electron beam mask system 中文意思是什麼
electron beam mask system
解釋
電子束掩模製造系統-
Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead
全面分析了cpt電子槍發射系統形成的電子透鏡像差與磁偏轉系統形成的偏轉像差;分析了蔭罩的自身厚度與位移對電子束著屏的影響,並由此得出結論,著屏電子束分佈(即亮度分佈)受著許多因素的影響,理論分析是半定量的,著屏電子束分佈需要用精確的測量儀器來測量。 -
The effect on display characteristic made by thermal deformations of the shadow mask is comprehensively investigated. by using the electron beam distribution automatic measurement system with a micro - deflective coil, a concave spot in luminance distribution can be get. it changes its position when the shadow mask changes its form
本文系統全面地分析了傳統蔭罩的各類熱變形對顯示屏特性的影響,利用本文研製的電子束亮度分佈自動測試系統,附加一個微偏轉磁場,使相鄰兩電子束打在同一顏色的熒光粉條,並形成一個亮度凹點,當蔭罩變形時,凹點位置作相應的位移,以此原理跟蹤測量凹點位移量,即可得到色純漂移動態變化曲線。
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