double film process 中文意思是什麼
double film process
解釋
雙片放映法-
This paper studies the application of inductively coupled plasma ( icp ) technology to the etching compound semiconductor insb - in film. by means of single probe and double probe, the ion density and electron temperature of chamber ( 30mm and 50mm in height respectively ) under varied process condition were diagnosed. the spatial distribution of the axial position of the two parameters and the varied curve that the two parameters varies with the power and air pressure are obtained
利用單探針和雙探針診斷30mm高反應室和50mm高反應室在各種工藝條件下的離子密度和電子溫度，得到這兩個參數在反應室軸向位置的空間分佈、隨功率和氣壓的變化曲線、頂蓋接地和反應室體積對它們的影響，結果表明離子密度為10 ~ 8 10 ~ （ 10 ） cm ~ （ - 3 ） ，電子溫度在4 10ev之間；當頂蓋接地時，該處的等離子體密度明顯大於不接地；在同樣條件下， 50mm高反應室內的離子密度明顯大於30mm高反應室。 -
Mechanisim of absorption with gas - liquid reaction has been analyzed founded on theory of double film. the two calculation formulas for the absorption rate with gas - liquid reaction were put forward as follows. ( 1 ) the formula for interface wasand it was suitable for calculating any rate. ( 2 ) the general formula was. though the calculating process of this formula was complicated, it was suitable for reactor design, pariticularly for the calculation of absorption with gas - liguid reaction
根據雙膜理論，分析了氣液反應的吸收機理.提出氣液反應的吸收速率的兩種計算形式: （ 1 ）界面式，該式適用於任意速率的計算; （ 2 ）一般式，該式計算過程較繁瑣，但對反應器設計，尤其是對帶有反應的氣液吸收過程的計算較為適用。 -
Monthly production capacity of 300000 square feet of high - precision pcb board of double - layer and above, capable of production of circuit boards of various surface treatment process to customer ' s requirements, ranging from tin leveled board with lead to lead - free tin - leveled board, and from chemical nickel / gold plated board to even environ - friendly coated board with anti - oxidation film
月產能30萬平方英尺雙層以上高精密pcb板，可根據客戶要求生產各種不同的表面處理的線路板，從有鉛噴錫板至無鉛噴錫板，從化學鎳金板至更加環保的防氧化膜塗層板。
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