓷作為襯底，對在ar和n2不同流量、不同膜厚、不同基片溫度和對基片施加不同偏壓下沉積的薄膜，用< wp = 4 >顯微硬度計研究測試了不同工藝參數下的相應硬度。 -
Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer
本研究課題以氧化鋅鋁靶為靶材，採用直流磁控濺射工藝在純氬氣氣氛中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。 -
Firstly, the current testing localization in the detection of electric bow is analyzed and the new system ' s whole construction developed in this thesis is introduced ; in the 2rd chapter, the embedded 110v dc power supply is analyzed and constructed, and with experiments, some dissonant results such as the fluctuation of output pwm ( pulse width modulation ) pulses, the power noise added to output voltage, and the drop of output voltage have been analyzed and the problems have been broken down one by one ; in chapter 3, stepping motor ' s drive has been systematically dissertated, and combing stepping motor ' s subdivided drive technology, the author develops an intelligent mini - step driving circuit using a main - sub microprocessor structure, which is validated in the hybrid stepper based system ; in the 4th chapter, liquid crystal driving and displaying technology is specified in detail, with one sort of lcd modules ( tlm12864h ), the author develops an feasible circuit for the new testing system, designs a menu mode based program struc ture and brings here some programming codes using franklin c51 programming language ; in chapter 5, the above built system is used in the electric bow ' s practical detection, and the differentiating rate of this system is analyzed
論文首先分析了目前機車受電弓檢修方式存在的局限並概述了本論文研製的受電弓測試系統的體系架構；第二章對系統內置110v直流控制電源進行了分析和設計，結合試驗對輸出pwm振蕩、輸出電源噪聲大、輸出電壓下跌等現象進行了分析並提出解決措施；第三章論述了步進電機的驅動，結合步進電機微步驅動技術研製了基於上下位單片機組的混合式步進電機智能驅動電路，並在試驗中得以驗證；第四章詳述了液晶驅動及顯示技術，利用一款液晶顯示模塊tlm12864h研製出本系統用液晶顯示電路，設計了菜單式的程序結構並以franklinc51編程方式給出部分子程序代碼；第五章則將以上構建的整個系統應用在機車受電弓的實測中，並對測試解析度進行了分析。 -
By using power of dc superimposed ac, oxidation rate rose with increase of voltage but had nothing to do with frequencies in this experiment
在一定的頻率?圍內，改變頻率對亞硫酸鈉的轉化率影響不大。 -
For example, the static shear stress of kaolinite / cms nanocomposites erf is 3. 6 times as large as that of the pure kaolinite erf. furthermore, we also found that the electrorheological effect has the close relationship with the amount of cms. with the component rate of 1 : 1, the synergetic effect is appeared greatly and the kaolinite / cms er fluid displays a notable er effect under dc current field
對介電和電導性能的測量顯示羧甲基澱粉插層引起復合材料電流變液的介電常數和電導率升高，其介電常數是純土電流變液介電常數的2 . 07倍，是羧甲基澱粉電流變液的1 . 78倍；電導率是純土的2 . 73倍。 -
The theoretical model of dc electroosmotic flow field is built based on the forming principle of the pumping rate and pressure of electroosmoticflow micropump. the numerical values of electric double layer and electroosmoticflow field are solved by using vorticity stream funcion formulation and finity difference algorithm. it shows many factors influence the pumping rate such as electric field indensity, section area, section shape, the dielectric constant and the viscosity constant of flow
本文詳細的綜述了直流電滲流微泵的國內外研究狀況，闡述了雙電層和直流電滲流微泵的原理，研究了電滲流微泵流量與壓強的產生機制，建立了直流電滲流流場的理論模型，並利用渦度流函數法和有限差分法得到雙電層電勢和電滲流流場數值解。 -
The particle - enriched zone moves outwards as the rotational rate increases. by employing steady dc magnetic field to the conventional centrifugal casting method, the distribution of particles is changed. the most uniform distribution is obtained when the magnetic density is 0. 15t
通過向常規的離心鑄造中引入穩恆直流電磁場，基體中的顆粒分佈得到改善，磁感應強度為0 . 15t時，顆粒的分佈最為均勻，磁感應強度過大時，磁場將會引起基體組織粗化。 -
3. a good result is gotten under the star - hspice simulation. the dc gain is 90 db, the offset voltage is 40 u v while driving 10k, the unity - gain frequency is 10mhz with phase margin 67, the slew rate is 10w us while driving 10pf
用star - hspice模擬軟體對電路模擬，在1 . 5v電源電壓、直流10k負載、交流10pf負載的情況下，整個共模電壓范圍內跨導基本保持恆定，只有18的變化，直流增益90db ，單位增益帶寬10mhz ，相位裕度80度，壓擺率10v s 。 -
Dc - g320 mainly for the engraving and cutting of little artistic works. such as engraved portaits badges breast cards and various engraved packages. it can also engrave little artistic coorlcs seals and crabs. the machine can work with a high speed and the cost is low. the processing area is 300200 and the laser and can move 50mm upward or downward. the differentiation rate is 0. 015mm. it is under the control of high - speed one - chip cpu
如：雕刻人像胸牌胸卡各種工藝禮品外包裝雕刻加工小工藝禮品的加工雕刻，同時，有雕刻印章螃蟹的功能。本機加工速度快成本低適應性強加工面積300200 ，激光頭上下50mm可調，最大移動速度為380mm s 。解析度為0 . 025mm 。 -
Dc - g460 is used for the carving of portraits images breast cards and various artistic words. it has also the capacity of carving seals. the processing area is 400600mm. the movement span of the laser end is 40mm up ward or down ward, with the higest speed of 300m s. it is under the control of high speed system with the differentiation rate of 0. 0125mm
該機主要用於人像雕刻，胸牌胸卡雕刻，各種工藝禮品的加工，雕刻，同時，具有雕刻印章功能。加工面積400mm600mm ，激光頭上下40mm可調，最大移動速度為300mm s 。單片機高速控制，分辯率0 . 0125mm 。 -
Dc - g690 laser maching for engraving and cutting for the waterials of 600900mm, mainly for the cutting of colothing materials and for the engraving of leather materials. the highest movement speed is 1500mm s with the laser power60w. it is under the control of the dsp industrial system with the differentiation rate 0. 015mm
該機切花加工面積600900mm ，專汪用於各種服裝面料的切割，同時過具有加工皮革雕花裁剪等功能。最大移動速度1500mm s激光功率60w 。 dsp工業級高速控制分辯率0 . 015mm 。 -
After analyzing and contrasting the advantages and disadvantages of the traditional classification, and subject with the network classification and subject, the author asserts that using corresponding network information classification, establishing vocabulary list about controlling, utilizing classified subject union to organize network information resource can improve the searching rate of present engine, extremely using dc metadata to edit the network information resource, establishing topic network also is an effective method of organizing network information resource, meanwhile, introducing in detail the resource of marc and dc
筆者在分析對比了傳統分類法和主題法與網路分類法和主題法在組織網路信息資源的優缺點后，提出採用統一的網路信息分類法、建立后控詞表、運用分類主題一體化組織法等方法來組織網路信息資源可以極大改善現有搜索引擎的檢索效率;運用元數據法對網路信息資源進行編目，創建主題網關也是組織網路信息資源的一種有效方法，並對marc格式的元數據和dc格式的元數據加以詳細的介紹。 -
Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively
其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材，採用射頻磁控濺射和直流反應磁控濺射工藝在氬氣氣氛中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。
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