dose limit 中文意思是什麼

dose limit 解釋
劑量限度,劑量極限,劑量范圍
  • dose : n 1 （藥的）一服，一劑；藥量，劑量。2 苦藥，討厭的東西。3 （酒中的）配料，增味劑。4 （處罰等）一...
  • limit : n. 1. 界限，界線；邊界。2. 極限，限度；限制。3. 〈pl. 〉范圍，范域。4. 限價；限額；賭注限額；獵物限額。vt. 1. 限制，限定。2. 減少。adj. -able
  1. However, when upon assessment, a radiation worker ' s estimated annual cumulative exposure is unlikely to exceed a specific proportion of the dose limit, the employer may instead monitor the operation environment or personal doses through sampling

    但經評估輻射作業對輻射工作人員一年之曝露不可能超過劑量限度之一定比例者，得以作業環境監測或個別劑量抽樣監測代之。
  2. Sige simox : oxygen ions with high dose were implanted into sige grown directly on silicon substrate for the first time, and sige - oi novel structure was formed successfully with additional high temperature annealing ; it has been confirmed that oxygen implantation with 45kev, 3 1017cm - 2 and annealing at 12500c in ar + 5 % o2 for 5 hours, are fit for the formation of sige - oi structure ; ge loss during the high temperature annealing has been observed, which is originated from ge volatility and ge diffusion ; it has been proposed to use nanoporous layer induced by h + / he + implantation to surppress ge diffusion and to use surface oxidation to overcome the upper limit of sige simox. sige smart - cut : hydrogen ions were implanted into sige material and followed by high temperature process ( 4000c to 7000c ) ; blistering study was done and suggested the possibility of sige layer transfer by smart - cut technology ; it is concluded that the bubble formation is easier in sige than in si, and the strain in sige / si and the difference of binding energy in sige and in si could possibly contribute to this effect. behavior of sige / si implanted with hydrogen : gave a detailed study on sige implanted by beamline or phi hydrogen implantation ; it has been found that great strain is introduced into sige by hydrogen implantation and this strain could be alleviated by high temperature annealing ; both for conditional beamline implantation and piii hydrogen implantation, 600 is appropriate for the post - implantation treatment

    Sige - simox工藝方面：首次採用硅（ 100 ）襯底上直接外延的100nm厚sige的樣品中注入高劑量的o離子，通過退火處理成功制備了sige - oi新結構，即sige - simox工藝，證實了以45kev注入3 10 ~ （ 17 ） 7cm ~ （ - 2 ）劑量的氧離子，隨后在氧化層的保護下經1250 ， ar + 5 o _ 2氣氛的高溫退火（ 5小時）過程，可以制備出sige - oi新型材料；實驗中觀察到退火過程中的ge損失現象，分析了其原因是ge揮發（ ge通過表面氧化層以geo揮發性物質的形式進入退火氣氛）和ge擴散（ ge穿過離子注入形成的氧化埋層而進入si襯底中） ，其中ge擴散是主要原因；根據實驗結果及實驗中出現的問題，對下一步工作提出兩個改進的方案：一是通過在si襯底中注入適量h ~ + / he ~ +形成納米孔層來阻斷ge擴散通路，二是可以通過控製表面氧化來調節安止額士淤丈撈要表面sige層中的ge組分，從而部分解決sige
  3. The limitation on the effective dose provides sufficient protection for the skin against stochastic effects. an additional limit is needed for localized exposures in order to prevent deterministic effects

    限值足以防止皮膚的隨機性效應，但對局部照射需設附加限值以防止確定性效應。
  4. Article 5 in order to limit the radiation exposure from radiation sources or practices, the competent authority shall refer to the latest standards of the international commission on radiological protection to lay down the safety standards for protection against ionizing radiation, and if warranted, to formulate the relevant guides so as to regulate the levels of radiation protection practice and personal dose limits

    第5條為限制輻射源或輻射作業之輻射曝露，主管機關應參考國際放射防護委員會最新標準訂定游離輻射防護安全標準，並應視實際需要訂定相關導則，規?輻射防護作業基準及人員劑量限度等游離輻射防護事項。
  5. Dose limit refers to the maximum allowable dose arising from exposure received by a worker in practice

    一八劑量限度：指人員因輻射作業所受之曝露，不應超過之劑量值。
  6. A special case exists for pregnant workers because of the potential for radiation to damage the developing foetus. after the pregnancy is declared, the dose limit is 1 msv for the rest of the pregnancy

    懷孕工人的情況亦有所不同，由於輻射有可能對成長中的胎兒造成損害，故一旦懷孕，在懷孕期間的吸收劑量便不能超過一個毫西韋特單位。
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