electron beam mask system 中文意思是什麼

electron beam mask system 解釋
電子束掩模製造系統
  • electron : n. 【物理學】電子。 the electron beam 電子束。 the electron theory 電子(學)說。
  • beam : n 1 梁,棟梁,桁條;(船的)橫梁。2 船幅;(動物、人的)體幅。3 (秤)桿,杠桿,(織機的)卷軸,...
  • mask : n 1 假面具,偽裝,掩蔽物;面罩;防毒面具(= gas mask);【物理學】掩模;(劈劍,棒球等用)護面;...
  • system : n 1 體系,系統;分類法;組織;設備,裝置。2 方式;方法;作業方法。3 制度;主義。4 次序,規律。5 ...
  1. Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead

    全面分析了cpt電子槍發射系統形成的電子透鏡像差與磁偏轉系統形成的偏轉像差;分析了蔭罩的自身厚度與位移對電子束著屏的影響,並由此得出結論,著屏電子束分佈(即亮度分佈)受著許多因素的影響,理論分析是半定量的,著屏電子束分佈需要用精確的測量儀器來測量。
  2. The effect on display characteristic made by thermal deformations of the shadow mask is comprehensively investigated. by using the electron beam distribution automatic measurement system with a micro - deflective coil, a concave spot in luminance distribution can be get. it changes its position when the shadow mask changes its form

    本文系統全面地分析了傳統蔭罩的各類熱變形對顯示屏特性的影響,利用本文研製的電子束亮度分佈自動測試系統,附加一個微偏轉磁場,使相鄰兩電子束打在同一顏色的熒光粉條,並形成一個亮度凹點,當蔭罩變形時,凹點位置作相應的位移,以此原理跟蹤測量凹點位移量,即可得到色純漂移動態變化曲線。
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