etching system 中文意思是什麼
etching system
解釋
蝕刻系統-
Magnetization magneto - microwave plasma etching system
磁場微波型等離子體蝕刻系統 -
Hardware and software design for the inductively coupled plasma etching machine " s system are also presented
介紹了plc控制等離子體刻蝕機的硬體系統和軟體系統的設計。 -
Generic specification of ion beam etching system
離子束蝕刻機通用技術條件 -
Reactive ion beam etching system ribe system
反應性離子束蝕刻系統 -
Overflow cup etching system
溢流杯蝕刻系統 -
Narrow gap reactive ion etching system
狹窄間隙反應性離子蝕刻系統 -
Reactive ion etching system rie system
反應性離子蝕刻系統 -
The aim of defocus detection is to achieve high etching quality by providing the defocus error signal for focus - servo system which can make the etching spot focus accurately
離焦檢測的任務是為聚焦伺服系統提供聚焦誤差信號，使寫入光斑能夠精確聚焦，從而保證刻蝕質量。 -
A set of icp etching system has been designed and manufactured through the analysis of the probe diagnosed results. during the study of the system, the emphasis is laid on the matching problem of icp coupled antenna via the rf matching device and rf power source
通過對探針診斷結果的分析，設計並製作一套icp刻蝕系統，重點研究icp耦合天線通過射頻匹配器與射頻功率源的匹配問題，得到很好的匹配效果，在射頻輸出功率為500w以內時，反射功率小於10w 。 -
Inductively coupled plasma etching system
感應耦合型等離子體蝕刻系統 -
Barrel type plasma etching system
圓筒型等離子體蝕刻系統 -
Reactive sputter etching system
反應性濺鍍蝕刻系統 -
Photo excited etching system
光激勵蝕刻系統 -
As an important step of microelectronic process, etching technology has gained much attention. it will play an important role in microfabrication such as new - made microeletronics mechanism ( mems ) and photoelectrics integration system
刻蝕工藝不僅作為微電子工藝中的關鍵技術一直受到人們的關注，而且在新興的微機電系統，光電集成系統等微細加工中也將得到重要應用。 -
As the key device of a dwdm system, etching diffraction grating ( edo ) is one of the most potential types of planar waveguide dwdm devices
作為波分復用中最關鍵的器件，蝕刻衍射光柵（ edg ）是平面波導密集波分復用器件中很有發展潛力的一種。 -
Immersion wet etching system
浸漬式蝕刻系統 -
All these has provided us with scientific basis for designing the chamber of icp etching system and selecting the appropriate etching samples
這些結論為設計icp刻蝕系統的反應室、選擇合適的刻蝕工藝提供了科學的根據。 -
In this paper, the development of micro - system is explained. the present research of binary optics and the main methods for shaping are described and some kinds of the methods of etching are compared
本文闡述了微系統的發展過程，敘述了二元光學的研究現狀和二元光學的成型過程，比較了幾種不同的刻蝕過程方法。 -
Wet etching system
濕式蝕刻系統 -
Ion beam etching system
離子束蝕刻系統
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