deposition techniques 中文意思是什麼

deposition techniques 解釋
熔敷工藝
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  • techniques : 方法
  1. We make use of double complexing agents and double quickening agents in the composite plating techniques which enable to increase the deposition rate and to obtain a more stable plating bath

    在復合鍍工藝中，採用雙絡合劑、雙加速劑來提高鍍速和穩定鍍液。
  2. It founds natural heightening theory for warping dams and puts forward specific way of diversion, measures for preventing dam eroded and design for energy dissipation and flood storage of cofferdams and sedimentation and dewatering through exploration and study on deposition in front of natural formed dam and the techniques of building dam through hydraulic filling

    通過對天然聚湫壩體前的淤積和「水力沖填」築壩技術的探索和研究，創立了淤地壩壩體自然加高的理論，並提出了具體的導流方式、壩體防沖措施及圍堰消能蓄洪、留淤脫水設計。
  3. Based on the infrared anomalous dispersion of compact alumina film, the character of alumina sols and the processing for fabricating compact alumina film were studied by using sol - gel method, combining dip - dropping, spin - coating method and electrophoretic deposition techniques

    本文基於緻密氧化鋁膜的紅外反常色散特性，結合溶膠-凝膠技術，採用浸漬提拉法、旋覆法和電泳沉積工藝，對氧化鋁溶膠的性質和緻密氧化鋁膜的制備工藝進行了研究。
  4. The general analysis of dip - dropping, spin - coating method and electrophoretic deposition techniques shows that the compaction degree of alumina film fabricated by the former two methods are higher than those prepared by the last one. besides, spin - coating method is the most efficient and fast way to raise film thickness

    綜合分析提拉法、旋覆法和電泳沉積工藝，採用前兩種工藝制備的氧化鋁膜的緻密性優于末者，並且三者中旋覆法最能快捷有效地提高膜厚。
  5. 3. finally, we explore a serial of other fabrication technology of sbd of high frequency, including oxidation techniques, photoetching techniques and vacuum deposition. an original sbd of high frequency has been made

    最後，利用所生長的薄硅外延片，探索出其它一系列相關的高頻肖特基二極體的製作工藝，包括氧化工藝、光刻工藝、真空鍍膜工藝等，製作出了高頻肖特基二極體的原型器件。
  6. At present the prevailing epitaxial growth techniques of gan are metalorganic chemical vapor deposition ( mocvd ), molecule beam epitaxy ( mbe ) as well as hvpe

    目前gan的外延生長技術一般採用有機金屬化學氣相外延法（ mocvd ） ，在藍寶石襯底的（ 0001 ）面上外延生長gan材料，另外還有分子束外延技術（ mbe ）及鹵化物汽相外延技術（ hvpe ）等。
  7. In this paper, the various growth techniques, applications, and the uptodate progresses in the research of zno are reviewed. highly c - axis oriented zno thin films are synthesized by nebulized vapor deposition technique

    另外， zno的輻射波長具有比gan的藍光發射更短，對增加光記錄密度具有重要意義；本論文綜述了zno薄膜的各種生長技術及其原理，並概括了zno薄膜研究的最新進展。
  8. Ocean optics has pioneered an optical coatings production methodology that combines modern optical thin film deposition techniques with the precision and mass - production capabilities of microlithographic procedures

    中國海洋光學公司領先研發了一種光學塗層產品方法，結合了先進的光學薄膜沉積技術和精確的大規模微型平版印刷生產能力。
  9. Electro - deposition method is one kind of up - to - date way to fabricate materials, and template technique owns more advantages than other techniques when it is used in preparation of nano - structure materials

    電沉積法是制備材料的一種新興的方法，模板技術在制備納米結構材料時具有許多其它技術不可比擬的優點。
  10. Finally the method of preparation of p - si tft and some useful dates were given. the dissertation includes seven chapters. the first chapter introduces the development of tft ; the second chapter introduces the principle of tft and its structure ; the third chapter provides the reason of superposition capacitance between s, d and gate ; the fourth chapter introduce the deposition and test method of sinx ; the fifth chapter introduces the fabrication of p - si ; the sixth chapter studies the fabrication techniques of p - si tft and some parameters ; the seventh chapter is a conclusion of the research

    本文一共分為七章:第一章介紹了本論文的研究背景、研究意義、主要工作以及國內外的研究進展;第二章介紹了tft的結構和工作原理;第三章介紹了柵極與源、漏極之間疊加電容產生的原因和自對準工藝;第四章介紹了氮化硅的制備方法和測試方法;第五章介紹了多晶硅tft有源層的制備方法並對各種晶化機理做了介紹;第六章主要對利用自對準工藝制備tft的工藝進行研究，並對制備出來的樣品進行了測試;第七章對全文進行總結。
  11. Deposition techniques for optical thin films

    光學薄膜制備技術
  12. With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility

    隨著薄膜科學與技術的發展，各種薄膜制備方法得到了迅速發展，傳統的所謂鍍膜，已從單一的真空蒸發發展到包括蒸鍍、離子鍍、濺射鍍膜、化學氣相沉積（ cvd ） 、 pecvd 、 mocvd 、分子束外延（ mbe ） 、液相生長、微波法及微波電子共旋（ mwecr ）等在內的成膜技術。其中電子束蒸發技術是一種常用的薄膜制備技術，它具有成膜質量高，速率可控性好，通用性強等優點。
  13. We conclude that due to the competition between the surface oxide removal and the ge deposition, geh4 - based clean is not suitable for high quality si epitaxial growth by chemical vapor deposition techniques

    同樣，我們證實了當表面氧覆蓋在一定的值以下時，在清洗之後的外延層生長不需要清洗的很好有效表徵。
  14. Review of polishing techniques of diamond films grown by chemical vapor deposition

    金剛石薄膜拋光技術的研究進展
  15. To study its properties and obtain high quality thin films, a variety of techniques have been used such as molecular beam epitaxy ( mbe ), metal organic chemical vapor deposition ( mocvd ), magnetron sputtering, pulsed laser deposition, to prepare zno thin films

    為了獲得高質量的氧化鋅薄膜材料，人們已採用分子束外延，有機化學汽相沉積，脈沖激光沉積，磁控濺射等各種技術來制備氧化鋅薄膜材料。
  16. In this paper, the properties of diamond is summarized at first, then the mechanism of chemical vapor deposition ( cvd ) for synthesizing diamond film is introduced and some common techniques of the cvd are commented. among these common techniques, electron aided cvd ( eacvd ) is seleceted for develepment of diamond film deposition equipment in this study, because of its high efficiency and low cost

    本文首先對金剛石的性質進行概述，然後介紹了化學氣相沉積法（ cvd ）生長金剛石膜的原理，接著對幾種常見的cvd法進行比較和評述，由於eacvd法具有高效、低成本的特點，因此在這幾種方法中選擇eacvd法作為本課題設備生長金剛石膜的方法。
  17. To satisfy the requirements of the wide applications of ito thin films, a lot of research efforts have been made on the preparation of ito films, and various manufacturing techniques such as evaporation, reactive electron evaporation d. c. and r. f. magnetron sputtering reactive thermal deposition and sol - gel process have been successfully developed

    為了滿足光電產業界對ito薄膜的強大需求， ito粉體的制備生產技術和薄膜的形成取得了很大的成效。目前，工業界主要是先將ito粉製成靶材，再利用直流磁控濺射工藝，在材料的表面形成ito薄膜。
  18. With the development of deposition techniques, diamond - like carbon ( dlc ) and a - sic : h films will be applied more widely. at present, the fundamental barrier that has not been overcome in respest of the coatings as applied to the irradiation environments is their radiation stability. for the sake of application to the fields such as aeronautics, astronautics, and nucleus reactorjnore attentions were paid on the investigation of the radiation stability of the films

    隨著成膜工藝的日臻成熟，類金剛石（ dlc ）及a - sic ： h薄膜將得到更加廣泛的應用，為了使其應用於航天、航空及核反應堆中的某些關鍵器件，對這些材料的輻照穩定性研究相當重要，這是本文研究的根本出發點，也是國際上研究的熱點之一。
  19. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more

    課堂講授和實驗課重點介紹了基本的工藝技術，如擴散、氧化、光刻、化學汽相淀積以及其它。
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